Abstract:
Provided is a semiconductor device that can directly compare two negative potentials. The semiconductor device includes a first to a third transistor and a load and is configured to compare a first negative potential and a second negative potential. The first negative potential and the second negative potential are input to a gate of the first transistor and a gate of the second transistor, respectively. Each drain of the first transistor and the second transistor is electrically connected to the load. The third transistor serves as a current source. The first transistor and the second transistor each include a backgate. A positive potential is input to the backgates.
Abstract:
Provided is a semiconductor device capable of holding data for a long period. The semiconductor device includes first to third transistors, a capacitor, and a circuit. The third transistor includes a first gate and a second gate. A gate of the first transistor is electrically connected to a first terminal of the capacitor. A first terminal of the first transistor is electrically connected to the second gate. A second terminal of the first transistor is electrically connected to the circuit. A gate of second transistor is electrically connected to a first terminal of the second transistor. A first terminal of the second transistor is electrically connected to the second gate. A second terminal of the second transistor is electrically connected to a first terminal of the capacitor. The circuit is configured to generate a negative potential. A channel formation region of the first transistor preferably includes an oxide semiconductor.
Abstract:
A semiconductor device capable of holding data for a long time is provided. The semiconductor device includes a first transistor, a second transistor, and a circuit. The first transistor includes a first gate and a second gate. The first transistor includes a first semiconductor in a channel formation region. The first gate and the second gate overlap with each other in a region with the first semiconductor provided therebetween. The second transistor includes a second semiconductor in a channel formation region. A first terminal of the second transistor is electrically connected to a gate of the second transistor and the second gate. A second terminal of the second transistor is electrically connected to the circuit. The circuit has a function of generating a negative potential. The second semiconductor has a wider bandgap than the first semiconductor.
Abstract:
A novel semiconductor device that can write and read multilevel data is provided. A memory cell includes a bit line, a power supply line, first and second nodes, first to fourth transistors, and first and second capacitors. One of two divided multilevel data is written to the first node through the first transistor. The other of the divided multilevel data is written to the second node through the second transistor. A gate of the third transistor is connected to the first node, and a gate of the fourth transistor is connected to the second node. The third and fourth transistors control electrical continuity between the bit line and the power supply line. Each of the first and second transistors preferably includes an oxide semiconductor in a semiconductor layer.
Abstract:
In a memory module including a memory cell array including memory cells arranged in matrix, each including a first transistor using an oxide semiconductor and a first capacitor; a reference cell including a p-channel third transistor, a second capacitor, and a second transistor using an oxide semiconductor; and a refresh timing detection circuit including a resistor and a comparator, wherein when a potential is supplied to the first capacitor through the first transistor, a potential is supplied to the second capacitor through the second transistor, wherein a drain current value of the third transistor is changed in accordance with the potential stored in the second capacitor, and wherein when the drain current value of the third transistor is higher than a given value, a refresh operation of the memory cell array and the reference cell are performed.
Abstract:
A display apparatus with high luminance and a long lifetime is provided. The display apparatus includes a first layer and a second layer positioned above the first layer. The first layer includes a substrate and a plurality of driver circuit regions, and the second layer includes a plurality of display regions. The substrate is a glass substrate. Each of the plurality of driver circuit regions includes a driver circuit, and the driver circuit includes a transistor including silicon in a channel formation region. Each of the plurality of display regions includes a pixel, and the pixel includes a light-emitting diode and a transistor including a metal oxide in a channel formation region. Specifically, the light-emitting diode is preferably a micro light-emitting diode. The driver circuit included in one of the plurality of driver circuit regions has a function of driving the display pixel included in one of the plurality of display regions.
Abstract:
[Problem] To provide a semiconductor device suitable for miniaturization. To provide a highly reliable semiconductor device. To provide a semiconductor device with improved operating speed. [Solving Means] A semiconductor device including a memory cell including first to cth (c is a natural number of 2 or more) sub memory cells, wherein: the jth sub memory cell includes a first transistor, a second transistor, and a capacitor; a first semiconductor layer included in the first transistor and a second semiconductor layer included in the second transistor include an oxide semiconductor; one of terminals of the capacitor is electrically connected to a gate electrode included in the second transistor; the gate electrode included in the second transistor is electrically connected to one of a source electrode and a drain electrode which are included in the first transistor; and when j≥2, the jth sub memory cell is arranged over the j−1th sub memory cell.
Abstract:
A high-definition display apparatus with a large diagonal size is provided. The display apparatus includes a first layer and a second layer positioned above the first layer. The first layer includes a substrate and a plurality of circuit regions, and the second layer includes a plurality of display regions. The substrate is a glass substrate. Each of the plurality of circuit regions includes a driver circuit, and the driver circuit includes a transistor including low-temperature polysilicon in a channel formation region. Each of the plurality of display regions includes a display pixel, and the display pixel includes a light-emitting device and a transistor including a metal oxide in a channel formation region. The driver circuit included in one of the plurality of circuit regions has a function of driving the display pixel included in one of the plurality of display region.
Abstract:
A semiconductor device having a light sensing function and including a high-resolution display portion is provided. The semiconductor device includes a plurality of pixels, and the pixels each include first and second light-receiving devices, first to fifth transistors, a capacitor, and a first wiring. One electrode of the first light-receiving device is electrically connected to the first wiring, and the other electrode is electrically connected to one of a source and a drain of the first transistor. One electrode of the second light-receiving device is electrically connected to the first wiring, and the other electrode is electrically connected to one of a source and a drain of the second transistor. The other of the source and the drain of the second transistor is electrically connected to the other of the source and the drain of the first transistor. The other of the source and the drain of the first transistor is electrically connected to one electrode of the capacitor, one of a source and a drain of the third transistor, and a gate of the fourth transistor.
Abstract:
A highly integrated semiconductor device is provided. The semiconductor device includes a substrate, a prism-like insulator, a memory cell string including a plurality of transistors connected in series. The prism-like insulator is provided over the substrate. The memory cell string is provided on the side surface of the prism-like insulator. The plurality of transistors each include a gate insulator and a gate electrode. The gate insulator includes a first insulator, a second insulator, and a charge accumulation layer. The charge accumulation layer is positioned between the first insulator and the second insulator.