公开(公告)号：US20080156992A1

公开(公告)日：2008-07-03

申请号：US11955711

申请日：2008-03-12

Applicant: Kejun Kang ,  Zhiqiang Chen ,  Qitian Miao ,  Yuanjing Li ,  Nan Jiang ,  Hua Peng ,  Xuewu Wang ,  Jinning Liang ,  Shangmin Sun ,  Zhizhong Liang ,  Quanwei Song ,  Yucheng Wu ,  Yanjun Han ,  Guang Yang ,  Bin Hu ,  Jingyu Gu

Inventor： Kejun Kang ,  Zhiqiang Chen ,  Qitian Miao ,  Yuanjing Li ,  Nan Jiang ,  Hua Peng ,  Xuewu Wang ,  Jinning Liang ,  Shangmin Sun ,  Zhizhong Liang ,  Quanwei Song ,  Yucheng Wu ,  Yanjun Han ,  Guang Yang ,  Bin Hu ,  Jingyu Gu

IPC: G01N23/00

CPC classification number: G01V5/0008 ,  G01V5/0016

Abstract: The present invention discloses a mobile cantilever door-type container inspection system, in the art of radiation scanning imaging inspection technology. The system according to the present invention comprises a moveable scanning apparatus formed by a scanning frame and a remote control device, wherein the scanning frame comprises a radiation source and some detectors, wherein the radiation source or an apparatus cabin wherein the radiation source is disposed is connected with an L-shaped cantilever structure to form a door-type scanning frame, wherein beneath the radiation source or the apparatus cabin wherein the radiation source is disposed are provided with rollers that can reciprocatingly move on rails and are controlled by drive means. The detectors are disposed in a cross beam and a vertical beam of the cantilever structure of the door-type scanning frame. Rays of the radiation source are right in alignment with rows of detectors in the cantilever structure. The container truck to be inspected can pass through the door-like frame formed by the door-type scanning frame. Due to the cantilever structure, the inspection system is advantageous in stable operation, good-quality images, and high reliability.

Abstract translation: 本发明公开了一种在辐射扫描成像检测技术领域的移动式悬臂门式容器检查系统。 根据本发明的系统包括由扫描框架和遥控装置形成的可移动扫描装置，其中扫描框架包括辐射源和一些检测器，其中辐射源或其中设置辐射源的装置舱是 与L形悬臂结构连接以形成门型扫描框架，其中设置放射源的辐射源或设备舱下方设置有能够在轨道上往复运动并由驱动装置控制的辊。 检测器设置在门型扫描框架的悬臂结构的横梁和垂直梁中。 辐射源的光线与悬臂结构中的检测器行对齐。 要检查的集装箱车可以通过由门型扫描架形成的门状框架。 由于悬臂结构，检测系统运行平稳，图像质量好，可靠性高。

公开(公告)号：US20060225024A1

公开(公告)日：2006-10-05

申请号：US11096613

申请日：2005-03-31

Applicant: Bin Hu ,  Vivek Singh ,  Victor Bashurin ,  Yuri Bogunenko

Inventor： Bin Hu ,  Vivek Singh ,  Victor Bashurin ,  Yuri Bogunenko

IPC: G06F17/50

CPC classification number: G03F1/36

Abstract: Faster synthesis of photolithography mask modifications is described. In one embodiment, the invention includes synthesizing a first binary photolithography mask, developing perturbations to an estimated electric field generated by the first mask in use, and synthesizing a second binary photolithography mask by applying the perturbations to the first mask.

Abstract translation: 描述了更快的光刻掩模修改的合成。 在一个实施例中，本发明包括合成第一二进制光刻掩模，对使用中由第一掩模产生的估计电场产生扰动，以及通过将扰动应用于第一掩模来合成第二二进制光刻掩模。

公开(公告)号：US20060203962A1

公开(公告)日：2006-09-14

申请号：US11285974

申请日：2005-11-23

Applicant: Bin Hu ,  Shangmin Sun ,  Yucheng Wu ,  Nan Jiang ,  Zhizhong Liang ,  Wanquan Shen ,  Ning Li

Inventor： Bin Hu ,  Shangmin Sun ,  Yucheng Wu ,  Nan Jiang ,  Zhizhong Liang ,  Wanquan Shen ,  Ning Li

IPC: G01N23/04

CPC classification number: G01V5/0016 ,  G01N23/04

Abstract: The present invention discloses a scanning arm and a train inspection system by imaging through radiation having the scanning arm. The train inspection system by imaging through radiation comprises a scanning arm, a detector bracket with detector arrays mounted thereon, a radiation source, a calibration device, a front collimator and a rear collimator. The scanning arm includes a rigid middle inclining section; an upper horizontal section and a lower horizontal section which are located at upper and lower ends of the rigid middle inclining section respectively and supported on a construction base; and vibration damping elements arranged between the upper horizontal section and the construction base, and between the lower horizontal section and the construction base. The detector bracket is fixedly connected with said upper horizontal section. The radiation source is suspended from the lower horizontal section by a supporting abutment. The calibration device is fixed on the horizontal ground and faces x-ray emitted from the radiation source. The front collimator is suspended from the middle inclining section, and the calibration device is located between the front collimator and the radiation source. The rear collimator is suspended from the middle inclining section, and the front collimator is located between the calibration device and the rear collimator. The sector-shaped x-ray emitted from the radiation source penetrate through the calibration device, the front collimator, the rear collimator and the train to be inspected sequentially so as to be received by the detector array provided on the detector bracket. Compared with the prior arts, the train inspection system by imaging through radiation of the present invention is advantageous in reasonable designing, good adaptation, reliable construction, stable imaging and reduced occupied area. Accordingly, the train inspection system by imaging through radiation of the present invention is advantageously applicable to inspection of trains for the customs.

公开(公告)号：US20050244728A1

公开(公告)日：2005-11-03

申请号：US11174336

申请日：2005-06-29

Applicant: Peng Liu ,  Vivek Singh ,  Bin Hu

Inventor： Peng Liu ,  Vivek Singh ,  Bin Hu

IPC: G03C5/00 ,  G03F9/00 ,  G06F17/50 ,  H01L21/76

CPC classification number: G06F17/5081 ,  G03F1/36 ,  G06F2217/12 ,  Y02P90/265

Abstract: Systems, techniques, and approaches to quickly generate mask patterns, synthesize near-fields, and design masks. In one aspect, a mask may be designed by modeling the transmitted field using a library of corrections and a fast field model.

Abstract translation: 快速生成掩模图案，合成近场和设计蒙版的系统，技术和方法。 在一个方面，可以通过使用校正库和快速场模型对所发送的场进行建模来设计掩模。

公开(公告)号：US20050215183A1

公开(公告)日：2005-09-29

申请号：US11101815

申请日：2005-04-08

Applicant: Junaid Siddiqui ,  Bin Hu

Inventor： Junaid Siddiqui ,  Bin Hu

IPC: B24B37/00 ,  B24B1/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  H01L21/321

CPC classification number: H01L21/3212 ,  C09G1/02 ,  C09K3/1463

Abstract: A composition and associated method for chemical mechanical planarization (or other polishing) are described. The composition contains an abrasive, a dielectric protector comprising a polyvinylpyridine-N-oxide polymer, an oxiding agent, and water. The composition affords minimization of local erosion effects and possesses high selectivities for metal and barrier material removal in relation to dielectric layer materials in metal CMP. The composition is particularly useful in conjunction with the associated method for metal CMP applications (e.g., step 1 copper CMP processes and step 2 copper CMP processes).

Abstract translation: 描述了用于化学机械平面化（或其它抛光）的组合物和相关方法。 组合物含有研磨剂，包含聚乙烯基吡啶-N-氧化物聚合物，氧化剂和水的介电保护剂。 该组合物使局部侵蚀效应最小化，并且具有与金属CMP中介电层材料相关的金属和阻挡材料去除的高选择性。 该组合物特别适用于金属CMP应用的相关方法（例如，步骤1铜CMP工艺和步骤2铜CMP工艺）。

公开(公告)号：US20050194563A1

公开(公告)日：2005-09-08

申请号：US11032593

申请日：2005-01-10

Applicant: Junaid Siddiqui ,  Timothy Compton ,  Bin Hu ,  Robin Richards ,  Saifi Usmani

Inventor： Junaid Siddiqui ,  Timothy Compton ,  Bin Hu ,  Robin Richards ,  Saifi Usmani

IPC: B24B37/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  H01L21/321 ,  C09K13/00 ,  B44C1/22 ,  C23F1/00 ,  H01L21/302

CPC classification number: C09G1/02 ,  H01L21/3212

Abstract: A composition and associated method for chemical mechanical planarization (or other polishing) are described. The composition comprises an abrasive and a tricine-type or bicine-type compound. The composition possesses high selectivities for removal of copper in relation to tantalum and dielectric materials whilst minimizing local dishing and erosion effects in CMP. The composition may further comprise an oxidizing agent in which case the composition is particularly useful in conjunction with the associated method for metal CMP applications (e.g., copper CMP).

Abstract translation: 描述了用于化学机械平面化（或其它抛光）的组合物和相关方法。 组合物包含研磨剂和三羟甲基型或二亚胺型化合物。 该组合物具有相对于钽和介电材料去除铜的高选择性，同时最小化CMP中的局部凹陷和侵蚀效应。 组合物还可以包含氧化剂，在这种情况下，组合物特别适用于金属CMP应用的相关方法（例如，铜CMP）。

公开(公告)号：US09504690B2

公开(公告)日：2016-11-29

申请号：US14005430

申请日：2012-03-16

Applicant: Craig A. Coburn ,  Stuart B. Rosenblum ,  Joseph A. Kozlowski ,  Richard Soll ,  Hao Wu ,  Bin Hu ,  Bin Zhong ,  Dahai Wang ,  Changmao Shen ,  Fei Sun

Inventor： Craig A. Coburn ,  Stuart B. Rosenblum ,  Joseph A. Kozlowski ,  Richard Soll ,  Hao Wu ,  Bin Hu ,  Bin Zhong ,  Dahai Wang ,  Changmao Shen ,  Fei Sun

IPC: A61K31/535 ,  A61K31/5383 ,  C07D491/06 ,  C07D498/06 ,  A61K31/4178 ,  A61K45/06 ,  C07D493/06

CPC classification number: A61K31/5383 ,  A61K31/4178 ,  A61K45/06 ,  C07D491/06 ,  C07D493/06 ,  C07D498/06

Abstract: The present invention relates to novel Tetracyclic Xanthene Derivatives of Formula (I) and pharmaceutically acceptable salts thereof, wherein A, Y1, Y2, Z, Ra, Rb, R1a, R1b and R2 are as defined herein. The present invention also relates to compositions comprising at least one Tetracyclic Xanthene Derivative, and methods of using the Tetracyclic Xanthene Derivatives for treating or preventing HCV infection in a patient.

公开(公告)号：US08961815B2

公开(公告)日：2015-02-24

申请号：US12828766

申请日：2010-07-01

Applicant: Bin Hu ,  Abhiskek Singh ,  Gert Moyaerts ,  Deepak Mahulikar ,  Richard Wen

Inventor： Bin Hu ,  Abhiskek Singh ,  Gert Moyaerts ,  Deepak Mahulikar ,  Richard Wen

IPC: C09K13/04 ,  C09K3/14 ,  C09G1/02 ,  H01L21/3105 ,  H01L21/321 ,  H01L21/768 ,  H01L29/66

CPC classification number: H01L21/30625 ,  C09G1/02 ,  C09K3/1463 ,  H01L21/0475 ,  H01L21/31053 ,  H01L21/31055 ,  H01L21/3212 ,  H01L21/76819 ,  H01L29/66545

Abstract: The present disclosure is directed to a highly dilutable chemical mechanical polishing concentrate comprising an abrasive, an acid, a stabilizer, and water with a point-of-use pH ranging from 2.2-3.5 for planarizing current and next generation semiconductor integrated circuit FEOL/BEOL substrates.

Abstract translation: 本公开涉及一种高度可稀释的化学机械抛光浓缩物，其包含研磨剂，酸，稳定剂和水，其使用点pH为2.2-3.5，用于平坦化电流和下一代半导体集成电路FEOL / BEOL 底物。

公开(公告)号：US08691825B2

公开(公告)日：2014-04-08

申请号：US13262096

申请日：2010-03-29

Applicant: Qi Chen ,  Mingxiang Cui ,  Bin Hu ,  Shuangxi Hu ,  Zhifa Pu ,  Philip E. Sanderson ,  Richard Soll ,  Xue Tang ,  Jiabing Wang ,  Yongjin Yan ,  Jinfeng Yao ,  Hongjie Zhang

Inventor： Qi Chen ,  Mingxiang Cui ,  Bin Hu ,  Shuangxi Hu ,  Zhifa Pu ,  Philip E. Sanderson ,  Richard Soll ,  Xue Tang ,  Jiabing Wang ,  Yongjin Yan ,  Jinfeng Yao ,  Hongjie Zhang

IPC: A01N43/90 ,  A61K31/519 ,  C07D487/00

CPC classification number: A61K31/44 ,  C07D487/04

Abstract: The instant invention provides for substituted fused pyrimidine compounds of Formula A that inhibit Akt activity: In particular, the compounds disclosed selectively inhibit one or two of the Akt isoforms. The invention also provides for compositions comprising such inhibitory compounds and methods of inhibiting Akt activity by administering the compound to a patient in need of treatment of cancer.

Abstract translation: 本发明提供了抑制Akt活性的式A的取代的稠合嘧啶化合物：特别地，所公开的化合物选择性地抑制一种或两种Akt同种型。 本发明还提供了包含这种抑制化合物的组合物和通过将该化合物给予需要治疗癌症的患者来抑制Akt活性的方法。

公开(公告)号：US20140022685A1

公开(公告)日：2014-01-23

申请号：US14007047

申请日：2011-03-24

Applicant: Feng Miao ,  Bin Hu ,  Jianbo Pan

Inventor： Feng Miao ,  Bin Hu ,  Jianbo Pan

IPC: H02H9/02

CPC classification number: H02H9/02 ,  G06F1/26 ,  G06F1/305 ,  H02H9/001

Abstract: A method and an arrangement for reducing an in-rush current of a multi-module system are provided. The system comprises a plurality of modules designed to perform predefined functions, and a power supply unit designed to provide power to the plurality of modules. Each of the plurality of modules comprises a power control system which performs a respective time delay on the power-on of the power received from the power supply unit. With the system and the method, the total in-rush current of the multi-module system is greatly reduced.

Abstract translation: 提供了一种降低多模块系统的浪涌电流的方法和装置。 该系统包括被设计为执行预定义功能的多个模块，以及设计成向多个模块提供电力的电源单元。 多个模块中的每个模块包括功率控制系统，其在从电源单元接收的电力通电时执行相应的时间延迟。 利用系统和方法，大大降低了多模块系统的总浪涌电流。