Abstract:
An integrated circuit die has a first die pad for receiving a first voltage and a second die pad for receiving a second voltage. The second voltage is less than the first voltage and is generated by a voltage regulator that receives the first voltage. A first circuit which is operable at the first voltage is in the integrated circuit die. A second circuit which is operable at the second voltage is in the integrated circuit die and is connected to the second die pad. The voltage regulator is enabled by a controller.
Abstract:
A memory device (and method of making and using the memory device) includes a first electrode of conductive material, a second electrode of conductive material, and a layer transition metal oxide material that includes first and second elongated portions meeting each other at a sharp corner. Each of the first and second elongated portions is disposed between and in electrical contact with the first and second electrodes.
Abstract:
A non-volatile memory device comprises a semiconductor substrate of a first conductivity type. An array of non-volatile memory cells is located in the semiconductor substrate and arranged in a plurality of rows and columns. Each memory cell comprises a first region on a surface of the semiconductor substrate of a second conductivity type, and a second region on the surface of the semiconductor substrate of the second conductivity type. A channel region is between the first region and the second region. A word line overlies a first portion of the channel region and is insulated therefrom, and adjacent to the first region and having little or no overlap with the first region. A floating gate overlies a second portion of the channel region, is adjacent to the first portion, and is insulated therefrom and is adjacent to the second region. A coupling gate overlies the floating gate. A bit line is connected to the first region. During the operations of program, read, or erase, a negative voltage can be applied to the word lines and/or coupling gates of the selected or unselected memory cells.
Abstract:
A memory device array with spaced apart parallel isolation regions formed in a semiconductor substrate, with an active region between each pair of adjacent isolation regions. Each isolation region includes a trench formed into the substrate surface and an insulation material formed in the trench. Portions of a top surface of the insulation material are recessed below the surface of the substrate. Each active region includes a column of memory cells each having spaced apart first and second regions with a channel region therebetween, a floating gate over a first channel region portion, and a select gate over a second channel region portion. The select gates are formed as continuous word lines extending perpendicular to the isolation regions and each forming the select gates for one row of the memory cells. Portions of each word line extend down into the trenches and disposed laterally adjacent to sidewalls of the trenches.
Abstract:
The present invention relates to a flash memory device with EEPROM functionality. The flash memory device is byte-erasable and bit-programmable.
Abstract:
The present invention relates to a flash memory device with EEPROM functionality. The flash memory device is byte-erasable and bit-programmable.
Abstract:
A semiconductor device having a silicon substrate with a first area including a buried insulation layer with silicon over and under the insulation layer and a second area in which the substrate lacks buried insulation disposed under any silicon. Logic devices are formed in the first area having spaced apart source and drain regions formed in the silicon that is over the insulation layer, and a conductive gate formed over and insulated from a portion of the silicon that is over the insulation layer and between the source and drain regions. Memory cells are formed in the second area that include spaced apart second source and second drain regions formed in the substrate and defining a channel region therebetween, a floating gate disposed over and insulated from a first portion of the channel region, and a select gate disposed over and insulated from a second portion of the channel region.
Abstract:
A three-dimensional NOR flash memory system is disclosed. The system optionally comprises configurable standard pins, a configurable output buffer, and a configurable input buffer.
Abstract:
An integrated circuit die has a first die pad for receiving a first voltage and a second die pad for receiving a second voltage. The second voltage is less than the first voltage and is generated by a voltage regulator that receives the first voltage. A first circuit which is operable at the first voltage is in the integrated circuit die. A second circuit which is operable at the second voltage is in the integrated circuit die and is connected to the second die pad. The voltage regulator is enabled by a controller.