NUCLEOSIDE ANALOG SALTS WITH IMPROVED SOLUBILITY AND METHODS OF FORMING SAME
    24.
    发明申请
    NUCLEOSIDE ANALOG SALTS WITH IMPROVED SOLUBILITY AND METHODS OF FORMING SAME 审中-公开
    具有改进的溶解性的核苷类似物盐和其形成方法

    公开(公告)号:US20160002240A1

    公开(公告)日:2016-01-07

    申请号:US14770655

    申请日:2014-03-17

    发明人: Robin D. Rogers

    摘要: Disclosed are salts of nucleoside analogs and methods of forming the salts. An anion of a nucleoside analog is paired with a permanent counter cation to form a salt that has decreased melting point and increased aqueous solubility compared to the nucleoside compound prior to the salt formation. Also a cation of a nucleoside analog is paired with a permanent counter anion to form a salt that has decreased melting point and increased aqueous solubility compared to the nucleoside compound prior to the salt formation. The nucleoside analog in some embodiments has therapeutic activity such as antiviral. The permanent counter cation or anion in some embodiments has bioactivity such as antibacterial or being a vitamin.

    摘要翻译: 公开了核苷类似物的盐和形成盐的方法。 核苷类似物的阴离子与永久性抗衡阳离子配对以形成与盐形成之前的核苷化合物相比具有降低的熔点和增加的水溶性的盐。 核苷类似物的阳离子与永久性抗衡阴离子配对,以形成与盐形成之前的核苷化合物相比具有降低的熔点和增加的水溶性的盐。 一些实施方案中的核苷类似物具有治疗活性,例如抗病毒药物。 在一些实施方案中,永久性抗衡阳离子或阴离子具有生物活性,例如抗菌剂或维生素。

    Resist composition, method of forming resist pattern and novel compound
    29.
    发明授权
    Resist composition, method of forming resist pattern and novel compound 有权
    抗蚀剂组合物,形成抗蚀剂图案的方法和新型化合物

    公开(公告)号:US08900795B2

    公开(公告)日:2014-12-02

    申请号:US13738438

    申请日:2013-01-10

    摘要: A resist composition including a base component (A) which exhibits changed solubility in a developing solution, and an acidic compound component (J) which is decomposed by exposure to exhibit decreased acidity, wherein the acidic compound component (J) contains a compound represented by formula (J1) [in the formula, R1 represents H, OH, halogen atom, alkoxy group, hydrocarbon group or nitro group; m represents 0-4; n represents 0-3; Rx represents H or hydrocarbon group; X1 represents divalent linking group; X2 represents H or hydrocarbon group; Y represents single bond or C(O); A represents alkylene group which may be substituted with oxygen atom, carbonyl group or alkylene group which may have fluorine atom; Q1 and Q2 represents F or fluorinated alkyl group; and W+ represents primary, secondary or tertiary ammonium coutercation which exhibits pKa smaller than pKa of H2N+(X2)—X1—Y—O-A-C(Q1)(Q2)—SO3− generated by decomposition upon exposure].

    摘要翻译: 包含在显影液中显示出改变的溶解度的碱成分(A)和通过曝光分解的酸性化合物成分(J)表现出酸性降低的抗蚀剂组合物,其中,酸性化合物成分(J)含有由 式(J1)[式中,R1表示H,OH,卤素原子,烷氧基,烃基或硝基; m表示0-4; n表示0-3; Rx表示H或烃基; X1表示二价连接基团; X2表示H或烃基; Y表示单键或C(O); A表示可以被氧原子取代的亚烷基,可以具有氟原子的羰基或亚烷基; Q1和Q2表示F或氟化烷基; W +表示pKa小于曝光时分解产生的H2N +(X2)-X1-Y-O-A-C(Q1)(Q2)-SO3-的pKa的伯,仲或叔铵的配位。