公开(公告)号：US20200041898A1

公开(公告)日：2020-02-06

申请号：US16595884

申请日：2019-10-08

Applicant: JSR CORPORATION

Inventor： Hisashi NAKAGAWA ,  Yusuke ASANO ,  Takehiko NARUOKA

IPC: G03F7/004 ,  G03F7/20

Abstract: A radiation-sensitive composition includes particles and a solvent. The particles include a first component and a second component. The first component is a hydrolyzation product or a hydrolytic condensation product of a metal compound including a hydrolyzable group, or a combination thereof; and the second component is an organic acid, an anion of the organic acid, a first compound represented by formula (1), or a combination thereof. The organic acid and the first compound each have a molecular weight of no less than 120. In the formula (1), R1 represents an organic group having a valency of n; X represents an alcoholic hydroxyl group, —NCO or —NHRa, wherein Ra represents a hydrogen atom or a monovalent organic group; and n is an integer of 2 to 4.

公开(公告)号：US20190310551A1

公开(公告)日：2019-10-10

申请号：US16449720

申请日：2019-06-24

Applicant: JSR CORPORATION

Inventor： Shinya MINEGISHI ,  Motohiro SHIRATANI ,  Yusuke ASANO ,  Hisashi NAKAGAWA ,  Takehiko NARUOKA

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/32

Abstract: Provided is a radiation-sensitive composition superior in sensitivity. A radiation-sensitive composition incudes a metal oxide having a structural unit represented by formula (1), and a solvent. In the formula (1), M represents germanium, tin or lead; R1 represents a monovalent organic group having no greater than 30 carbon atoms which includes at least one of an electron attractive group and an unsaturated bond-containing group, and bonds to M via a carbon atom.

公开(公告)号：US20190198316A1

公开(公告)日：2019-06-27

申请号：US16288354

申请日：2019-02-28

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Tomohiro ODA ,  Hitoshi OSAKI ,  Masafumi HORI ,  Takehiko NARUOKA

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/311

CPC classification number: H01L21/0271 ,  C08L25/06 ,  C08L33/10 ,  C08L2203/206 ,  C08L2312/02 ,  H01L21/02118 ,  H01L21/02282 ,  H01L21/02334 ,  H01L21/02359 ,  H01L21/28 ,  H01L21/285 ,  H01L21/31133

Abstract: A method for selectively modifying a base material surface, includes applying a composition on a surface of a base material to form a coating film. The coating film is heated. The base material includes a surface layer which includes a first region including a metal. The composition includes a first polymer and a solvent. The first polymer includes at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with the metal. It is preferred that the base material further includes a second region comprising substantially only a non-metal, and the method further includes, after the heating, removing with a rinse agent a portion formed on the second region, of the coating film. The metal is preferably a constituent of a metal substance, an alloy, an oxide, an electrically conductive nitride or a silicide.

公开(公告)号：US20190146340A1

公开(公告)日：2019-05-16

申请号：US16244151

申请日：2019-01-10

Applicant: JSR CORPORATION

Inventor： Motohiro SHIRATANI ,  Hiromu MIYATA ,  Takehiko NARUOKA

IPC: G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  C08F220/28 ,  G03F7/38

Abstract: A radiation-sensitive resin composition includes a polymer; a radiation-sensitive acid generator; and a solvent. The polymer includes a first structural unit and a second structural unit. The first structural unit includes: a first acid-labile group represented by formula (A); and an oxoacid group protected by the first acid-labile group, or a phenolic hydroxyl group protected by the first acid-labile group. The second structural unit includes: a second acid-labile group other than the first acid-labile group; and an oxoacid group protected by the second acid-labile group, or a phenolic hydroxyl group protected by the second acid-labile group.

公开(公告)号：US20170131634A1

公开(公告)日：2017-05-11

申请号：US15347113

申请日：2016-11-09

Applicant: JSR CORPORATION

Inventor： Hisashi NAKAGAWA ,  Takehiko NARUOKA ,  Tomoki NAGAI

IPC: G03F7/004 ,  G03F7/025 ,  G03F7/16

CPC classification number: G03F7/0046 ,  C07C303/32 ,  C07C309/07 ,  C07C381/12 ,  C07D409/14 ,  C08F220/14 ,  C08F220/22 ,  C08F220/28 ,  C08F220/38 ,  G03F7/025 ,  G03F7/0397 ,  G03F7/168 ,  G03F7/2002 ,  G03F7/32 ,  G03F7/38 ,  H01L21/0274

Abstract: A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid generating agent included in the generative component comprises a compound represented by the formula (B). RB3 and RB4 each independently represent a monovalent organic group, or taken together represent a cyclic structure together with the O—C—O. At least one of RB3 and RB4 comprises a halogen atom, a nitro group, a cyano group, a formyl group, a carbonyl group, a carboxy group, a sulfo group, a sulfonyl group or a combination thereof, or the cyclic structure having 4 to 30 ring atoms is a spiro cyclic structure, a fused cyclic structure or a bridged cyclic structure.

公开(公告)号：US20150323870A1

公开(公告)日：2015-11-12

申请号：US14702139

申请日：2015-05-01

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Shinya MINEGISHI ,  Takehiko NARUOKA ,  Tomoki NAGAI

IPC: G03F7/20 ,  G03F7/16 ,  C08F293/00

CPC classification number: C08F297/026 ,  C08F293/00 ,  C08L53/00 ,  G03F7/0002 ,  G03F7/039 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20

Abstract: A composition for pattern formation includes a block copolymer. The block polymer includes a first labile group at an end of a main chain of the block copolymer. The first acid liable group is capable of being dissociated by an acid or heat. The composition preferably further contains an acid generator that generates an acid upon application of an energy. The block copolymer is preferably capable of forming a phase separation structure through directed self-assembly. The first labile group is preferably represented by formula (a). R represents a monovalent organic group having 1 to 20 carbon atoms; R′ represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and * denotes a binding site to an atom at the end of the main chain of the block copolymer.

Abstract translation: 用于图案形成的组合物包括嵌段共聚物。 嵌段聚合物包括在嵌段共聚物的主链末端的第一不稳定基团。 第一个易酸性基团能够被酸或热解离。 组合物优选还包含在施加能量时产生酸的酸发生剂。 嵌段共聚物优选能够通过定向自组装形成相分离结构。 第一不稳定基团优选由式（a）表示。 R表示碳原子数1〜20的1价有机基团。 R'表示氢原子或碳原子数1〜20的1价有机基团。 和*表示与嵌段共聚物主链末端的原子的结合位点。

公开(公告)号：US20210166935A1

公开(公告)日：2021-06-03

申请号：US17148729

申请日：2021-01-14

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Tomohiro ODA ,  Hitoshi OSAKI ,  Masafumi HORI ,  Takehiko NARUOKA

IPC: H01L21/027 ,  C08F112/08 ,  C09D125/06 ,  H01L21/28 ,  H01L21/321 ,  H01L21/285 ,  C08F8/00 ,  H01L21/02 ,  H01L21/311

Abstract: A composition for use in selective modification of a base material surface includes a polymer having, at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with a metal, and a solvent.

公开(公告)号：US20190194365A1

公开(公告)日：2019-06-27

申请号：US16289938

申请日：2019-03-01

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Tomohiro ODA ,  Masafumi HORI ,  Hitoshi OSAKI ,  Takehiko NARUOKA

IPC: C08F12/20 ,  C23C16/455 ,  C08F12/08 ,  C08F20/22 ,  B05D7/24 ,  B05D7/14 ,  B05D3/10 ,  B05D3/14

CPC classification number: C08F12/20 ,  B05D3/02 ,  B05D3/107 ,  B05D3/148 ,  B05D7/14 ,  B05D7/24 ,  C08F12/08 ,  C08F20/22 ,  C08L101/04 ,  C23C16/45525

Abstract: A composition includes a first polymer and a solvent. The first polymer includes a first structural unit including a fluorine atom, and a group including a first functional group at an end of a main chain or a side chain of the first polymer. The first functional group is capable of forming a bond with a metal or a metalloid. The first structural unit preferably includes a fluorinated hydrocarbon group. The first structural unit is preferably derived from a (meth)acrylic ester containing a fluorine atom, or a styrene compound containing a fluorine atom. The first structural unit preferably contains 6 or more fluorine atoms.

公开(公告)号：US20170269476A1

公开(公告)日：2017-09-21

申请号：US15611039

申请日：2017-06-01

Applicant: JSR CORPORATION

Inventor： Hisashi NAKAGAWA ,  Motohiro SHIRATANI ,  Takehiko NARUOKA ,  Tomoki NAGAI

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  C08F212/14 ,  G03F7/38 ,  G03F7/32 ,  G03F7/40 ,  C08F220/18 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C08F212/14 ,  C08F220/18 ,  G03F7/0046 ,  G03F7/0047 ,  G03F7/0048 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2037 ,  G03F7/322 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40

Abstract: A photoresist composition includes a radiation-sensitive acid generator, particles, and a first solvent. The radiation-sensitive acid generator is capable of generating an acid upon irradiation with a radioactive ray, an action of the acid allowing a solubility of a film made from the photoresist composition in a developer solution to be altered. The particles include a metal element and have a hydrodynamic radius as determined by a dynamic light scattering analysis of no greater than 20 nm. The photoresist composition may include an acid-labile compound including an acid-labile group. The radiation-sensitive acid generator may be the acid-labile compound including a group that is capable of generating an acid upon exposure to a radioactive ray.

公开(公告)号：US20170248847A1

公开(公告)日：2017-08-31

申请号：US15595030

申请日：2017-05-15

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Takehiko NARUOKA ,  Shinya MINEGISHI ,  Kaori SAKAI ,  Tomoki NAGAI

IPC: G03F7/038 ,  H01L21/311 ,  G03F7/039 ,  G03F7/004 ,  C09D153/00 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  G03F7/11 ,  H01L21/027 ,  G03F7/16

CPC classification number: G03F7/038 ,  B05D3/064 ,  C08L2201/56 ,  C09D125/14 ,  C09D153/00 ,  G03F7/0002 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/039 ,  G03F7/11 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/322 ,  G03F7/38 ,  H01L21/027 ,  H01L21/0271 ,  H01L21/0332 ,  H01L21/3065 ,  H01L21/31138

Abstract: A composition for a base of a directed self-assembling film includes a compound including an oxo acid group, and a solvent. The compound is preferably represented by formula (1). A represents an organic group having 10 or more carbon atoms and having a valency of n. B represents an oxo acid group. n is an integer of 1 to 200. In a case where n is 2 or greater, a plurality of Bs are identical or different. AB)n   (1)