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    Scanning transmission ion microscope
    42.
    发明申请
    Scanning transmission ion microscope 有权
    扫描透射离子显微镜

    公开(公告)号：US20060284092A1

    公开(公告)日：2006-12-21

    申请号：US11147102

    申请日：2005-06-07

    Applicant: Billy Ward

    Inventor： Billy Ward

    IPC: G21K7/00

    CPC classification number: H01J37/28 ,  G01N23/04 ,  G01N23/225 ,  H01J37/08 ,  H01J2237/08 ,  H01J2237/0807 ,  H01J2237/2802

    Abstract: Scanning Transmission Ion Microscope. The microscope includes a bright helium ion source to generate an ion beam and a focusing electrostatic optical column to focus the ion beam. A translation stage supports a sample to receive the focused ion beam and a detector responds to ions transmitted through the sample to generate a signal from which properties of the sample may be displayed.

    Abstract translation: 扫描透射离子显微镜。 显微镜包括用于产生离子束的明氦离子源和用于聚焦离子束的聚焦静电光学柱。 平移台支持采样以接收聚焦的离子束，并且检测器对通过样品传输的离子进行响应以产生可以显示样品的特性的信号。

    Flood gun for charge neutralization
    43.
    发明授权
    Flood gun for charge neutralization 有权
    洪水枪用于中和电荷

    公开(公告)号：US07067821B2

    公开(公告)日：2006-06-27

    申请号：US11071998

    申请日：2005-03-04

    Applicant: Bryan Robert Barnard ,  Alan Rupert Bayly ,  Michael Hugh Humpherson

    Inventor： Bryan Robert Barnard ,  Alan Rupert Bayly ,  Michael Hugh Humpherson

    IPC: H01J37/30 ,  H01J49/10

    CPC classification number: H01J37/026 ,  H01J2237/0044 ,  H01J2237/06308 ,  H01J2237/0807 ,  H01J2237/082 ,  H01J2237/2516

    Abstract: A flood gun 10 for charge neutralization of an analysis region Ra of a sample S downstream of the flood gun, comprising: a first source 30 of electrons; a second source 50 of positively charged particles; and an extraction and focusing assembly 60,64, arranged to: (i) extract a first, electron beam from the first source and focus the first beam to a first flood area Ae at the analysis region; and (ii) extract a second, positive particle beam from the second source and focus the second beam to a second flood area Ai at the analysis region. The electron beam and the positive particle beam may both be extracted and focused simultaneously, in a single mode of operation or, alternately, in a dual mode of operation. A corresponding method of providing charge neutralization and a spectroscopic system for secondary particle emission analysis are disclosed.

    Abstract translation: 用于对洪水枪下游的样品S的分析区域R a a进行电荷中和的喷枪10，包括：电子的第一源30; 带正电的颗粒的第二源50; 以及提取和聚焦组件60,64，其布置成：（i）从第一源提取第一电子束，并将第一光束聚焦到分析区域处的第一泛洪区域A 1; 和（ii）从第二源提取第二个正的粒子束，并将第二个光束聚焦到分析区域的第二个洪泛区域A 1。 电子束和正粒子束可以在单一操作模式中或者以双重操作模式同时被提取和聚焦。 公开了提供电荷中和的相应方法和用于二次粒子发射分析的光谱系统。

    Scanning tunneling microscope
    44.
    发明授权
    Scanning tunneling microscope 失效
    扫描隧道显微镜

    公开(公告)号：US5438196A

    公开(公告)日：1995-08-01

    申请号：US163339

    申请日：1993-12-06

    Applicant: Shinichi Kitamura

    Inventor： Shinichi Kitamura

    IPC: G01B7/34 ,  G01Q30/02 ,  G01Q60/10 ,  H01J37/252 ,  H01J37/28

    CPC classification number: G01Q60/16 ,  B82Y35/00 ,  G01Q10/04 ,  G01Q30/02 ,  H01J2237/0807 ,  Y10S977/861

    Abstract: A scanning tunneling microscope having a scanner driven in three dimensions. A conducting tip is attached to the front end of the scanner. A voltage is applied between the tip and a specimen. Movement of the tip is controlled so that the resulting tunneling current is maintained constant. A scanning tunneling microscope (STM) image is created from a control signal for controlling the movement of the tip. The microscope is equipped with a secondary electron detector for detecting secondary electrons emitted from the specimen when the voltage applied between the tip and the specimen is increased. A secondary electron image originating from the same field of view as the STM image is derived.

    Abstract translation: 扫描隧道显微镜，具有三维驱动的扫描仪。 导电尖端连接到扫描仪的前端。 在尖端和样品之间施加电压。 控制尖端的移动，使得所得到的隧道电流保持恒定。 扫描隧道显微镜（STM）图像由用于控制尖端运动的控制信号产生。 显微镜配备有二次电子检测器，用于当尖端和样本之间施加的电压增加时，检测从样品发射的二次电子。 导出与STM图像相同视场的二次电子图像。

    Multilayered device micro etching method and system
    45.
    发明授权
    Multilayered device micro etching method and system 失效
    多层器件微蚀刻法和系统

    公开(公告)号：US5055696A

    公开(公告)日：1991-10-08

    申请号：US391304

    申请日：1989-08-08

    Applicant: Satoshi Haraichi ,  Fumikazu Itoh ,  Akira Shimase ,  Takahiko Takahashi

    Inventor： Satoshi Haraichi ,  Fumikazu Itoh ,  Akira Shimase ,  Takahiko Takahashi

    IPC: H01L21/302 ,  H01J37/304 ,  H01J37/305 ,  H01L21/3065

    CPC classification number: H01J37/304 ,  H01J37/228 ,  H01J37/3005 ,  H01J37/3056 ,  H01J2237/006 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01L21/76892

    Abstract: In locally reactive etching by irradiating to a multilayered workpiece reactive beam generated by extracting the reactant gas ionized or by irradiating such focussing beam as ion beam, electron beam or laser beam to the multilayered workpiece in an atmosphere of reactant gas; each layer of a multilayered device comprising a plurality of layers formed on a substrate can be accurately and quickly eteched by detecting the change of the material of the layer currently being etched and after detecting the change of material, switching reactant gas to be ionized or atmospheric reactant gas to one complying with the material of the layer currently being etched. This multilayered device micro etching method can be readily put into practice by a multilayered device micro etching system further comprising means for detecting the change of the material of layer to be etched and means for switching and supplying a plurality of reactant gases, in a micro etching appratus for performing locally rective etching.

    Abstract translation: 在局部反应蚀刻中，通过照射到通过提取离子化的反应物气体产生的多层工件反应性束，或者通过在反应气体的气氛中将这样的聚焦束作为离子束，电子束或激光束照射到多层工件; 通过检测当前被蚀刻的层的材料的变化，并且在检测到材料的变化，切换待离子化或大气的反应气体之后，可以精确而快速地将包含形成在基板上的多层的多层器件的每个层 反应气体与符合当前蚀刻层的材料一致。 这种多层器件微蚀刻方法可以通过多层器件微蚀刻系统容易地实施，该多层器件微蚀刻系统还包括用于在微蚀刻中检测被蚀刻层的材料的变化和用于切换和供应多个反应气体的装置的装置 用于进行局部矫正蚀刻。

    Charged particle beam apparatus and method utilizing liquid metal field ionization source and asymmetric three element lens system
    46.
    发明授权
    Charged particle beam apparatus and method utilizing liquid metal field ionization source and asymmetric three element lens system 失效
    采用液体金属场电离源和非对称三元透镜系统的带电粒子束装置和方法

    公开(公告)号：US4426582A

    公开(公告)日：1984-01-17

    申请号：US308125

    申请日：1981-10-02

    Applicant: Jonathan H. Orloff ,  Lynwood W. Swanson

    Inventor： Jonathan H. Orloff ,  Lynwood W. Swanson

    IPC: H01J37/04 ,  H01J37/08 ,  H01J37/12 ,  H01J37/30 ,  H01J31/48 ,  H01J1/88

    CPC classification number: H01J37/04 ,  H01J37/08 ,  H01J37/12 ,  H01J37/3007 ,  H01J2237/0807

    Abstract: A liquid metal field ionization source is used in conjunction with a three element asymmetric lens system to provide an ion gun having greater magnitude beam currents focused on a smaller spot size than has been previously possible for intermediate energy beams. An ultra-clean emitter surface is achieved by means of an argon sputtering and/or plasma etching process applied to the emitter surface before liquid metal is applied to the emitter surface to ensure uniform and sufficient flow of liquid metal to the apex of the emitter. The three element asymmetric lens system has a very low chromatic aberration coefficient, enabling precise focusing of beams with large energy spreads. For beam accelerating ratios in the range from 0.2 to 6, the ion gun produces very high current densities in beams focused on very small spot areas, despite the relatively large energy spread of beams produced by liquid metal ionization sources. The energy spread of the ion beam is minimized by operating the emitter at a voltage close to the onset voltage and at a temperature close to the melting point of the liquid metal.

    Abstract translation: 液体金属场电离源与三元素非对称透镜系统结合使用，以提供具有更大幅度的束电流的离子枪，其聚焦在比先前对中等能量束可能的更小的光点尺寸上。 通过在将液体金属施加到发射体表面之前施加到发射器表面上的氩溅射和/或等离子体蚀刻工艺来实现超清洁发射器表面，以确保液体金属均匀且足够的液体金属流到发射极的顶点。 三元非对称透镜系统具有非常低的色差系数，使得能够精确地聚焦具有大能量传播的光束。 对于0.2至6范围内的光束加速比，离子枪在聚焦在非常小的光斑区域上的光束中产生非常高的电流密度，尽管由液态金属离子源产生的光束的能量扩展相对较大。 通过在接近于起始电压的电压和接近液态金属的熔点的温度下操作发射极来使离子束的能量扩散最小化。

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