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公开(公告)号:US12165939B2
公开(公告)日:2024-12-10
申请号:US18463354
申请日:2023-09-08
Applicant: Illumina, Inc.
Inventor: Arvin Emadi , Arnaud Rival , Ali Agah , Tara Bozorg-Grayeli
Abstract: Provided herein include various examples of an apparatus, a sensor system and examples of a method for manufacturing aspects of an apparatus, a sensor system. The apparatus may include a die. The apparatus may also include a substrate comprising a cavity. The die may be oriented in a portion of the cavity in the substrate, where the orientation defines a first space in the cavity adjacent to a first edge of the upper surface of the die and a second space in the cavity adjacent to the second edge of the upper surface of the die. The apparatus may further include fluidics fan-out regions comprising a first cured material deposited in the first space and the second space, a surface of the fluidics fan-out regions being contiguous with the upper surface of the die.
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公开(公告)号:US20230420312A1
公开(公告)日:2023-12-28
申请号:US18463354
申请日:2023-09-08
Applicant: Illumina, Inc.
Inventor: Arvin Emadi , Arnaud Rival , Ali Agah , Tara Bozorg-Grayeli
CPC classification number: H01L23/053 , H01L23/3185 , H01L24/48 , H01L23/481 , H01L24/73 , H01L24/16 , B81B1/002 , H01L23/15 , G01N2021/6439
Abstract: Provided herein include various examples of an apparatus, a sensor system and examples of a method for manufacturing aspects of an apparatus, a sensor system. The apparatus may include a die. The apparatus may also include a substrate comprising a cavity. The die may be oriented in a portion of the cavity in the substrate, where the orientation defines a first space in the cavity adjacent to a first edge of the upper surface of the die and a second space in the cavity adjacent to the second edge of the upper surface of the die. The apparatus may further include fluidics fan-out regions comprising a first cured material deposited in the first space and the second space, a surface of the fluidics fan-out regions being contiguous with the upper surface of the die.
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公开(公告)号:US11819843B2
公开(公告)日:2023-11-21
申请号:US17729814
申请日:2022-04-26
Applicant: ILLUMINA, INC.
Inventor: Tarun Kumar Khurana , Arnaud Rival , Lewis J. Kraft , Steven Barnard , M. Shane Bowen , Xi-Jun Chen , Yir-Shyuan Wu , Jeffrey S. Fisher , Dajun Yuan
CPC classification number: B01L3/5027 , B01L3/5085 , C12N15/1065 , B01L3/5088 , B01L2300/0896 , B01L2300/161 , B01L2300/165 , C08K5/5406 , C08L37/00
Abstract: An example of a flow cell includes a substrate, which includes nano-depressions defined in a surface of the substrate, and interstitial regions separating the nano-depressions. A hydrophobic material layer has a surface that is at least substantially co-planar with the interstitial regions and is positioned to define a hydrophobic barrier around respective sub-sets of the nano-depressions.
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公开(公告)号:US11798854B2
公开(公告)日:2023-10-24
申请号:US17820659
申请日:2022-08-18
Applicant: Illumina, Inc.
Inventor: Arvin Emadi , Arnaud Rival , Ali Agah , Tara Bozorg-Grayeli
CPC classification number: H01L23/053 , B81B1/002 , H01L23/15 , H01L23/3185 , H01L23/481 , H01L24/16 , H01L24/48 , H01L24/73 , G01N21/6428 , G01N2021/6439 , H01L2224/16227 , H01L2224/2919 , H01L2224/48227 , H01L2224/73215
Abstract: Provided herein include various examples of an apparatus, a sensor system and examples of a method for manufacturing aspects of an apparatus, a sensor system. The apparatus may include a die. The apparatus may also include a substrate comprising a cavity. The die may be oriented in a portion of the cavity in the substrate, where the orientation defines a first space in the cavity adjacent to a first edge of the upper surface of the die and a second space in the cavity adjacent to the second edge of the upper surface of the die. The apparatus may further include fluidics fan-out regions comprising a first cured material deposited in the first space and the second space, a surface of the fluidics fan-out regions being contiguous with the upper surface of the die.
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公开(公告)号:US11476171B2
公开(公告)日:2022-10-18
申请号:US17179783
申请日:2021-02-19
Applicant: Illumina, Inc.
Inventor: Arvin Emadi , Arnaud Rival , Ali Agah , Tara Bozorg-Grayeli
Abstract: Provided herein include various examples of an apparatus, a sensor system and examples of a method for manufacturing aspects of an apparatus, a sensor system. The apparatus may include a die. The apparatus may also include a substrate comprising a cavity. The die may be oriented in a portion of the cavity in the substrate, where the orientation defines a first space in the cavity adjacent to a first edge of the upper surface of the die and a second space in the cavity adjacent to the second edge of the upper surface of the die. The apparatus may further include fluidics fan-out regions comprising a first cured material deposited in the first space and the second space, a surface of the fluidics fan-out regions being contiguous with the upper surface of the die.
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公开(公告)号:US20210272863A1
公开(公告)日:2021-09-02
申请号:US17179783
申请日:2021-02-19
Applicant: Illumina, Inc.
Inventor: Arvin Emadi , Arnaud Rival , Ali Agah , Tara Bozorg-Grayeli
Abstract: Provided herein include various examples of an apparatus, a sensor system and examples of a method for manufacturing aspects of an apparatus, a sensor system. The apparatus may include a die. The apparatus may also include a substrate comprising a cavity. The die may be oriented in a portion of the cavity in the substrate, where the orientation defines a first space in the cavity adjacent to a first edge of the upper surface of the die and a second space in the cavity adjacent to the second edge of the upper surface of the die. The apparatus may further include fluidics fan-out regions comprising a first cured material deposited in the first space and the second space, a surface of the fluidics fan-out regions being contiguous with the upper surface of the die.
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公开(公告)号:US12111262B2
公开(公告)日:2024-10-08
申请号:US17419375
申请日:2020-06-25
Applicant: ILLUMINA, INC.
Inventor: Arvin Emadi , Arnaud Rival , Fabien Abeille , Ali Agah , Craig Ciesla , Aathavan Karunakaran
IPC: G01N21/64 , G01N15/1434 , G01N21/05 , G02B6/12 , G02B6/124 , H01L27/148
CPC classification number: G01N21/645 , G02B6/124 , H01L27/14825 , G01N15/1436 , G01N2021/058 , G01N2021/6482 , G01N2021/6484 , G02B2006/12107 , G02B2006/12138
Abstract: Provided herein include various examples of an apparatus, flow cells that include these examples of the apparatus, and methods of making these examples of the apparatus. The apparatus can include a molding layer over a substrate and covering sides of a light detection device. The molding layer comprises a first region and a second region, which, with the active surface of the light detection device, form a contiguous surface. A waveguide integration layer is between the contiguous surface and a waveguide. The waveguide integration layer comprises optical coupling structures over the first and second regions, to optically couple light waves from a light source to the waveguide. The waveguide utilizes the light waves to excite light sensitive materials in nanowells. A nanostructure layer over the waveguide comprises the nanowells. Each nanowell shares a vertical axis with a location on the active surface of the light detection device.
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公开(公告)号:US12062674B2
公开(公告)日:2024-08-13
申请号:US17804023
申请日:2022-05-25
Applicant: Illumina, Inc.
Inventor: Arvin Emadi , Arnaud Rival , Ali Agah
IPC: H01L27/146 , H01L23/00
CPC classification number: H01L27/14618 , H01L24/05 , H01L27/14636 , H01L27/14643 , H01L27/14689 , H01L27/14698
Abstract: Disclosed in one example is an apparatus including a substrate, a sensor over the substrate including an active surface and a sensor bond pad, a molding layer over the substrate and covering sides of the sensor, the molding layer having a molding height relative to a top surface of the substrate that is greater than a height of the active surface of the sensor relative to the top surface of the substrate, and a lidding layer over the molding layer and over the active surface. The lidding layer and the molding layer form a space over the active surface of the sensor that defines a flow channel.
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公开(公告)号:US11747263B2
公开(公告)日:2023-09-05
申请号:US17811750
申请日:2022-07-11
Applicant: Illumina, Inc.
Inventor: Arnaud Rival , Ali Agah , Tracy H. Fung , Dietrich Dehlinger , Poorya Sabounchi , Tarun Khurana , Craig M. Ciesla , M. Shane Bowen
IPC: G01N15/14
CPC classification number: G01N15/1404 , G01N15/1429 , G01N2015/145
Abstract: Flow cells and corresponding methods are provided. The flow cells may include a support frame with top and back sides, and at least one cavity extending from the top side. The flow cells may include at least one light detection device with an active area disposed within the at least one cavity. The flow cells may include a support material disposed within the at least one cavity between the support frame and the periphery of the at least one light detection device coupling them together. The flow cells may include a lid extending over the at least one light detection device and coupled to the support frame about the periphery of the at least one light detection device. The lid and at least a top surface of the at least one light detection device form a flow channel therebetween.
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公开(公告)号:US11702695B2
公开(公告)日:2023-07-18
申请号:US17662124
申请日:2022-05-05
Applicant: Illumina, Inc.
Inventor: Yir-Shyuan Wu , Yan-You Lin , M. Shane Bowen , Cyril Delattre , Fabien Abeille , Tarun Khurana , Arnaud Rival , Poorya Sabounchi , Dajun Yuan , Maria Candelaria Rogert Bacigalupo
IPC: B05D3/06 , G03F7/00 , G03F7/20 , C12Q1/6874 , C12Q1/6806
CPC classification number: C12Q1/6874 , B05D3/06 , C12Q1/6806 , G03F7/0002 , G03F7/20
Abstract: Embodiments provided herewith are directed to self-assembled methods of preparing a patterned surface for sequencing applications including, for example, a patterned flow cell or a patterned surface for digital fluidic devices. The methods utilize photolithography to create a patterned surface with a plurality of microscale or nanoscale contours, separated by hydrophobic interstitial regions, without the need of oxygen plasma treatment during the photolithography process. In addition, the methods avoid the use of any chemical or mechanical polishing steps after the deposition of a gel material to the contours.
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