公开(公告)号：US07003012B2

公开(公告)日：2006-02-21

申请号：US10684016

申请日：2003-10-10

Applicant: Richard G. Morton

Inventor： Richard G. Morton

IPC: H01S3/223 ,  H01S3/097

CPC classification number: H01S3/225 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0381 ,  H01S3/0382 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0388 ,  H01S3/041 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0979 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223

Abstract: A gas discharge laser having an elongated cathode and an elongated anode with a porous insulating layer covering the anode discharge surface. A pulse power system provides electrical pulses at rates of at least 1 KHz. A blower circulates laser gas between the electrodes at speeds of at least 5 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges. In preferred embodiments at least a portion of the anode is comprised of lead, and fluorine ion sputtering of the anode surface creates the insulating layer (over the discharge surface of the anode) comprised in large part of lead fluoride. In a particular preferred embodiment the anode is fabricated in two parts, a first part having the general shape of a prior art anode with a trench shaped cavity at the top and a second part comprised of lead rich brass and disposed in the trench shape cavity.

公开(公告)号：US06937635B2

公开(公告)日：2005-08-30

申请号：US10638247

申请日：2003-08-07

Applicant: Richard G. Morton ,  Timothy S. Dyer ,  Thomas D. Steiger ,  Richard C. Ujazdowski ,  Tom A. Watson ,  Bryan Moosman ,  Alex P. Ivaschenko ,  Walter Gillespie ,  Curtis Rettig

Inventor： Richard G. Morton ,  Timothy S. Dyer ,  Thomas D. Steiger ,  Richard C. Ujazdowski ,  Tom A. Watson ,  Bryan Moosman ,  Alex P. Ivaschenko ,  Walter Gillespie ,  Curtis Rettig

IPC: G03F7/20 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0979 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/20 ,  H01S3/09

CPC classification number: G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0381 ,  H01S3/0382 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0388 ,  H01S3/041 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0979 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225

Abstract: The present invention provides a gas discharge laser having at least one long-life elongated electrode for producing at least 12 billion high voltage electric discharges in a fluorine containing laser gas. In a preferred embodiment at least one of the electrodes is comprised of a first material having a relatively low anode erosion rate and a second anode material having a relatively higher anode erosion rate. The first anode material is positioned at a desired anode discharge region of the electrode. The second anode material is located adjacent to the first anode material along at least two long sides of the first material. During operation of the laser erosion occurs on both materials but the higher erosion rate of the second material assures that any tendency of the discharge to spread onto the second material will quickly erode away the second material enough to stop the spread of the discharge. In a preferred embodiment the anode is as described above and the cathode is also a two-material electrode with the first material at the discharge region being C26000 brass and the second material being C36000 brass. A pulse power system provides electrical pulses at rates of at least 1 KHz. A blower circulates laser gas between the electrodes at speeds of at least 5 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges.

Abstract translation: 本发明提供了一种气体放电激光器，其具有至少一个长寿命的细长电极，用于在含氟激光气体中产生至少120亿个高压放电。 在优选实施例中，至少一个电极由具有相对低的阳极腐蚀速率的第一材料和具有相对较高的阳极侵蚀速率的第二阳极材料构成。 第一阳极材料位于电极的期望的阳极放电区域。 第二阳极材料沿第一材料的至少两个长边位于第一阳极材料附近。 在两种材料的激光冲蚀操作过程中，第二种材料的腐蚀速度较高，确保放电扩散到第二种材料上的任何趋势将迅速消除第二种材料，从而阻止放电扩散。 在优选实施例中，阳极如上所述，阴极也是双​​材料电极，其中第一材料在放电区域为C26000黄铜，第二材料为C36000黄铜。 脉冲功率系统以至少1KHz的速率提供电脉冲。 鼓风机以至少5m / s的速度在电极之间循环激光气体，并且提供热交换器以去除由鼓风机和排出物产生的热量。

公开(公告)号：US06914919B2

公开(公告)日：2005-07-05

申请号：US10187336

申请日：2002-06-28

Applicant: Tom A. Watson ,  Richard C. Ujazdowski ,  Alex P. Ivaschenko ,  Richard L. Sandstrom ,  Robert A. Shannon ,  R. Kyle Webb ,  Frederick A. Palenschat ,  Thomas Hofmann ,  Curtis L. Rettig ,  Richard M. Ness ,  Paul C. Melcher ,  Alexander I. Ershov

Inventor： Tom A. Watson ,  Richard C. Ujazdowski ,  Alex P. Ivaschenko ,  Richard L. Sandstrom ,  Robert A. Shannon ,  R. Kyle Webb ,  Frederick A. Palenschat ,  Thomas Hofmann ,  Curtis L. Rettig ,  Richard M. Ness ,  Paul C. Melcher ,  Alexander I. Ershov

IPC: H01S3/134 ,  G03F7/20 ,  H01S3/00 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23 ,  H01S3/10

CPC classification number: H01S3/0385 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

Abstract: The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,0000 pulses power second. Preferred embodiments are configured as KrF, ArF and F2 lasers used for light sources for integrated circuit lithography. Improvements include a modified high voltage power supply capable for charging an initial capacitor of a magnetic compression pulse power system to precise target voltages 6,000 to 10,0000 times per second and a feedback control for monitoring pulse energy and determining the target voltages on a pulse-by-pulse basis. Several techniques are disclosed for removing discharge created debris from the discharge region between the laser electrodes during the intervals between discharges. In one embodiment the width of the discharge region is reduced from about 3 mm to about 1 mm so that a gas circulation system designed for 4,000 Hz operation could be utilized for 10,000 Hz operation. In other embodiments the gas flow between the electrodes is increased sufficiently to permit 10,000 Hz operation with a discharge region width of 3 mm. To provide these substantial increased gas flow rates, Applicants have disclosed preferred embodiments utilize tangential forms of the prior art but with improved and more powerful motors and novel bearing designs. New bearing designs include both ceramic bearings and magnetic bearings. In other embodiments, some or all of the gas circulation power is provided with a blower located outside the laser chamber. The outside blower can be located in the laser cabinet or in separate location.

Abstract translation: 本发明提供一种气体放电激光系统，其能够以6,000至1000000次脉冲功率秒的重复频率在生产线容量中可靠地长期运行。 优选的实施例被配置为用于集成电路光刻的光源的KrF，ArF和F 2 N 2激光器。 改进包括一种改进的高压电源，其能够将磁压缩脉冲电源系统的初始电容器充电至每秒精确的目标电压6,000至10,0000次，以及用于监视脉冲能量的反馈控制以及确定脉冲 - 逐脉冲基础。 公开了用于在放电间隔期间从激光电极之间的放电区域去除产生的碎屑的几种技术。 在一个实施例中，放电区域的宽度从约3mm减小至约1mm，使得设计用于4000Hz操作的气体循环系统可用于10,000Hz操作。 在其他实施例中，电极之间的气流充分增加，以允许10,000Hz的操作，放电区域宽度为3mm。 为了提供这些显着增加的气体流速，申请人已经公开了使用现有技术的切向形式的优选实施例，但是具有改进的和更强大的电动机和新颖的轴承设计。 新的轴承设计包括陶瓷轴承和磁性轴承。 在其他实施例中，一些或全部气体循环动力设置有位于激光室外部的鼓风机。 外部鼓风机可以位于激光柜内或分开的位置。

公开(公告)号：US06912052B2

公开(公告)日：2005-06-28

申请号：US10676175

申请日：2003-09-30

Applicant: Rajasekhar M Rao ,  John T. Melchior ,  Holger K. Glatzel

Inventor： Rajasekhar M Rao ,  John T. Melchior ,  Holger K. Glatzel

IPC: G01B9/02 ,  G01J1/42 ,  G01J9/02 ,  G03F7/20 ,  H01S3/00 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC classification number: G01J1/4257 ,  G01J1/429 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/0208 ,  G01J3/024 ,  G01J3/027 ,  G01J3/26 ,  G01J9/02 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

Abstract: A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000Hz and above, is disclosed which may comprise a focusing lens having a focal length; an optical interferometer creating an interference fringe pattern; an optical detection means positioned at the focal length from the focusing lens; and a bandwidth calculator calculating bandwidth from the position of interference fringes in the interference fringe pattern incident on the optical detection means, defining a DID and a DOOD, the respective distances between a pair of first fringe borders and between a pair of second fringe borders in the interference pattern on an axis of the interference pattern, and according to the formula Δλ=λ0 [DOD2−DID2]/[8f2−D02], where λ0 is an assumed constant wavelength and D0=(DOD−DID)/2, and f is the focal length. The optical detector may be a photodiode array. The wavemember may have an optical interferometer having a slit function; the slit function and the focal length being selected to deliver to the optical detector the two innermost fringes of the optical interference ring pattern. The optical detector may comprise an array of pixels each having a height and width and the array having a total width; and an aperture at the optical input to the optical interferometer may selectively input to the optical interferometer a portion of a beam of light sufficient for the output of the etalon to illuminate the optical detector over the height of each respective pixel height and the total width. The optical interferometer may comprise an etalon having a slit function of 3 pm or less and a finesses of 25 or greater; and the focal length may be 1.5 meters. A second stage diffuser may be placed between the first stage diffuser and the etalon delivering a narrow cone of light to the etalon, and an aperture between the second stage diffuser and the etalon may deliver to the etalon a thin strip of the narrow cone of light.

公开(公告)号：US06904073B2

公开(公告)日：2005-06-07

申请号：US10384967

申请日：2003-03-08

Applicant: Thomas A. Yager ,  William N. Partio ,  Richard L. Sandstrom ,  Xiaojiang Pan ,  John T. Melchior ,  John Martin Algots ,  Matthew Ball ,  Alexander I. Ershov ,  Vladimir Fleurov ,  Walter D. Gillespie ,  Holger K. Glatzel ,  Leonard Lublin ,  Elizabeth Marsh ,  Richard G. Morton ,  Richard C. Ujazdowski ,  David J. Warkentin ,  R. Kyle Webb

Inventor： Thomas A. Yager ,  William N. Partio ,  Richard L. Sandstrom ,  Xiaojiang Pan ,  John T. Melchior ,  John Martin Algots ,  Matthew Ball ,  Alexander I. Ershov ,  Vladimir Fleurov ,  Walter D. Gillespie ,  Holger K. Glatzel ,  Leonard Lublin ,  Elizabeth Marsh ,  Richard G. Morton ,  Richard C. Ujazdowski ,  David J. Warkentin ,  R. Kyle Webb

IPC: G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC classification number: H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

Abstract: The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems producing a high repetition rate high power output beam. The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics located in high pulse intensity sections of the output beam of prototype laser systems. Embodiments include an enclosed and purged beam path with beam pointing control for beam delivery of billions of output laser pulses. Optical components and modules described herein are capable of controlling ultraviolet laser output pulses with wavelength less than 200 nm with average output pulse intensities greater than 1.75×106 Watts/cm2 and with peak intensity or greater 3.5×106 Watts/cm2 for many billions of pulses as compared to prior art components and modules which failed after only a few minutes in these pulse intensities. Techniques and components are disclosed for minimizing the potential for optical damage and for reducing the pulse energy density to less than 100×10−6 J/cm3. Important improvements described in this specification have been grouped into the following subject matter categories: (1) Solution to CaF2 surface damage discovered by Applicants, (2) description of a high power ArF MOPA laser system, (3) description of beam delivery units, (4) polarization considerations (5) a high speed water-cooled auto shutter energy detector module and (6) other improvements.

Abstract translation: 本发明提供了用于产生高重复率高功率输出光束的模块化高重复率紫外线气体放电激光器系统的长寿命光学器件。 本发明包括由申请人发现的位于原型激光系统的输出光束的高脉冲强度部分中的CaF 2光学器件的表面损伤问题的解决方案。 实施例包括用于束传送数十亿个输出激光脉冲的光束指向控制的封闭和清除的光束路径。 本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲，平均输出脉冲强度大于1.75×6 /瓦/ cm 2，并且与 与在这些脉冲强度中仅仅几分钟之后失效的现有技术部件和模块相比，数十亿个脉冲的峰值强度或更大的3.5×10 6 / cm 2 / SUP。 公开了用于最小化光学损伤的可能性和将脉冲能量密度降低到小于100×10 -6 / cm 3的技术和部件。 本说明书中描述的重要改进已分为以下主题类别：（1）由申请人发现的CaF 2 2表面损伤的解决方案，（2）高功率ArF MOPA激光系统的描述（ 3）光束传输单元的描述，（4）偏振考虑（5）高速水冷自动快门能量检测器模块和（6）其他改进。

公开(公告)号：US06859482B1

公开(公告)日：2005-02-22

申请号：US09510538

申请日：2000-02-22

Applicant: Claus Strowitzki ,  Hans Kodeda

Inventor： Claus Strowitzki ,  Hans Kodeda

IPC: H01S3/038 ,  H01S3/225 ,  H01S3/097

CPC classification number: H01S3/038 ,  H01S3/225

Abstract: A laser discharge unit is provided. The discharge unit includes an elongated electrode plate, an elongated high voltage electrode, and an elongated ground electrode. Both the high voltage electrode and the ground electrode are mounted to the electrode plate in a spaced-apart relationship with their longitudinal axis being substantially parallel to thereby define a gas discharge gap between the electrodes. The gas laser discharge unit may be removably mounted as a module into a gas laser such as an excimer laser.

Abstract translation: 提供了一种激光放电单元。 放电单元包括细长电极板，细长高压电极和细长接地电极。 高压电极和接地电极都以与其纵向轴线间隔开的关系安装到电极板，其基本上平行，从而限定了电极之间的气体放电间隙。 气体激光放电单元可以作为模块可拆卸地安装到诸如准分子激光器的气体激光器中。

公开(公告)号：US20050018739A1

公开(公告)日：2005-01-27

申请号：US10922692

申请日：2004-08-20

Applicant: Alexander Ershov ,  Richard Ness

Inventor： Alexander Ershov ,  Richard Ness

IPC: H01S3/097 ,  G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC classification number: H01S3/0385 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308 ,  H01S3/2333 ,  H01S3/2366

Abstract: Feedback timing control equipment and process for an injection seeded modular gas discharge laser. A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. The feedback timing control is programmed to permit in some circumstances discharges timed so that no significant laser energy is output from the system. Use of this technique permits burst mode operation in which the first discharge of a burst is a no-output discharge so that timing parameters for each of the two chambers can be monitored before the first laser output pulse of the burst. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber.

公开(公告)号：US20040174919A1

公开(公告)日：2004-09-09

申请号：US10804281

申请日：2004-03-18

Inventor： David S. Knowles ,  Daniel J. W. Brown ,  Richard L. Sandstrom ,  German E. Rylov ,  Eckehard D. Onkels ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd

IPC: H01S003/097 ,  H01S003/223 ,  H01S003/22

CPC classification number: H01S3/2366 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333

Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F2 spectral line.

公开(公告)号：US06778584B1

公开(公告)日：2004-08-17

申请号：US09716041

申请日：2000-11-17

Applicant: William N. Partlo ,  Richard L. Sandstrom ,  Raymond F. Cybulski ,  Igor V. Fomenkov ,  Alexander I. Ershov

Inventor： William N. Partlo ,  Richard L. Sandstrom ,  Raymond F. Cybulski ,  Igor V. Fomenkov ,  Alexander I. Ershov

IPC: H01S310

CPC classification number: G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225

Abstract: A helium purge for a grating based line narrowing device for minimizing thermal distortions in line narrowed lasers producing high energy laser beams at high repetition rates. Applicants have shown substantial improvement in performance with the uses of helium purge as compared to prior art nitrogen purges. In preferred embodiments a stream of helium gas is directed across the face of the grating. In other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.

Abstract translation: 用于基于光栅的线窄化装置的氦气吹扫，用于最大限度地减少线性窄激光器中的热失真，以高重复率产生高能激光束。 与现有技术的氮气吹扫相比，申请人已经显示出使用氦吹扫的性能方面的显着改进。在优选实施例中，氦气流被引导穿过光栅的表面。 在其它实施例中，减少吹扫气体压力以减少热气体层的光学效应。

公开(公告)号：US20040066825A1

公开(公告)日：2004-04-08

申请号：US10680243

申请日：2003-10-08

Inventor： Hiroyuki Hayashikawa ,  Hitoshi Hongu

IPC: H01S003/22 ,  H01S003/223 ,  H01S003/03

CPC classification number: H01S3/03 ,  H01S3/034 ,  H01S3/036 ,  H01S3/038 ,  H01S3/073 ,  H01S3/086

Abstract: A support unit (20a) for supporting an OPM holder (15a) so as to be vertical to the laser beam axis is disposed in the lower part of the OPM holder (15a). A rotary shaft (19) is inserted into the support unit (20a) and rotary shaft support unit (20b), and the OPM holder (15a) and DT base (17) are assembled together. Thus, a rotation support unit (200) is composed. The rotation support unit has a degree of freedom in the rotating direction of arrow (202). On the other hand, in the lower part of an RM holder (15b), a support bar (21) is provided. At the DT base (17), a rotating element (22) and a rotating element support unit (23) supporting the rotating element are composed so as to support the support bar. Thus, a slider structure (220) slidable in the optical axis direction is formed. The slider structure has a degree of freedom in the direction of arrow (222).

Abstract translation: 用于支撑OPM保持器（15a）以与激光束轴垂直的支撑单元（20a）设置在OPM保持器（15a）的下部。 旋转轴（19）插入到支撑单元（20a）和旋转轴支撑单元（20b）中，并且OPM保持器（15a）和DT基座（17）组装在一起。 因此，构成旋转支撑单元（200）。 旋转支撑单元具有沿箭头（202）的旋转方向的自由度。 另一方面，在RM保持器（15b）的下部设有支撑杆（21）。 在DT基座（17）上，支撑旋转元件的旋转元件（22）和旋转元件支撑单元（23）构成为支撑支撑杆。 因此，形成可沿光轴方向滑动的滑块结构（220）。 滑块结构具有沿箭头（222）的方向的自由度。