Memory device including memory circuit and selection circuit

    公开(公告)号:US10090023B2

    公开(公告)日:2018-10-02

    申请号:US14479707

    申请日:2014-09-08

    Abstract: To provide a memory device with short overhead time and a semiconductor device including the memory device. A memory device includes a first circuit that can retain data and a second circuit by the supply of power supply voltage. The second circuit includes a third circuit that selects a first potential corresponding to the data or a second potential supplied to a first wiring; a first transistor having a channel formation region in an oxide semiconductor film; a capacitor that hold the first potential or the second potential that is selected by the third circuit and supplied through the first transistor; and a second transistor controlling a conduction state between the first circuit and a second wiring that can supply a third potential in accordance with the potential retained in the capacitor.

    Semiconductor device having transistor and capacitor

    公开(公告)号:US09793276B2

    公开(公告)日:2017-10-17

    申请号:US14935607

    申请日:2015-11-09

    Abstract: A semiconductor device with a novel structure in which stored data can be held even when power is not supplied and there is no limitation on the number of times of writing. In the semiconductor device, a plurality of memory cells each including a first transistor, a second transistor, and a capacitor is provided in matrix and a wiring (also called a bit line) for connecting one memory cell to another memory cell and a source or drain electrode of the first transistor are electrically connected to each other through a source or drain electrode of the second transistor. Accordingly, the number of wirings can be smaller than that in the case where the source or drain electrode of the first transistor and the source or drain electrode of the second transistor are connected to different wirings. Thus, the degree of integration of the semiconductor device can be increased.

    Circuit, semiconductor device, and clock tree
    28.
    发明授权
    Circuit, semiconductor device, and clock tree 有权
    电路,半导体器件和时钟树

    公开(公告)号:US09515661B2

    公开(公告)日:2016-12-06

    申请号:US14705619

    申请日:2015-05-06

    Inventor: Kiyoshi Kato

    Abstract: A circuit with a reduced leakage current is provided. A first transistor, a third transistor, and a second transistor are electrically connected in this order in series, a drain of the second transistor and a source of the third transistor are electrically connected to each other and are electrically connected to an output node. The first transistor is a p-channel transistor. The second and third transistors are n-channel transistors each including a semiconductor region including an oxide semiconductor. The third transistor functions as a switch that controls electrical connection between a drain of the first transistor and an output node of the circuit. In the standby mode, the third transistor is in an off state.

    Abstract translation: 提供了具有减小的漏电流的电路。 第一晶体管,第三晶体管和第二晶体管按此顺序电连接,第二晶体管的漏极和第三晶体管的源极彼此电连接并电连接到输出节点。 第一晶体管是p沟道晶体管。 第二和第三晶体管是n沟道晶体管,每个晶体管包括包括氧化物半导体的半导体区域。 第三晶体管用作控制第一晶体管的漏极和电路的输出节点之间的电连接的开关。 在待机模式下,第三晶体管处于断开状态。

    Semiconductor device
    30.
    发明授权
    Semiconductor device 有权
    半导体器件

    公开(公告)号:US09461067B2

    公开(公告)日:2016-10-04

    申请号:US14703384

    申请日:2015-05-04

    Inventor: Kiyoshi Kato

    Abstract: An object is to provide a semiconductor device having a novel structure with a high degree of integration. A semiconductor device includes a semiconductor layer having a channel formation region, a source electrode and a drain electrode electrically connected to the channel formation region, a gate electrode overlapping with the channel formation region, and a gate insulating layer between the channel formation region and the gate electrode. A portion of a side surface of the semiconductor layer having the channel formation region and a portion of a side surface of the source electrode or the drain electrode are substantially aligned with each other when seen from a planar direction.

    Abstract translation: 目的在于提供具有高集成度的新型结构的半导体装置。 半导体器件包括具有沟道形成区域,与沟道形成区域电连接的源电极和漏电极的半导体层,与沟道形成区域重叠的栅极电极,以及沟道形成区域和沟道形成区域之间的栅极绝缘层 栅电极。 当从平面方向看时,具有沟道形成区域的半导体层的侧表面的一部分和源电极或漏电极的侧表面的一部分基本上对准。

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