Abstract:
In exemplary embodiments, a dot pattern technique is provided with flexible length of data to be registered and with enhanced security by arranging a dot pattern to be disposed on a printed material, especially a block containing the dot pattern, on the basis of a new rule.
Abstract:
According to one embodiment, a memory control device includes: a buffer memory; a cache memory performing caching for the buffer memory on a unit-data-by-unit-data basis; and an adding module adding ByteECC data to the unit data.
Abstract:
Disclosed is a method of manufacturing an electronic device, that includes obtaining a stack of the first electronic component and the second electronic component, while placing a resin layer which contains a flux-active compound and a thermosetting resin, between the first terminals and the second terminals; bonding the first terminals and the second terminals with solder, by heating the stack at a temperature not lower than the melting point of solder layers on the first terminals, while pressurizing the stack using a fluid; and curing the resin layer. The duration from the point of time immediately after the start of heating of the stack, up to the point of time when the temperature of the stack reaches the melting point of the solder layers, is set to 5 seconds or longer, and 15 minutes or shorter.
Abstract:
In designing supersonic aircrafts, a method of designing a natural laminar flow wing is provided which reduces friction drag by delaying boundary layer transition under flight conditions of actual aircrafts. A target Cp distribution on wing upper surface, suited to natural laminarization in which boundary layer transition is delayed rearward in desired Reynolds number states, is defined by a functional type having as coefficients parameters depending on each spanwise station, a sensitivity analysis employing a transition analysis method is applied to the parameters, and a search is performed for the optimum combination of parameters to delay transition rearward.
Abstract:
A process control method comprises adjusting a process condition in consideration of a performance variation among a plurality of manufacturing apparatuses, the performance variation affecting a finished shape of a pattern used to manufacture a semiconductor device, running a simulation of the finished shape under the adjusted process condition, extracting a dangerous point of the pattern affecting satisfaction from the result of the simulation, comparing a first process capability serving as a judgment standard to find whether a production schedule of the device is achieved with a second capability serving to form a dangerous pattern containing the dangerous point, and improving the second process when the second process capability is lower than the first process capability.
Abstract:
A pattern management method includes extracting patterns having process margins equal to or below a predetermined value from a chip layout of an integrated circuit, screening a plurality of types of representative patterns from the extracted pattern, extracting patterns closest to the most outer periphery of the chip from the representative patterns, and representatively managing the extracted patterns which is closest to the most outer periphery of the chip.
Abstract:
An information processing apparatus includes a card slot to which a card-type medium is inserted, a determination unit configured to determine an operation mode, from among a first, second and third operation modes, which attains the highest speed of data communication between the information processing apparatus and the cardtype medium on the basis of a first, second and third communication speeds and the interruption-preventing maximum data size, and a data communication unit configured to perform data communication between the information processing apparatus and the card-type medium in the operation mode which attains the highest speed of the data communication and which is selected from among the first to third operation modes by the determination unit.
Abstract:
A method for generating a pattern includes reading out an interconnect layout and a hole layout, the interconnect layout prescribing interconnect patterns, the hole layout prescribing hole patterns configured to connect to the interconnect patterns; extracting one of the hole patterns to be connected within the same interconnect layer level to one of the interconnect patterns in a pattern processing area; extracting a first processing area including the extracted hole pattern; calculating a first pattern density of the interconnect patterns included in the first processing area; and generating first additional patterns in the first processing area based on the first pattern density.
Abstract:
An evaluation method for lithography apparatus including a coating unit, an exposure unit, a heating unit and a development unit, the evaluation method including forming an evaluation resist pattern by using the lithography apparatus, the evaluation resist pattern including first and second evaluation patterns, the first and second evaluation patterns having different peripheral environments, measuring dimensions of the first and second evaluation patterns to obtain a dimensional difference between the first and second resist evaluation patterns, estimating an exposure dose of a resist when the resist is exposed by the exposure unit, the estimating the exposure dose being performed based on the dimensional difference between the first and second resist evaluation patterns, and estimating an effective heating temperature of the resist when the resist is heated by the heating unit, the estimating the effective heating temperature being performed based on the estimated exposure dose and the dimensional difference.
Abstract:
A dot pattern and a code pattern, a plurality of which can be printed on a small area, are provided. In the dot pattern, a first and a second dot patterns are superimposed and arranged. The first and the second dot patterns provide a plurality of reference dots in regions of blocks on which predetermined dots are arranged, arrange a plurality of virtual reference points defined by the reference dots, arrange information dots that define information by distances and directions from the virtual reference points, and further define at least orientations and sizes of the blocks based on arrangements of the reference dots as indexes of the blocks. The block is arranged so that part of or entire the reference dots and/or the virtual reference dots of the first and second dot patterns are superimposed together, and the number of the block is one, or a plurality of the blocks are repeatedly arranged in lateral and longitudinal directions.