PIEZOELECTRIC COMPOSITE SUBSTRATE AND METHOD FOR MANUFACTURING SAME

    公开(公告)号:US20230284533A1

    公开(公告)日:2023-09-07

    申请号:US17998169

    申请日:2021-04-28

    发明人: Kazutoshi NAGATA

    IPC分类号: H10N30/072 H03H9/02

    摘要: Provided are a piezoelectric substrate and a manufacturing method thereof, by which bonding strength enough for forming a piezoelectric layer on an insulating substrate having a significantly small linear expansion coefficient can be obtained through ion implantation even by heat treatment at 100° C. or less. A piezoelectric composite substrate 10 having successively stacked insulating substrate 2, interlayer 3, and piezoelectric layer 1a is manufactured by laminating a piezoelectric single-crystal substrate surface having an ion implantation layer 1a thereon and an insulating substrate 2 having a linear expansion coefficient less than that of the piezoelectric single-crystal substrate 1 with a difference in a range of 14×10−6/K to 16×10−6/K via the interlayer 3 to obtain a bonded body 4, and after heat treatment, leaving the ion implantation layer 1a as a piezoelectric layer and releasing the remaining portion 1b of the piezoelectric single-crystal substrate from the bonded body 4. The insulating substrate 2 and the interlayer 3 are each made of a Si-containing amorphous material.