Compositions for microlithography
    70.
    发明授权
    Compositions for microlithography 失效
    用于微光刻的组合物

    公开(公告)号:US06974657B2

    公开(公告)日:2005-12-13

    申请号:US10380922

    申请日:2001-10-16

    摘要: A fluorine-containing polymer prepared from at least a spacer group selected from the group consisting of ethylene, alpha-olefins, 1,1′-disubstituted olefins, vinyl alcohols, vinyl ethers, and 1,3-dienes; and a norbornyl radical containing a functional group containing the structure: —C(Rf)(Rf′)Orb wherein Rf and Rf′ are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is an integer ranging from 2 to about 10 and Rb is a hydrogen atom or an acid- or base-labile protecting group; r is an integer ranging from 0-4. The fluorine-containing polymer has an absorption coefficient of less than 4.0 mm−1 at a wavelength of 157 nm. These polymers are useful in photoresist compositions for microlithography. They exhibit high transparency at this short wavelength and also possess other key properties, including good plasma etch resistance and adhesive properties.

    摘要翻译: 由至少选自乙烯,α-烯烃,1,1'-二取代的烯烃,乙烯醇,乙烯基醚和1,3-二烯的间隔基组成的含氟聚合物; 和含有具有以下结构的官能团的降冰片基:-C(R)f(= O)或其中R是< SUB> F 1和R 2'是相同或不同的1至约10个碳原子的氟代烷基或一起为(CF 2) 其中n为2至约10的整数,R b为氢原子或酸或碱不稳定保护基; r为0-4以内的整数。 含氟聚合物在157nm的波长下的吸收系数小于4.0mm -1。 这些聚合物可用于微光刻的光致抗蚀剂组合物中。 它们在这种短波长下表现出高透明度,并且还具有其他关键性能,包括良好的等离子体耐蚀刻性和粘合性。