公开(公告)号：US20240170252A1

公开(公告)日：2024-05-23

申请号：US18423564

申请日：2024-01-26

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Yanko Sarov ,  Dirk Zeidler ,  Thomas Schmid ,  Georg Kurij ,  Marcus Kaestner ,  Ulrich Bihr ,  Wolfgang Singer

IPC: H01J37/317 ,  H01J37/09 ,  H01J37/12 ,  H01J37/153 ,  H01J37/28 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/09 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3007 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/20207 ,  H01J2237/30488

Abstract: A multi-beam generation unit for a multi-beam system has larger individual focusing power for each of a plurality of primary charged particle beamlets. The multi-beam generation unit comprises an active terminating multi-aperture plate. The terminating multi-aperture plate can be used for a larger focusing range for an individual stigmatic focus spot adjustment of each beamlet of a plurality of primary charged particle beamlets.

公开(公告)号：US20170309449A1

公开(公告)日：2017-10-26

申请号：US15633639

申请日：2017-06-26

Applicant: Hermes Microvision, Inc.

Inventor： Weiming REN ,  Shuai LI ,  Xuedong LIU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/12 ,  H01J37/1472 ,  H01J2237/04924 ,  H01J2237/083 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：US09691586B2

公开(公告)日：2017-06-27

申请号：US15403749

申请日：2017-01-11

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/12 ,  H01J37/1472 ,  H01J2237/04924 ,  H01J2237/083 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：US09673016B2

公开(公告)日：2017-06-06

申请号：US15048650

申请日：2016-02-19

Applicant: Industry-University Cooperation Foundation Sunmoon

Inventor： Ho Seob Kim ,  Tae Sik Oh ,  Dae Wook Kim ,  Hyung Woo Kim ,  Seung Jun Ahn

IPC: B82Y10/00 ,  H01J37/063 ,  H01J37/147 ,  H01J37/065 ,  H01J37/073

CPC classification number: H01J37/065 ,  H01J37/073 ,  H01J2237/04924 ,  H01J2237/063 ,  H01J2237/06341 ,  H01J2237/0635 ,  H01J2237/083 ,  H01J2237/1205

Abstract: Disclosed is a micro-electron column including nanostructure tips each of which has a tubular, columnar, or blocky structure ranging in size from several nanometers to dozens of nanometers. In the micro-electron column, the nanostructure tips can easily emit electrons because a high electric field is generated at the end of the nanostructure tips when a voltage is applied to the nanostructure tips, and an induction electrode is disposed between the electron emitter and a source lens so as to help electrons emitted from the electron emitter to enter an aperture of a first lens electrode layer of the source lens, thereby realizing improved performance of the micro-electron column. In the micro-electron column, the size of the nanostructure tips may be larger than that of the aperture of a source lens.

公开(公告)号：US20170025243A1

公开(公告)日：2017-01-26

申请号：US15216258

申请日：2016-07-21

Applicant: Hermes Microvision, Inc.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/10 ,  H01J37/06

CPC classification number: H01J37/1474 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/1478 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

Abstract translation: 提出了一种用于以高分辨率和高吞吐量观察样品的多光束装置。 在该装置中，源极转换单元通过偏转平行的一次电子束的多个子束形成一个单个电子源的多个并行图像，并且一个物镜将多个偏转的子束聚焦在样本表面上并形成多个探针点 上。 使用可移动聚光透镜来准直一次电子束并改变多个探针点的电流，前束形成装置削弱一次电子束的库仑效应，并且源转换单元使尺寸最小化 通过最小化和补偿物镜和聚光透镜的离轴像差来实现多个探测点。

公开(公告)号：US20160268096A1

公开(公告)日：2016-09-15

申请号：US15065342

申请日：2016-03-09

Applicant: Hermes Microvision, Inc.

Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/10 ,  H01J37/28 ,  H01J37/06

CPC classification number: H01J37/28 ,  H01J37/12 ,  H01J37/1472 ,  H01J2237/04924 ,  H01J2237/083 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

Abstract translation: 提出了一种用于以高分辨率和高吞吐量观察样品的多光束装置。 在该装置中，源转换单元将单个电子源改变为虚拟多源阵列，初级投影成像系统投射阵列以在样本上形成多个探针点，并且聚光透镜调节多个探针的电流 斑点。 在源转换单元中，图像形成装置在子束极限装置的上游，从而产生较少散射的电子。 图像形成装置不仅形成虚拟多源阵列，而且补偿多个探测点的离轴像差。

公开(公告)号：US20160247657A1

公开(公告)日：2016-08-25

申请号：US14631729

申请日：2015-02-25

Applicant: Ho Seob KIM ,  Tae Sik OH ,  Dae Wook KIM ,  Seung Jun AHN ,  Hyung Woo KIM

Inventor： Ho Seob KIM ,  Tae Sik OH ,  Dae Wook KIM ,  Seung Jun AHN ,  Hyung Woo KIM

IPC: H01J37/063 ,  H01J37/10 ,  H01J37/147 ,  H01J37/065

CPC classification number: H01J37/063 ,  H01J37/073 ,  H01J2237/0635 ,  H01J2237/1205 ,  H01J2237/1215

Abstract: Disclosed is a micro-electron column having nanostructure tips. The micro-electro column includes an electron emission source that is provided with a plurality of nanostructure tips and emits electrons, a source lens, a deflector, and a focusing lens. The nanostructure tips of the electron emission source spread over an area that is larger than that of an aperture of a first lens electrode of a source lens, which is nearest to the electron emission source.

Abstract translation: 公开了具有纳米结构尖端的微电子柱。 微电极柱包括具有多个纳米结构尖端并发射电子的电子发射源，源极透镜，偏转器和聚焦透镜。 电子发射源的纳米结构尖端分布在比离电子发射源最近的源透镜的第一透镜电极的孔径大的区域上。

公开(公告)号：US09390891B2

公开(公告)日：2016-07-12

申请号：US14483740

申请日：2014-09-11

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Shih-Chi Wang ,  Tsung-Chih Chien ,  Hui-Min Huang ,  Jaw-Jung Shin ,  Shy-Jay Lin ,  Burn Jeng Lin

IPC: H01J37/00 ,  H01J37/10 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/10 ,  H01J37/12 ,  H01J37/20 ,  H01J2237/0435 ,  H01J2237/1205

Abstract: An apparatus for use in a charged particle multi-beam lithography system is disclosed. The apparatus includes a plurality of charged particle doublets each having a first aperture and each configured to demagnify a beamlet incident upon the first aperture thereby producing a demagnified beamlet. The apparatus further includes a plurality of charged particle lenses each associated with one of the charged particle doublets, each having a second aperture, and each configured to receive the demagnified beamlet from the associated charged particle doublet and to realize one of two states: a switched-on state, wherein the demagnified beamlet is allowed to travel along a desired path, and a switched-off state, wherein the demagnified beamlet is prevented from traveling along the desired path. In embodiments, the first aperture is greater than the second aperture, thereby improving particle beam efficiency in the charged particle multi-beam lithography system.

Abstract translation: 公开了一种用于带电粒子多光束光刻系统的装置。 该装置包括多个带电荷的微粒双峰，每个具有第一孔，并且每个被配置成使入射在第一孔上的子束缩小，从而产生缩小的子束。 该装置还包括多个带电粒子透镜，每个与带电粒子双重体中的一个相关联，每个具有第二孔径，并且每个被配置成从相关联的带电粒子双重体接收已缩小的子束并实现两种状态之一： 在状态下，其中允许缩小的子束沿着期望的路径行进，并且关闭状态，其中防止了缩小的子束沿所需的路径行进。 在实施例中，第一孔径大于第二孔径，从而提高带电粒子多光束光刻系统中的粒子束效率。

公开(公告)号：US20160013017A1

公开(公告)日：2016-01-14

申请号：US14861737

申请日：2015-09-22

Applicant: Frederick A. Flitsch

Inventor： Frederick A. Flitsch

IPC: H01J37/317 ,  H01J37/248 ,  H05K3/32 ,  H01J37/20

CPC classification number: H01J37/244 ,  B82B3/00 ,  G03F9/00 ,  H01J9/022 ,  H01J37/06 ,  H01J37/08 ,  H01J37/20 ,  H01J37/248 ,  H01J37/317 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/20 ,  H01J2237/303 ,  H01J2237/304 ,  H01J2237/3174 ,  H01J2237/31759 ,  H01J2237/31798 ,  Y10T29/49004

Abstract: The present invention provides apparatus for an imaging system comprising a multitude of imaging elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system are discussed.

Abstract translation: 本发明提供一种用于成像系统的装置，其包括在基板上的多个成像元件。 在一些实施例中，基底可以近似圆形，半径约为一英寸。 讨论了与使用和产生成像系统有关的各种方法。

公开(公告)号：US08987679B2

公开(公告)日：2015-03-24

申请号：US13722873

申请日：2012-12-20

Applicant: Mapper Lithography IP B.V.

Inventor： Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

IPC: H01J37/12 ,  H01J3/18

CPC classification number: H01J3/18 ,  H01J37/12 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/15

Abstract: The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.

Abstract translation: 本发明涉及一种用于将多个带电粒子子束引导到位于下游方向的图像平面上的投影透镜组合模块，以及用于组装这种投影透镜组件的方法。 特别地，本发明公开了一种具有增强的结构完整性和/或其最下游电极的放置精度提高的模块化投影透镜组件。