Method and Apparatus for Exposing a Structure on a Substrate
    25.
    发明申请
    Method and Apparatus for Exposing a Structure on a Substrate 审中-公开
    在基板上暴露结构的方法和装置

    公开(公告)号:US20150362841A1

    公开(公告)日:2015-12-17

    申请号:US14304665

    申请日:2014-06-13

    Abstract: A method for exposing a structure on a substrate includes positioning of an invariable reticle and a programmable reticle in a light path between a light source and a layer on a substrate to be exposed to light and exposing the layer on the substrate by light from the light source passing the invariable reticle and the programmable reticle.

    Abstract translation: 用于在基板上曝光结构的方法包括将不变的掩模版和可编程掩模版定位在光源和基板上的层之间的光路中以暴露于光,并将来自光的光暴露在基板上的层 源通过不变的掩模版和可编程的掩模版。

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