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公开(公告)号:US11276798B2
公开(公告)日:2022-03-15
申请号:US16822673
申请日:2020-03-18
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Kyungwook Hwang , Sungjin Kang , Junsik Hwang , Junhee Choi
IPC: H01L33/00 , H01L25/075 , H01L33/50 , H01L33/62
Abstract: Provided is a display device including a substrate, a transfer guiding mold provided on the substrate and including a plurality of openings, and a plurality of micro light emitting diodes (LEDs) provided on the substrate in the plurality of openings, wherein a height of the transfer guiding mold is less than twice a height of each of the plurality of micro LEDs.
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公开(公告)号:US10211194B2
公开(公告)日:2019-02-19
申请号:US14656298
申请日:2015-03-12
Applicant: Samsung Electronics Co., Ltd.
Inventor: Kunmo Chu , Changyoul Moon , Sunghee Lee , Junsik Hwang
IPC: H01L23/48 , H01L25/00 , H01L23/00 , H01L25/065 , H01L33/00
Abstract: A semiconductor device includes a base substrate and a semiconductor chip on the base substrate, the semiconductor chip including a first layer structure and a second layer structure opposite to the first layer structure, at least one of the first and second layer structures including a semiconductor device portion, and a bonding structure between the first layer structure and the second layer structure, the bonding structure including a silver-tin (Ag—Sn) compound and a nickel-tin (Ni—Sn) compound.
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公开(公告)号:US20250151474A1
公开(公告)日:2025-05-08
申请号:US19009427
申请日:2025-01-03
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Seogwoo Hong , Hyunjoon Kim , Joonyong Park , Kyungwook Hwang , Junsik Hwang
IPC: H10H20/831 , H10H29/14
Abstract: Provided is a light-emitting device including a body including a first semiconductor layer, an active layer, and a second semiconductor layer, a first electrode and a second electrode provided on a first surface of the body, the first electrode and the second electrode being in contact with the first semiconductor layer and the second semiconductor layer, respectively, and a third electrode and a fourth electrode provided on a second surface of the body, the third electrode and the fourth electrode being in contact with the first semiconductor layer and the second semiconductor layer, respectively.
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公开(公告)号:US12283646B2
公开(公告)日:2025-04-22
申请号:US17531210
申请日:2021-11-19
Inventor: Kyungwook Hwang , Ho Won Jang , Junsik Hwang
Abstract: An LED device includes a light emission layer including a first semiconductor layer including a first surface and a second surface facing the first surface, the second surface having an area larger than an area of the first surface, an active layer on the first surface, and a second semiconductor layer on the active layer, an insulating layer on the first surface, the insulating layer defining an open region of the first semiconductor layer, a first electrode that contacts the first semiconductor layer via the open region, and a second electrode on the second semiconductor layer and contacting the second semiconductor layer.
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公开(公告)号:US20250048783A1
公开(公告)日:2025-02-06
申请号:US18920608
申请日:2024-10-18
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Joonyong PARK , Seogwoo Hong , kyungwook Hwang , Hyunjoon Kim , Junsik Hwang
Abstract: Provided is a method of manufacturing a display, the method including a first operation of transferring a plurality of micro light emitting diodes (LEDs) to a plurality of wells of an interposer through a fluidic self assembly (FSA) process, a second operation of aligning a driving substrate on the interposer, a third operation of injecting a penetrating solvent between the interposer and the driving substrate, such that the penetrating solvent penetrates between the plurality of micro LEDs and the plurality of wells, and a fourth operation of transferring the plurality of micro LEDs to the driving substrate by radiating light to the interposer to vaporize the penetrating solvent.
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公开(公告)号:US20250022927A1
公开(公告)日:2025-01-16
申请号:US18738877
申请日:2024-06-10
Inventor: Youngtek OH , Geonwook Yoo , Kyungwook Hwang , Changkun Park , Sanghoon Song , Minjae Yeom , Gyuhyung Lee , Junsik Hwang
IPC: H01L29/417 , H01L29/20 , H01L29/66 , H01L29/778 , H01L33/00
Abstract: A semiconductor device includes a channel layer including a first group III-V semiconductor material; a barrier layer provided on an upper surface of the channel layer, the barrier layer including a second group III-V semiconductor material that is different than the first group III-V semiconductor material; a plurality of sources/drains spaced apart from each other on an upper surface of the barrier layer; a gate insulating layer covering the upper surface of the barrier layer and upper surfaces of the plurality of sources/drains; a gate provided on an upper surface of the gate insulating layer, the gate not overlapping the plurality of sources/drains; a plurality of source/drain electrodes electrically connected to corresponding sources/drains among the plurality of sources/drains; and a gate electrode electrically connected to the gate, wherein the plurality of source/drain electrodes has a diagonally symmetrical arrangement.
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37.
公开(公告)号:US20240234180A1
公开(公告)日:2024-07-11
申请号:US18409400
申请日:2024-01-10
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Kyungwook HWANG , Youngtek Oh , Dongkyun Kim , Junsik Hwang , Minchul Yu
IPC: H01L21/67
CPC classification number: H01L21/67132
Abstract: Provided are a wiper for transferring a micro semiconductor chip and an apparatus for collecting a micro semiconductor chip. The wiper includes an absorber for absorbing a solution used to wet transfer a micro semiconductor chip, and a protective layer coated on the absorber.
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38.
公开(公告)号:US11898244B2
公开(公告)日:2024-02-13
申请号:US17497523
申请日:2021-10-08
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jooho Lee , Yongsung Kim , Sanghoon Song , Wooyoung Yang , Changseung Lee , Sungjin Lim , Junsik Hwang
IPC: C23C16/34 , C23C16/50 , C23C16/06 , C23C16/44 , H01M4/04 , H01M10/052 , H01J37/32 , H01M16/00 , C23C16/00
CPC classification number: C23C16/34 , C23C16/00 , C23C16/06 , C23C16/4408 , C23C16/50 , H01J37/32 , H01J37/3244 , H01M4/0428 , H01M10/052 , H01M16/00 , H01J2237/3321 , H01M2220/30 , H01M2300/0068
Abstract: A method of forming a lithium (Li)-based film, may include: supplying a Li source material into a reaction chamber in which a substrate is disposed; supplying phosphor (P) and oxygen (O) source materials and a nitrogen (N) source material into the reaction chamber; and generating plasma in the reaction chamber to form a Li-based film on the substrate from the Li, P, O, and N source materials, wherein the supplying of the Li source material into the reaction chamber and the supplying of the P and O source materials and the N source material into the reaction chamber are performed with a time interval, and wherein the Li source material supplied into the reaction chamber is deposited on the substrate, and the P and O source materials supplied into the reaction chamber are adsorbed on the Li source material.
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公开(公告)号:US11769855B2
公开(公告)日:2023-09-26
申请号:US17194942
申请日:2021-03-08
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Kyungwook Hwang , Junsik Hwang , Seogwoo Hong
CPC classification number: H01L33/04 , H01L25/0753 , H01L33/12 , H01L33/14 , H01L33/16 , H01L33/32 , H01L33/62 , H01L33/50
Abstract: Provided is a micro light emitting device and a display apparatus having the micro light emitting device. The micro light emitting device includes a first-type semiconductor layer provided on a substrate, a superlattice layer provided on the first-type semiconductor layer, a current blocking layer provided on a side portion of the superlattice layer, an active layer provided on the superlattice layer and the current blocking layer, and a second-type semiconductor layer provided on the active layer.
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公开(公告)号:US11764095B2
公开(公告)日:2023-09-19
申请号:US17324609
申请日:2021-05-19
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Kyungwook Hwang , Junsik Hwang
IPC: H01L21/683 , H01L25/075 , H01L33/50 , H01L33/52 , H01L33/62
CPC classification number: H01L21/6835 , H01L25/0753 , H01L33/50 , H01L33/52 , H01L33/62 , H01L2221/68309 , H01L2221/68313 , H01L2221/68354 , H01L2221/68368 , H01L2933/005 , H01L2933/0041 , H01L2933/0066
Abstract: A wet alignment method for a micro-semiconductor chip and a display transfer structure are provided. The wet alignment method for a micro-semiconductor chip includes: supplying a liquid to a transfer substrate including a plurality of grooves; supplying the micro-semiconductor chip onto the transfer substrate; scanning the transfer substrate by using an absorber capable of absorbing the liquid. According to the wet alignment method, the micro-semiconductor chip may be transferred onto a large area.
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