公开(公告)号：US09999907B2

公开(公告)日：2018-06-19

申请号：US15089212

申请日：2016-04-01

Applicant: Applied Materials, Inc.

Inventor： Chengtsin Lee ,  Jennifer Y. Sun ,  Yikai Chen

IPC: C23G1/02 ,  B08B3/12 ,  H01J37/32 ,  C11D11/00

CPC classification number: B08B3/12 ,  C11D11/0023 ,  H01J37/32009 ,  H01J37/32862

Abstract: A method includes immersing an article comprising a yttrium based oxide in an acidic cleaning solution comprising water and 1-10 mol % HF acid. A portion of the yttrium based oxide is dissolved by the HF acid. A yttrium based oxy-fluoride is formed based on a reaction between the HF acid and the dissolved portion of the yttrium based. The yttrium based oxy-fluoride is precipitated onto the article over the yttrium based oxide to form a yttrium based oxy-fluoride coating. The acidic cleaning solution may include a yttrium based salt, which may additionally react with the HF acid to form more of the yttrium based oxy-fluoride.

公开(公告)号：US20180112311A1

公开(公告)日：2018-04-26

申请号：US15844335

申请日：2017-12-15

Applicant: Applied Materials, Inc.

Inventor： David Fenwick ,  Xiaowei Wu ,  Jennifer Y. Sun

IPC: C23C16/455 ,  C23C16/40 ,  C23C16/34 ,  C23C14/08 ,  C23C14/06

CPC classification number: C23C16/45525 ,  C23C14/0641 ,  C23C14/08 ,  C23C16/34 ,  C23C16/40 ,  C23C16/405

Abstract: A multi-layer coating for a surface of an article comprises a diffusion barrier layer and an erosion resistant layer. The diffusion barrier layer may be a nitride film including but not limited to TiNx, TaNx, Zr3N4, and TiZrxNy. The erosion resistant layer may be a rare oxide film comprising YZrxOy. The diffusion barrier layer and the erosion resistant layer may be deposited on the article's surface using a thin film deposition technique including but not limited to, ALD, PVD, and CVD.

公开(公告)号：US20180105922A1

公开(公告)日：2018-04-19

申请号：US15844251

申请日：2017-12-15

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Vahid Firouzdor ,  Biraja Prasad Kanungo ,  Tom K. Cho ,  Vedapuram S. Achutharaman ,  Ying Zhang

IPC: C23C14/08 ,  C04B35/505 ,  C04B35/622 ,  C04B41/00 ,  C04B41/45 ,  C04B41/50 ,  C23C14/46 ,  C04B41/87 ,  C04B41/89 ,  H01J37/32 ,  C23C14/58 ,  C04B41/52

CPC classification number: C23C14/088 ,  C04B35/00 ,  C04B35/505 ,  C04B35/62222 ,  C04B41/009 ,  C04B41/4529 ,  C04B41/5045 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C04B2235/3217 ,  C04B2235/3222 ,  C04B2235/3225 ,  C04B2235/3246 ,  C04B2235/3418 ,  C04B2235/3826 ,  C04B2235/3873 ,  C04B2235/428 ,  C04B2235/445 ,  C23C14/08 ,  C23C14/083 ,  C23C14/46 ,  C23C14/5806 ,  H01J37/32477 ,  Y10T428/26 ,  Y10T428/265 ,  C04B35/10 ,  C04B35/50 ,  C04B35/14 ,  C04B35/584 ,  C04B35/565 ,  C04B41/5032 ,  C04B41/5042 ,  C04B41/5035 ,  C04B2103/54

Abstract: An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film consists essentially of 40 mol % to less than 100 mol % of Y2O3, over 0 mol % to 60 mol % of ZrO2, and 0 mol % to 9 mol % of Al2O3.

公开(公告)号：US20180100228A1

公开(公告)日：2018-04-12

申请号：US15837787

申请日：2017-12-11

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Vahid Firouzdor ,  Ying Zhang

IPC: C23C14/00 ,  H01L21/67 ,  B65D43/02 ,  H01J37/32 ,  C23C14/08 ,  C23C4/16 ,  C23C4/14 ,  C23C4/12 ,  C23C4/10 ,  C23C4/04

CPC classification number: H01L21/67023 ,  B65D43/02 ,  C23C4/01 ,  C23C4/04 ,  C23C4/10 ,  C23C4/11 ,  C23C4/12 ,  C23C4/134 ,  C23C4/14 ,  C23C4/16 ,  C23C14/0015 ,  C23C14/0021 ,  C23C14/0031 ,  C23C14/0036 ,  C23C14/0052 ,  C23C14/0084 ,  C23C14/0094 ,  C23C14/08 ,  C23C14/081 ,  C23C14/083 ,  C23C14/088 ,  H01J37/32477 ,  H01J37/32495 ,  H01J37/32513 ,  H01J2237/334 ,  H01L21/67063 ,  H01L21/67069 ,  H01L21/6708 ,  H01L21/67086 ,  Y10T428/131 ,  Y10T428/1317 ,  Y10T428/139 ,  Y10T428/1393

Abstract: A component for a semiconductor processing chamber includes a ceramic body having at least one surface with a first average surface roughness of approximately 8-16 micro-inches. The component further includes a conformal protective layer on at least one surface of the ceramic body, wherein the conformal protective layer is a plasma resistant rare earth oxide film having a substantially uniform thickness of less than 300 μm over the at least one surface and having a second average surface roughness of below 10 micro-inches, wherein the second average surface roughness is less than the first average surface roughness.

公开(公告)号：US20180073125A1

公开(公告)日：2018-03-15

申请号：US15814597

申请日：2017-11-16

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Vahid Firouzdor ,  Tom Cho

IPC: C23C14/08 ,  H01J37/32 ,  C23C14/34 ,  C23C14/22 ,  B32B18/00

CPC classification number: C23C14/08 ,  B32B18/00 ,  C23C14/083 ,  C23C14/22 ,  C23C14/228 ,  C23C14/34 ,  H01J37/32477 ,  H01J37/32495 ,  Y10T428/24355 ,  Y10T428/24967 ,  Y10T428/24975 ,  Y10T428/265

Abstract: An article comprises a body and at least one protective layer on at least one surface of the body. The at least one protective layer is a thin film having a thickness of less than approximately 20 microns that comprises a ceramic selected from a group consisting of Y3Al5O12, Y4Al2O9, Er2O3, Gd2O3, Er3Al5O12, Gd3Al5O12 and a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.

公开(公告)号：US20180066373A1

公开(公告)日：2018-03-08

申请号：US15811563

申请日：2017-11-13

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Sumanth Banda

IPC: C25D11/04 ,  C25D3/54 ,  C25D17/00 ,  C25D5/48 ,  C25D11/02

Abstract: A chamber component for a processing chamber comprises an article having impurities, an aluminum coating on a surface of the article, wherein the aluminum coating is substantially free from impurities, and an anodization layer over the aluminum coating. The anodization layer comprises aluminum oxide. The anodization layer further comprises a dense barrier layer portion and a porous columnar layer portion.

公开(公告)号：US09896376B2

公开(公告)日：2018-02-20

申请号：US14121484

申请日：2014-09-08

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Ren-Guan Duan ,  Kenneth S. Collins

IPC: B32B15/04 ,  B32B17/06 ,  C03C10/16 ,  C03C3/247 ,  C03C3/32 ,  C03C8/24 ,  C04B35/119 ,  C04B37/00 ,  H01L21/67

CPC classification number: C03C10/16 ,  C03C3/247 ,  C03C3/325 ,  C03C8/24 ,  C03C2204/00 ,  C04B35/119 ,  C04B37/005 ,  C04B2235/3201 ,  C04B2235/3206 ,  C04B2235/3225 ,  C04B2235/445 ,  C04B2235/5445 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/6567 ,  C04B2235/80 ,  C04B2237/06 ,  C04B2237/064 ,  C04B2237/08 ,  C04B2237/10 ,  C04B2237/34 ,  C04B2237/343 ,  C04B2237/60 ,  C04B2237/708 ,  C04B2237/72 ,  H01L21/6719

Abstract: A bonded ceramic component which is resistant to reactive halogen-containing plasmas, said component comprising ceramic portions which are bonded together by a bonding material which includes an oxyfluoride glass-ceramic-comprising transition area between interfaces of the ceramic portions, where the transition area includes from at least 0.1 volume % amorphous phase up to about 50 volume % amorphous phase.

公开(公告)号：US20180044246A1

公开(公告)日：2018-02-15

申请号：US15796487

申请日：2017-10-27

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Biraja P. Kanungo

IPC: C04B35/50 ,  C23C4/11 ,  C23C4/134 ,  C04B35/622 ,  H01L21/683 ,  C23C16/40 ,  H01L21/67 ,  H01J37/32 ,  C23C16/44 ,  H01L21/687 ,  C04B37/02 ,  C04B37/00 ,  C04B35/626 ,  C23C14/22 ,  C23C16/50 ,  C04B35/505 ,  C23C16/455

Abstract: An article comprises a plasma resistant ceramic material comprising 40-60 mol % of Y2O3, 35-50 mol % of ZrO2, and 10-20 mol % of Al2O3.

公开(公告)号：US09865434B2

公开(公告)日：2018-01-09

申请号：US13954808

申请日：2013-07-30

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Biraja P. Kanungo ,  Tom Cho

IPC: B32B1/02 ,  C23C4/11 ,  H01J37/32 ,  C23C16/44 ,  C04B41/87 ,  C04B41/00 ,  C04B41/50 ,  C23C4/134 ,  B32B1/08

CPC classification number: H01J37/32495 ,  C04B41/009 ,  C04B41/5045 ,  C04B41/87 ,  C23C4/11 ,  C23C4/134 ,  C23C16/4404 ,  Y10T428/131 ,  Y10T428/26 ,  C04B35/00 ,  C04B35/10 ,  C04B35/581 ,  C04B41/4527 ,  C04B41/5031 ,  C04B41/5042

Abstract: An article includes a body that is coated with a ceramic coating. The ceramic coating may include Y2O3 in a range between about 45 mol % to about 99 mol %, ZrO2 in a range between about 0 mol % to about 55 mol %, and Al2O3 in range between about 0 mol % to about 10 mol %. The ceramic coating may alternatively inculde Y2O3 in a range between about 30 mol % to about 60 mol %, ZrO2 in a range between about 0 mol % to about 20 mol %, and Al2O3 in a range between about 30 mol % to about 60 mol %.

公开(公告)号：US09850573B1

公开(公告)日：2017-12-26

申请号：US15191269

申请日：2016-06-23

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun

IPC: C23C16/00 ,  C23C16/40 ,  C23C16/30 ,  C23C16/56 ,  C23C16/02 ,  H01J37/32 ,  C23C16/455

CPC classification number: C23C16/40 ,  C23C16/0227 ,  C23C16/30 ,  C23C16/403 ,  C23C16/405 ,  C23C16/4404 ,  C23C16/45525 ,  C23C16/45553 ,  C23C16/56 ,  H01J37/32467 ,  H01J37/32495

Abstract: Described herein is a method of depositing a plasma resistant ceramic coating onto a surface of a chamber component using a non-line-of-sight (NLOS) deposition process, such as atomic layer deposition (ALD) and chemical vapor deposition (CVD). The plasma resistant ceramic coating consists of an erbium containing oxide, an erbium containing oxy-fluoride, or an erbium containing fluoride. Also described are chamber components having a plasma resistant ceramic coating of an erbium containing oxide, an erbium containing oxy-fluoride, or an erbium containing fluoride.