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公开(公告)号：US12091349B2
公开(公告)日：2024-09-17
申请号：US17836162
申请日：2022-06-09
Applicant: Applied Materials, Inc.
Inventor： Wei-Sheng Lei , Mahendran Chidambaram , Kangkang Wang , Ludovic Godet , Visweswaren Sivaramakrishnan
IPC: B23K26/38 , B23K26/00 , B23K26/0622 , B23K26/08 , B23K26/55 , C03B33/02 , C03B33/10 , C03C23/00 , B23K101/40 , B23K103/00
CPC classification number: C03B33/0222 , B23K26/0006 , B23K26/0624 , B23K26/0861 , B23K26/55 , C03B33/102 , C03C23/0025 , B23K2101/40 , B23K2103/42 , B23K2103/50 , B23K2103/54 , B23K2103/56 , B29C2791/009
Abstract: A method and apparatus for substrate dicing are described. The method includes utilizing a laser to dice a substrate along a dicing path to form a perforated line around each device within the substrate. The dicing path is created by exposing the substrate to bursts of laser pulses at different locations around each device. The laser pulses are delivered to the substrate and may have a pulse repetition frequency of greater than about 25 MHz, a pulse width of less than about 15 picoseconds, and a laser wavelength of about 1.0 μm to about 5 μm.
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公开(公告)号：US12057298B2
公开(公告)日：2024-08-06
申请号：US17684903
申请日：2022-03-02
Applicant: Applied Materials, Inc.
Inventor： Marcus Blake Freitas , David Masayuki Ishikawa , Vijay D. Parkhe , Visweswaren Sivaramakrishnan
CPC classification number: H01J37/32724 , G01K1/14 , G01K11/32
Abstract: Apparatus and systems for temperature probe integration on pedestal heaters of a processing chamber including a cooling assembly for cooling temperature probes disposed within. Cooling assemblies can be actively water-cooled, passively cooled by fin stacks. Further cooling assemblies include a mechanical arm assembly for lowering or raising the temperature probes.
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公开(公告)号：US11878532B2
公开(公告)日：2024-01-23
申请号：US17647820
申请日：2022-01-12
Applicant: Applied Materials, Inc.
Inventor： Daihua Zhang , Ludovic Godet , Michael David-Scott Kemp , Kang Luo , Kazuya Daito , Kenneth S. Ledford , Bahubali S. Upadhye , Hemantha Raju , John Rusconi , Elsa Massonneau , Mahendran Chidambaram , Alexey Stepanov , Visweswaren Sivaramakrishnan
Abstract: Embodiments described herein relate to an inkjet printing platform. The inkjet printing platform is utilized for fabrication of optical films and optical device structures. The inkjet printing platform includes a transfer chamber, one or more inkjet chambers, a plurality of auxiliary modules, a substrate flipper, and load ports. The inkjet printing platform is operable to perform an inkjet printing process on a substrate to form an optical film and/or an optical device.
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公开(公告)号：US20220396732A1
公开(公告)日：2022-12-15
申请号：US17836578
申请日：2022-06-09
Applicant: Applied Materials, Inc.
Inventor： Nitin Deepak , Tapash Chakraborty , Prerna Sonthalia Goradia , Visweswaren Sivaramakrishnan , Nilesh Chimanrao Bagul , Bahubali S. Upadhye
IPC: C09K13/00
Abstract: Methods for etching alkali metal compounds are disclosed. Some embodiments of the disclosure expose an alkali metal compound to an alcohol to form a volatile metal alkoxide. Some embodiments of the disclosure expose an alkali metal compound to a β-diketone to form a volatile alkali metal β-diketonate compound. Some embodiments of the disclosure are performed in-situ after a deposition process. Some embodiments of the disclosure provide methods which selectively etch alkali metal compounds.
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公开(公告)号：US20220162747A1
公开(公告)日：2022-05-26
申请号：US17529463
申请日：2021-11-18
Applicant: Applied Materials, Inc.
Inventor： Tapash Chakraborty , Nitin Deepak , Prerna Sonthalia Goradia , Bahubali S. Upadhye , Nilesh Chimanrao Bagul , Subramanya P. Herle , Visweswaren Sivaramakrishnan
IPC: C23C16/44
Abstract: Exemplary methods of removing lithium-containing deposits may include heating a surface of a lithium-containing deposit. The surface may include oxygen or nitrogen, and the lithium-containing deposit may be disposed on a surface of a processing chamber. The methods may include contacting the surface of the lithium-containing deposit with a hydrogen-containing precursor. The contacting may hydrogenate the surface of the lithium-containing deposit. The methods may include contacting the lithium-containing deposit with a nitrogen-containing precursor to form volatile byproducts. The methods may include exhausting the volatile byproducts of the lithium-containing deposit from the processing chamber.
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Patent Agency Ranking
公开(公告)号：US10774423B2
公开(公告)日：2020-09-15
申请号：US14552273
申请日：2014-11-24
Applicant: Applied Materials, Inc.
Inventor： Karthik Janakiraman , Thomas Nowak , Juan Carlos Rocha-Alvarez , Mark A. Fodor , Dale R. Du Bois , Amit Bansal , Mohamad Ayoub , Eller Y. Juco , Visweswaren Sivaramakrishnan , Hichem M'Saad
IPC: C23C16/455 , C23C16/458 , C23C16/44 , C23C16/503 , C23C16/505 , H01J37/32 , C23C16/509
Abstract: An apparatus and method are provided for controlling the intensity and distribution of a plasma discharge in a plasma chamber. In one embodiment, a shaped electrode is embedded in a substrate support to provide an electric field with radial and axial components inside the chamber. In another embodiment, the face plate electrode of the showerhead assembly is divided into zones by isolators, enabling different voltages to be applied to the different zones. Additionally, one or more electrodes may be embedded in the chamber side walls.
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公开(公告)号：US12134822B2
公开(公告)日：2024-11-05
申请号：US17529463
申请日：2021-11-18
Applicant: Applied Materials, Inc.
Inventor： Tapash Chakraborty , Nitin Deepak , Prerna Sonthalia Goradia , Bahubali S. Upadhye , Nilesh Chimanrao Bagul , Subramanya P. Herle , Visweswaren Sivaramakrishnan
IPC: C23C16/44
Abstract: Exemplary methods of removing lithium-containing deposits may include heating a surface of a lithium-containing deposit. The surface may include oxygen or nitrogen, and the lithium-containing deposit may be disposed on a surface of a processing chamber. The methods may include contacting the surface of the lithium-containing deposit with a hydrogen-containing precursor. The contacting may hydrogenate the surface of the lithium-containing deposit. The methods may include contacting the lithium-containing deposit with a nitrogen-containing precursor to form volatile byproducts. The methods may include exhausting the volatile byproducts of the lithium-containing deposit from the processing chamber.
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公开(公告)号：US20240141478A1
公开(公告)日：2024-05-02
申请号：US18498239
申请日：2023-10-31
Applicant: Applied Materials, Inc.
Inventor： Timothy KLEINER , David Masayuki Ishikawa , Kenneth Moyers , Sumedh Dattatraya Acharya , Visweswaren Sivaramakrishnan
IPC: C23C14/54 , C23C14/24 , C23C14/56 , H01M4/04 , H01M4/1395
CPC classification number: C23C14/541 , C23C14/24 , C23C14/562 , H01M4/0423 , H01M4/1395
Abstract: The present disclosure relates to vapor deposition systems and methods. In one embodiment, a drum for vapor deposition is provided. The drum includes a shell having gas slits and a cooling drum. The cooling drum includes an exterior region, an interior region, a first fluid channel partially defined by the exterior region and the interior region, and a first inlet. The first fluid channel forms a helical channel around a central axis of the cooling drum. The first inlet is in fluid communication with a first outlet by the first fluid channel.
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公开(公告)号：US20230132290A1
公开(公告)日：2023-04-27
申请号：US17971516
申请日：2022-10-21
Applicant: Applied Materials, Inc.
Inventor： Brian Hayes Burrows , Sekar Krishnasamy , Ayyanagouda Raravi , Monika Mudalkar , Govindraj Desai , Hemantha Kumar Raju , Basavaraj Pattanshetty , David Masayuki Ishikawa , Visweswaren Sivaramakrishnan , Shrikant Swaminathan , Mario Cambron , Robert Navasca , Miaojun Wang , Jonathan Frankel
IPC: C23C16/458 , C23C16/44 , C23C16/455
Abstract: A deposition system includes an isolator or fume hood and a reactor for coating particles, the reactor including a rotatable reactor assembly positioned within the isolator or fume hood and including a reactor drum configured to hold a plurality of particles to be coated, an inlet tube, and an outlet tube. The reactor drum is configured to be detached from the inlet tube and the outlet tube by an operator while the reactor drum remains within the isolator or fume hood.
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20.发明申请公开(公告)号：US20220372612A1
公开(公告)日：2022-11-24
申请号：US17663549
申请日：2022-05-16
Applicant: Applied Materials, Inc.
Inventor： PRASANNAKALLESHWARA BUDDAPPA RAMACHANDRAPPA , Sambhu Nath Kundu , Vicente M. Lim , Visweswaren Sivaramakrishnan , Subramanya P. Herle
Abstract: Methods and systems for the delivery of molten metals and metal alloys at a fixed volume are provided. The system includes an evaporation system having a fluid inlet port and a fluid delivery system. The fluid delivery system includes an ampoule operable to hold a source material. The ampoule includes a fluid outlet port and a gas inlet port. The fluid delivery system further includes a fluid delivery line operable to deliver the source material to the evaporation system. The fluid delivery line includes a first end fluidly coupled with the fluid outlet port and a second end fluidly coupled to the fluid inlet port. The fluid delivery line further includes a first isolation valve disposed along the fluid delivery line and a second isolation valve disposed along the fluid delivery line which define a fixed volume of the fluid delivery line.
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