公开(公告)号：US20230074181A1

公开(公告)日：2023-03-09

申请号：US17467666

申请日：2021-09-07

Applicant: Intel Corporation

Inventor： Xavier Francois Brun ,  Sanka Ganesan

IPC: H01L23/48 ,  H01L23/495 ,  H01L23/00

Abstract: An example microelectronic assembly comprises a support structure; an interposer above the support structure; a first die in the interposer, the first die including through-substrate vias (TSVs); and a second die in the interposer, the second die lacking TSVs. A die-to-package support (DTPS) interconnect field on a first face of the first die is substantially identical to a DTPS interconnect field on a first face of the second die, the DTP interconnect fields comprising a plurality of DTPS interconnects for connecting the first and second dies to the support structure. A die-to-die (DTD) interconnect field on a second face of the first die is substantially identical to a DTD interconnect field on a second face of the second die, the DTD interconnect fields comprising a plurality of DTD interconnects.

公开(公告)号：US20220181262A1

公开(公告)日：2022-06-09

申请号：US17677130

申请日：2022-02-22

Applicant: Intel Corporation

Inventor： Sanka Ganesan ,  Ram Viswanath ,  Xavier Francois Brun ,  Tarek A. Ibrahim ,  Jason M. Gamba ,  Manish Dubey ,  Robert Alan May

IPC: H01L23/538 ,  H01L23/367 ,  H01L23/31 ,  H01L23/00

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic component may include a substrate having a first face and an opposing second face, wherein the substrate includes a through-substrate via (TSV); a first mold material region at the first face, wherein the first mold material region includes a first through-mold via (TMV) conductively coupled to the TSV; and a second mold material region at the second face, wherein the second mold material region includes a second TMV conductively coupled to the TSV.

公开(公告)号：US20250125307A1

公开(公告)日：2025-04-17

申请号：US18985540

申请日：2024-12-18

Applicant: Intel Corporation

Inventor： Jeremy Ecton ,  Jason M. Gamba ,  Brandon C. Marin ,  Srinivas V. Pietambaram ,  Xiaoxuan Sun ,  Omkar G. Karhade ,  Xavier Francois Brun ,  Yonggang Li ,  Suddhasattwa Nad ,  Bohan Shan ,  Haobo Chen ,  Gang Duan

IPC: H01L25/065 ,  H01L23/00 ,  H01L23/538

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a first die, having a first surface and an opposing second surface, in a first layer; a redistribution layer (RDL) on the first layer, wherein the RDL includes conductive vias having a greater width towards a first surface of the RDL and a smaller width towards an opposing second surface of the RDL; wherein the first surface of the RDL is electrically coupled to the second surface of the first die by first solder interconnects having a first solder; and a second die in a second layer on the RDL, wherein the second die is electrically coupled to the RDL by second solder interconnects having a second solder, wherein the second solder is different than the first solder.

公开(公告)号：US12176292B2

公开(公告)日：2024-12-24

申请号：US18375867

申请日：2023-10-02

Applicant: Intel Corporation

Inventor： Sanka Ganesan ,  Ram Viswanath ,  Xavier Francois Brun ,  Tarek A. Ibrahim ,  Jason M. Gamba ,  Manish Dubey ,  Robert Alan May

IPC: H01L23/538 ,  H01L23/00 ,  H01L23/31 ,  H01L23/367

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic component may include a substrate having a first face and an opposing second face, wherein the substrate includes a through-substrate via (TSV); a first mold material region at the first face, wherein the first mold material region includes a first through-mold via (TMV) conductively coupled to the TSV; and a second mold material region at the second face, wherein the second mold material region includes a second TMV conductively coupled to the TSV.

公开(公告)号：US20230307341A1

公开(公告)日：2023-09-28

申请号：US17583485

申请日：2022-01-25

Applicant: Intel Corporation

Inventor： Xavier Francois Brun

IPC: H01L23/498 ,  H01L25/00 ,  H01L21/48 ,  H01L23/00 ,  H01L25/065

CPC classification number: H01L23/49827 ,  H01L21/486 ,  H01L24/19 ,  H01L24/20 ,  H01L25/0652 ,  H01L25/50 ,  H01L21/561

Abstract: A microelectronic assembly is provided, comprising: an interposer having a first face and a second face opposite to the first face; a package substrate coupled to the first face; an integrated circuit die coupled to the second face; and an edge ring in the interposer. The interposer comprises a core comprising a first dielectric material and a redistribution layer (RDL), the RDL being on the first face or the second face, the RDL comprising a second dielectric material different from the first dielectric material, and the edge ring comprises: a metal trace in contact with the second dielectric material, the metal trace being along a periphery of the interposer, and a plurality of metal vias through the RDL, the plurality of metal vias in contact with the metal trace.

公开(公告)号：US20230076148A1

公开(公告)日：2023-03-09

申请号：US17470404

申请日：2021-09-09

Applicant: Intel Corporation

Inventor： Xavier Francois Brun ,  Jason M. Gamba ,  Srinivas V. Pietambaram

IPC: H01L25/065 ,  H01L23/31

Abstract: An example an IC package including a liner for promotion of mold adhesion includes a conductive structure on a support surface; a mold material at least partially encasing the conductive structure; and a liner on a surface of the conductive structure between the surface of the conductive structure and the mold material, wherein the liner comprises a material including silicon and nitrogen.

公开(公告)号：US11302643B2

公开(公告)日：2022-04-12

申请号：US16829396

申请日：2020-03-25

Applicant: Intel Corporation

Inventor： Sanka Ganesan ,  Ram Viswanath ,  Xavier Francois Brun ,  Tarek A. Ibrahim ,  Jason M. Gamba ,  Manish Dubey ,  Robert Alan May

IPC: H01L23/538 ,  H01L23/367 ,  H01L23/31 ,  H01L23/00

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic component may include a substrate having a first face and an opposing second face, wherein the substrate includes a through-substrate via (TSV); a first mold material region at the first face, wherein the first mold material region includes a first through-mold via (TMV) conductively coupled to the TSV; and a second mold material region at the second face, wherein the second mold material region includes a second TMV conductively coupled to the TSV.

公开(公告)号：US20240063178A1

公开(公告)日：2024-02-22

申请号：US17821001

申请日：2022-08-19

Applicant: Intel Corporation

Inventor： Jimin Yao ,  Adel A. Elsherbini ,  Xavier Francois Brun ,  Kimin Jun ,  Shawna M. Liff ,  Johanna M. Swan ,  Yi Shi ,  Tushar Talukdar ,  Feras Eid ,  Mohammad Enamul Kabir ,  Omkar G. Karhade ,  Bhaskar Jyoti Krishnatreya

IPC: H01L25/065 ,  H01L23/31 ,  H01L23/00

CPC classification number: H01L25/0652 ,  H01L23/3107 ,  H01L24/16 ,  H01L24/08 ,  H01L2225/06548 ,  H01L2224/16227 ,  H01L2224/08145 ,  H01L2224/13116 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13139 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13109 ,  H01L2224/13118 ,  H01L24/13 ,  H01L2224/05611 ,  H01L2224/05644 ,  H01L2224/05639 ,  H01L2224/05647 ,  H01L2224/05613 ,  H01L2224/05609 ,  H01L2224/05605 ,  H01L24/05

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a first die and a through-dielectric via (TDV) surrounded by a dielectric material in a first layer, where the TDV has a greater width at a first surface and a smaller width at an opposing second surface of the first layer; a second die, surrounded by the dielectric material, in a second layer on the first layer, where the first die is coupled to the second die by interconnects having a pitch of less than 10 microns, and the dielectric material around the second die has an interface seam extending from a second surface of the second layer towards an opposing first surface of the second layer with an angle of less than 90 degrees relative to the second surface; and a substrate on and coupled to the second layer.

公开(公告)号：US11817390B2

公开(公告)日：2023-11-14

申请号：US18090795

申请日：2022-12-29

Applicant: Intel Corporation

Inventor： Sanka Ganesan ,  Ram Viswanath ,  Xavier Francois Brun ,  Tarek A. Ibrahim ,  Jason M. Gamba ,  Manish Dubey ,  Robert Alan May

IPC: H01L23/538 ,  H01L23/367 ,  H01L23/31 ,  H01L23/00

CPC classification number: H01L23/5381 ,  H01L23/3185 ,  H01L23/367 ,  H01L23/5384 ,  H01L23/5386 ,  H01L24/16 ,  H01L2224/16227

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic component may include a substrate having a first face and an opposing second face, wherein the substrate includes a through-substrate via (TSV); a first mold material region at the first face, wherein the first mold material region includes a first through-mold via (TMV) conductively coupled to the TSV; and a second mold material region at the second face, wherein the second mold material region includes a second TMV conductively coupled to the TSV.

公开(公告)号：US20230088170A1

公开(公告)日：2023-03-23

申请号：US17481068

申请日：2021-09-21

Applicant: Intel Corporation

Inventor： Xavier Francois Brun ,  Sanka Ganesan ,  Holly Sawyer ,  William J. Lambert ,  Timothy A. Gosselin ,  Yuting Wang

IPC: H01L23/00

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a first die, having a first surface and an opposing second surface, in a first layer; a redistribution layer (RDL) on the first layer, wherein the RDL is electrically coupled to the second surface of the first die by solder interconnects, and a second die in a second layer on the RDL, wherein the second die is electrically coupled to the RDL by non-solder interconnects.