Ceramic substrate, ceramic heater, electrostatic chuck and wafer prober for use in semiconductor producing and inspecting devices
    20.
    发明授权
    Ceramic substrate, ceramic heater, electrostatic chuck and wafer prober for use in semiconductor producing and inspecting devices 有权
    陶瓷基板,陶瓷加热器,静电卡盘和晶圆探针,用于半导体生产和检测装置

    公开(公告)号:US07078655B1

    公开(公告)日:2006-07-18

    申请号:US10048490

    申请日:2000-02-18

    IPC分类号: H05B3/68

    摘要: A ceramic substrate for semiconductor manufacture and/or inspection which is conducive to decrease in α-rays radiated to prevent electrical errors, and to decrease an electrostatic chucking force such as heater or wafer prober, generation of particles, and circuit defects. The ceramic substrate is configured such that the level of α-rays radiated from the surface of the ceramic substrate is not higher than 0.250 c/cm2.hr.

    摘要翻译: 一种用于半导体制造和/或检查的陶瓷衬底,其有助于减少辐射的α射线以防止电气错误,并且减少诸如加热器或晶片探针的静电吸附力,产生颗粒和电路缺陷。 陶瓷基板被配置为使得从陶瓷基板的表面辐射的α射线的电平不高于0.250c / cm 2·hr。