公开(公告)号：US10023733B2

公开(公告)日：2018-07-17

申请号：US14900897

申请日：2014-06-11

申请人： Unimatec Co., Ltd.

发明人： Yoshiyama Kaneumi

IPC分类号： C08F220/14 ,  C08L33/16 ,  C08F220/24 ,  C08F220/34 ,  D06M15/33 ,  C08F2/22

摘要： An aqueous dispersion of a fluorine-containing copolymer comprising, as copolymerization units, (A) a (meth)acrylate represented by [CH2═CHRCOO(NH)rR1NR2R3R4]+Y−, (B) a perfluoroalkylalkyl(meth)acrylate represented by CmF2m+1CpH2p(NR′SO2)qOCOCR═CH2 or a polyfluoroalkylalkyl(meth)acrylate thereof, or a polyfluoroalkyl(meth)acrylate represented by CnF2n+1(CH2CF2)a(CF2CF2)b(CH2CH2)cOCOCR═CH2, (C) benzyl(meth)acrylate, (D) a fluorine-free polymerizable monomer other than components (A) and (C), and (E) a crosslinkable group-containing polymerizable monomer. The aqueous dispersion can improve the dispersion stability of an aqueous dispersion of a water- and oil-repellent when used as a water- and oil-repellent comprising the fluorine-containing copolymer as an active component.

公开(公告)号：US09969829B2

公开(公告)日：2018-05-15

申请号：US15399220

申请日：2017-01-05

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： Daisuke Domon ,  Koji Hasegawa ,  Keiichi Masunaga ,  Masaaki Kotake

IPC分类号： G03F7/004 ,  C08F212/14 ,  C08F220/30 ,  G03F7/038 ,  C08F220/24 ,  C08F220/18 ,  C07C381/12 ,  G03F1/00

CPC分类号： C08F212/14 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/30 ,  C08F2220/301 ,  C08F2500/03 ,  C08F2800/10 ,  G03F1/00 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382

摘要： The present invention provides a polymer compound containing a repeating unit shown by the following general formula (1). There can be provided a polymer compound usable in a negative resist composition that can achieve high resolution of 50 nm or less and small LER and cause very few defects, a negative resist composition using the polymer compound, and a patterning process using the negative resist composition.

公开(公告)号：US09966575B2

公开(公告)日：2018-05-08

申请号：US14905451

申请日：2014-07-14

申请人： Central Glass Company, Limited

发明人： Haruhiko Komoriya ,  Yoshiharu Terui ,  Fumito Kobayashi ,  Yukari Hara ,  Ikunari Hara

IPC分类号： H01L51/00 ,  C08F220/24 ,  H01L51/56 ,  C09D127/12 ,  G03F7/00 ,  C09D5/00 ,  C09D7/00 ,  C09D129/10 ,  C09D145/00 ,  G03F7/038 ,  H01L27/32 ,  C08F232/04 ,  H01L51/05 ,  C08K5/02 ,  C08K5/06 ,  H01L51/50

CPC分类号： H01L51/56 ,  C08F232/04 ,  C08K5/02 ,  C08K5/06 ,  C09D5/00 ,  C09D7/20 ,  C09D127/12 ,  C09D129/10 ,  C09D145/00 ,  G03F7/0002 ,  G03F7/038 ,  H01L27/3241 ,  H01L51/0017 ,  H01L51/0018 ,  H01L51/0019 ,  H01L51/0052 ,  H01L51/0558 ,  H01L51/5012 ,  C08F216/14

摘要： A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the formula (1) and a repeating unit of the general formula (2); and a fluorine-containing solvent. In the general formula (2), R1 represents a C1-C15 straight, C3-C15 branched or C3-C15 cyclic hydrocarbon group in which at least one hydrogen atom may be replaced by a fluorine atom or chlorine atom and which may have a hydroxy group. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element as the composition can form a fluororesin film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.

公开(公告)号：US20180118956A1

公开(公告)日：2018-05-03

申请号：US15569118

申请日：2016-04-28

申请人： THE CHEMOURS COMPANY TT, LLC

发明人： ANILKUMAR RAGHAVANPILLAI ,  JAMES J. HUGHES ,  VINCENT FRANCO ,  JOHN RUSSELL CROMPTON, JR. ,  BRAD M. ROSEN ,  HAU-NAN LEE ,  MICHAEL HENRY OBER ,  DAN QING WU

IPC分类号： C09D5/16 ,  C08F220/24 ,  C09D7/65 ,  C09D133/16

摘要： The present invention comprises a crosslinkable polymer compound comprising a fluorinated Unit A, an optional hydrophilic Unit B, an optional acidic or neutralized acid Unit C, a crosslinkable pendant olefin group-containing Unit D, and an optional hydrophobic alkyl Unit E. Such polymeric compounds are useful as coatings additives such that, when the coating is applied to a substrate, the additive compound is allowed to first migrate to the surface and subsequently crosslink to form a durable oil-, dirt-, and water-repellent surface.

公开(公告)号：US09951164B2

公开(公告)日：2018-04-24

申请号：US15235673

申请日：2016-08-12

申请人： International Business Machines Corporation ,  Central Glass Co., Ltd.

发明人： Takehisa Ishimaru ,  Satoru Narizuka ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Hoa D. Truong ,  Rudy J. Wojtecki

IPC分类号： G03F7/004 ,  G03F7/38 ,  C07C317/04 ,  C07C317/06 ,  C07C317/08 ,  C07C317/10 ,  C07C317/14 ,  C07C317/24 ,  C07C317/26 ,  C07C317/32 ,  C08F212/04 ,  C08F212/32 ,  C08F220/24 ,  C08F220/38 ,  C07C309/69 ,  C07C309/70 ,  C08F220/68 ,  G03F7/039 ,  G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  C07C309/68 ,  C07C309/77

CPC分类号： C07C309/69 ,  C07C309/68 ,  C07C309/70 ,  C07C309/77 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： Non-ionic photo-acid generating (PAG) polymerizable monomers were prepared that contain a side chain sulfonate ester of an alpha-hydroxy aryl ketone. The aryl ketone group has a perfluorinated substituent alpha to the ketone carbonyl. The sulfur of the sulfonate ester is also directly linked to a fluorinated group. PAG polymers prepared from the PAG monomers release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development.

公开(公告)号：US09864275B2

公开(公告)日：2018-01-09

申请号：US14632793

申请日：2015-02-26

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Ching-Yu Chang ,  Chien-Wei Wang ,  Hsueh-An Chen

IPC分类号： G03F7/004 ,  G03F7/11 ,  H01L21/027 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  G03F7/075 ,  C08F220/38 ,  C08L33/16 ,  C08F220/26 ,  H01L21/308 ,  C08F220/22 ,  C08F220/24

CPC分类号： G03F7/11 ,  C08F220/22 ,  C08F220/24 ,  C08F220/26 ,  C08F220/38 ,  C08L33/16 ,  C08L2205/025 ,  G03F7/004 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/168 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  H01L21/0274 ,  H01L21/3081

摘要： An improved resist material and a technique for patterning a workpiece such as an integrated circuit workpiece that offers improved resistance to environmental contaminants is provided. In an exemplary embodiment, the method includes receiving a workpiece and applying to the workpiece a resist material containing a protectant disbursed throughout. A thermal process is performed on the workpiece that causes the protectant to become concentrated in an upper region of the resist material. The resist material is exposed in a lithographic process and the exposed resist material is developed to define a pattern within the resist material. In some such examples, the protectant is selected to reduce an effect of an environmental contaminant without affecting an acid/base ratio of the resist material. In some such embodiments, the protectant includes a hydrophobic functional group.

公开(公告)号：US20170283701A1

公开(公告)日：2017-10-05

申请号：US15618725

申请日：2017-06-09

申请人： FUJIFILM Corporation

发明人： Akio TAMURA ,  Koji IIJIMA

IPC分类号： C09K19/54 ,  G02F1/1335 ,  C09K19/34 ,  G02F1/1333 ,  C08F220/24 ,  C08F222/10

CPC分类号： C09K19/544 ,  C08F220/24 ,  C08F222/1006 ,  C08F2222/1013 ,  C08F2222/1026 ,  C09K19/3477 ,  C09K19/54 ,  C09K2019/0448 ,  C09K2019/528 ,  G02B1/04 ,  G02B5/30 ,  G02B5/3016 ,  G02F1/133365 ,  G02F1/1336 ,  G02F1/13363 ,  G02F2202/023 ,  C08L101/12

摘要： A polymer is obtained by polymerizing a monomer having two or more radical polymerizable double bonds and one or more hydroxyl groups. A composition including the polymer, an optical film including a cholesteric liquid crystal layer containing the polymer on a support, and a liquid crystal display device including at least a backlight unit including the optical film and a liquid crystal cell are provided.

公开(公告)号：US09725847B2

公开(公告)日：2017-08-08

申请号：US14111363

申请日：2012-04-18

申请人： Ryo Yasumitsu

发明人： Ryo Yasumitsu

IPC分类号： D06M15/227 ,  D06M13/46 ,  D06M15/277 ,  D06M16/00 ,  C08F220/24 ,  D06M15/356 ,  D06M101/32

CPC分类号： D06M15/227 ,  C08F220/24 ,  D06M13/46 ,  D06M15/277 ,  D06M15/3562 ,  D06M16/00 ,  D06M2101/32 ,  Y10T442/2008 ,  Y10T442/227

摘要： An object is to provide a cloth containing an organic fiber, which is excellent in the oil repellency, dirt-removal property by washing and water-absorbing property, and a textile product produced using the cloth. A means for solution is attaching a specific fluorine-containing polymer to a cloth containing an organic fiber, with a quaternary ammonium salt if desired, and thus making the water-absorbing property in accordance with JIS L1018A method (the instillation method) 60 seconds or less and the oil repellency in accordance with AATCC118-1992 grade 4 or higher.

公开(公告)号：US09684206B2

公开(公告)日：2017-06-20

申请号：US14129236

申请日：2012-06-27

申请人： Martin Schadt ,  Vladimir Grigorievich Chigrinov ,  Hoi-Sing Kwok ,  Sayaka Nose ,  Masayuki Iwakubo ,  Masanao Hayashi ,  Yutaka Nagashima ,  Isa Nishiyama ,  Haruyoshi Takatsu

发明人： Martin Schadt ,  Vladimir Grigorievich Chigrinov ,  Hoi-Sing Kwok ,  Sayaka Nose ,  Masayuki Iwakubo ,  Masanao Hayashi ,  Yutaka Nagashima ,  Isa Nishiyama ,  Haruyoshi Takatsu

IPC分类号： C09K19/38 ,  G02F1/1337 ,  C08F220/10 ,  C08F220/36 ,  C08F220/30 ,  C08F220/24 ,  C08F222/10

CPC分类号： G02F1/133711 ,  C08F220/10 ,  C08F220/24 ,  C08F220/30 ,  C08F220/36 ,  C08F2220/305 ,  C08F2222/102 ,  C09K19/3852 ,  C08F2220/365 ,  C08F2222/404 ,  C08F2220/1891 ,  C08F220/58

摘要： Provided is a liquid crystal alignment layer of which a constituent member is a polymer represented by the general formula (I).

公开(公告)号：US09645493B2

公开(公告)日：2017-05-09

申请号：US15091092

申请日：2016-04-05

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Daisuke Domon ,  Keiichi Masunaga ,  Satoshi Watanabe

IPC分类号： G03F7/004 ,  G03F7/038 ,  C08F220/18 ,  C07C381/12 ,  C08F220/24 ,  C08F220/30 ,  G03F1/76 ,  G03F1/78 ,  G03F7/20 ,  G03F7/32

CPC分类号： G03F7/038 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/30 ,  G03F1/76 ,  G03F1/78 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2059 ,  G03F7/327

摘要： A negative resist composition is provided comprising (A) a polymer comprising recurring units having an acid-eliminatable group and recurring units capable of generating acid upon exposure and (B) a carboxylic acid onium salt. When the negative resist composition is processed by the microprocessing technology, especially EB lithography, it forms a pattern having a very high resolution and minimal LER.