公开(公告)号：US20150357159A1

公开(公告)日：2015-12-10

申请号：US14758466

申请日：2013-12-30

Applicant: FEI COMPANY

Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

IPC: H01J37/317

CPC classification number: H01J37/317 ,  H01J37/3056 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2814 ,  H01J2237/31745

Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

Abstract translation: 一种用于分析具有带电粒子束的样品的方法，包括将束朝向样品表面引导; 铣削表面以暴露样品中的第二表面，其中远离离子源的第二表面的端部相对于参考深度比距离离子源的第一表面的端部更深的深度; 将带电粒子束引向第二表面以形成第二表面的一个或多个图像; 通过检测电子束与第二表面的相互作用形成感兴趣的多个相邻特征的横截面的图像; 将横截面的图像组装成感兴趣的一个或多个特征的三维模型。 提出了一种用于形成改进的基准并确定纳米尺度三维结构中暴露特征的深度的方法。

公开(公告)号：US09177760B2

公开(公告)日：2015-11-03

申请号：US14502522

申请日：2014-09-30

Applicant: FEI Company

Inventor： Jeffrey Blackwood ,  Matthew Bray ,  Corey Senowitz ,  Cliff Bugge

IPC: H01J37/00 ,  H01J37/305 ,  G01N1/28 ,  H01J37/26

CPC classification number: H01J37/3056 ,  G01N1/286 ,  G01N2001/2886 ,  H01J37/261 ,  H01J2237/31745

Abstract: An improved method of preparing ultra-thin TEM samples that combines backside thinning with an additional cleaning step to remove surface defects on the FIB-facing substrate surface. This additional step results in the creation of a cleaned, uniform “hardmask” that controls the ultimate results of the sample thinning, and allows for reliable and robust preparation of samples having thicknesses down to the 10 nm range.

Abstract translation: 一种改进的制备超薄TEM样品的方法，其结合了背面变薄与额外的清洁步骤，以去除面向FIB的衬底表面上的表面缺陷。 这个额外的步骤导致创建一个清洁，统一的“硬掩模”来控制样品稀化的最终结果，并且允许对厚度低至10nm范围的样品进行可靠和鲁棒的准备。

公开(公告)号：US20150243478A1

公开(公告)日：2015-08-27

申请号：US14433354

申请日：2013-10-04

Applicant: FEI COMPANY

Inventor： Sang Hoon Lee ,  Stacey Stone ,  Jeffrey Blackwood ,  Michael Schmidt

IPC: H01J37/305 ,  C23C14/46

CPC classification number: H01J37/3053 ,  C23C14/46 ,  G01N1/32 ,  H01J37/28 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/3174 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Curtaining artifacts on high aspect ratio features are reduced by reducing the distance between a protective layer and feature of interest. For example, the ion beam can mill at an angle to the work piece surface to create a sloped surface. A protective layer is deposited onto the sloped surface, and the ion beam mills through the protective layer to expose the feature of interest for analysis. The sloped mill positions the protective layer close to the feature of interest to reduce curtaining.

Abstract translation: 通过减小保护层和感兴趣的特征之间的距离来减少高纵横比特征上的赝像。 例如，离子束可以与工件表面成一定角度磨，以产生倾斜的表面。 保护层沉积在倾斜表面上，并且离子束通过保护层研磨以暴露感兴趣的特征以进行分析。 倾斜的磨机使保护层位于感兴趣的特征附近以减少绘制。

公开(公告)号：US20150053548A1

公开(公告)日：2015-02-26

申请号：US14502522

申请日：2014-09-30

Applicant: FEI Company

Inventor： Jeffrey Blackwood ,  Matthew Bray ,  Corey Senowitz ,  Cliff Bugge

IPC: H01J37/305 ,  H01J37/26

CPC classification number: H01J37/3056 ,  G01N1/286 ,  G01N2001/2886 ,  H01J37/261 ,  H01J2237/31745

Abstract: An improved method of preparing ultra-thin TEM samples that combines backside thinning with an additional cleaning step to remove surface defects on the FIB-facing substrate surface. This additional step results in the creation of a cleaned, uniform “hardmask” that controls the ultimate results of the sample thinning, and allows for reliable and robust preparation of samples having thicknesses down to the 10 nm range.

Abstract translation: 一种改进的制备超薄TEM样品的方法，其结合了背面变薄与额外的清洁步骤，以去除面向FIB的衬底表面上的表面缺陷。 这个额外的步骤导致创建一个清洁，统一的“硬掩模”来控制样品稀化的最终结果，并且允许对厚度低至10nm范围的样品进行可靠和鲁棒的准备。

公开(公告)号：US20140190934A1

公开(公告)日：2014-07-10

申请号：US14144902

申请日：2013-12-31

Applicant: FEI Company

Inventor： Michael Schmidt ,  Jeffrey Blackwood ,  Stacey Stone ,  Sang Hoon Lee ,  Ronald Kelley

IPC: G01N1/32

CPC classification number: G01N1/32 ,  G01N1/286 ,  G01N2001/2886 ,  H01J37/3056 ,  H01J2237/31745

Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

公开(公告)号：US20140116873A1

公开(公告)日：2014-05-01

申请号：US14029368

申请日：2013-09-17

Applicant: FEI Company

Inventor： Jeffrey Blackwood ,  Stacey Stone

IPC: G01N1/32 ,  H01J37/305

CPC classification number: G01N1/28 ,  G01N1/06 ,  G01N1/08 ,  G01N1/32 ,  G01N23/04 ,  H01J37/06 ,  H01J37/18 ,  H01J37/20 ,  H01J37/26 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/063 ,  H01J2237/182 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (

Abstract translation: 一种用于S / TEM样品制备和分析的改进方法和装置。 本发明的优选实施例提供用于TEM样品制备的改进方法，特别是对于小几何（<100nm厚）TEM薄片。 新颖的样品结构和铣削图案的新颖应用允许产生薄至50nm的S / TEM样品，而没有显着的弯曲或翘曲。 本发明的优选实施方案提供了部分或全部自动化TEM样品制备的方法，使TEM样品的创建和分析过程减少劳动密集度，并提高TEM分析的产量和再现性。

公开(公告)号：US11315756B2

公开(公告)日：2022-04-26

申请号：US16012888

申请日：2018-06-20

Applicant: FEI Company

Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

IPC: H01J37/317 ,  H01J37/305

Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

公开(公告)号：US11062879B2

公开(公告)日：2021-07-13

申请号：US16719766

申请日：2019-12-18

Applicant: FEI Company

Inventor： Noel Thomas Franco ,  Kenny Mani ,  Chad Rue ,  Joe Christian ,  Jeffrey Blackwood

IPC: H01J37/30 ,  H01L21/67 ,  H01L21/26 ,  H01J37/22 ,  G01N1/44 ,  H01L21/32 ,  H01J37/305 ,  H01L21/263 ,  H01L21/3065 ,  G01N1/28 ,  H01L21/3213

Abstract: Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.

公开(公告)号：US10825651B2

公开(公告)日：2020-11-03

申请号：US16410774

申请日：2019-05-13

Applicant: FEI Company

Inventor： Valerie Brogden ,  Jeffrey Blackwood ,  Michael Schmidt ,  Dhruti Trivedi ,  Richard J. Young ,  Thomas G. Miller ,  Brian Roberts Routh, Jr. ,  Stacey Stone ,  Todd Templeton

IPC: H01J37/302 ,  H01J37/31 ,  H01J37/304 ,  G01N1/28 ,  H01J37/28 ,  H01J37/285

Abstract: Techniques are described that facilitate automated extraction of lamellae and attaching the lamellae to sample grids for viewing on transmission electron microscopes. Some embodiments of the invention involve the use of machine vision to determine the positions of the lamella, the probe, and/or the TEM grid to guide the attachment of the probe to the lamella and the attachment of the lamella to the TEM grid. Techniques that facilitate the use of machine vision include shaping a probe tip so that its position can be readily recognized by image recognition software. Image subtraction techniques can be used to determine the position of the lamellae attached to the probe for moving the lamella to the TEM grid for attachment. In some embodiments, reference structures are milled on the probe or on the lamella to facilitate image recognition.

公开(公告)号：US20190272975A1

公开(公告)日：2019-09-05

申请号：US16410774

申请日：2019-05-13

Applicant: FEI Company

Inventor： Valerie Brogden ,  Jeffrey Blackwood ,  Michael Schmidt ,  Dhruti Trivedi ,  Richard J. Young ,  Thomas G. Miller ,  Brian Roberts Routh, JR. ,  Stacey Stone ,  Todd Templeton

IPC: H01J37/302 ,  H01J37/285 ,  H01J37/31 ,  G01N1/28 ,  H01J37/28 ,  H01J37/304

Abstract: Techniques are described that facilitate automated extraction of lamellae and attaching the lamellae to sample grids for viewing on transmission electron microscopes. Some embodiments of the invention involve the use of machine vision to determine the positions of the lamella, the probe, and/or the TEM grid to guide the attachment of the probe to the lamella and the attachment of the lamella to the TEM grid. Techniques that facilitate the use of machine vision include shaping a probe tip so that its position can be readily recognized by image recognition software. Image subtraction techniques can be used to determine the position of the lamellae attached to the probe for moving the lamella to the TEM grid for attachment. In some embodiments, reference structures are milled on the probe or on the lamella to facilitate image recognition.