公开(公告)号：US09768109B2

公开(公告)日：2017-09-19

申请号：US14861958

申请日：2015-09-22

Applicant: QUALCOMM Incorporated

Inventor： Shiqun Gu ,  Daeik Daniel Kim ,  Matthew Michael Nowak ,  Jonghae Kim ,  Changhan Hobie Yun ,  Je-Hsiung Jeffrey Lan ,  David Francis Berdy

IPC: H01L23/498 ,  H01L21/84 ,  H01L21/8234 ,  H01L21/304 ,  H01L27/088 ,  H01L27/12 ,  H01L23/66 ,  H01L21/306

CPC classification number: H01L27/1203 ,  H01L21/304 ,  H01L21/30604 ,  H01L21/76251 ,  H01L21/76802 ,  H01L21/76877 ,  H01L21/76895 ,  H01L21/823481 ,  H01L21/84 ,  H01L23/49894 ,  H01L23/528 ,  H01L23/66 ,  H01L27/088 ,  H01L27/092 ,  H01L27/1222 ,  H01L27/1248 ,  H01L27/1255 ,  H01L27/1266 ,  H01L29/1087 ,  H01L29/66772

Abstract: An integrated circuit (IC) includes a first semiconductor device on a glass substrate. The first semiconductor device includes a first semiconductive region of a bulk silicon wafer. The IC includes a second semiconductor device on the glass substrate. The second semiconductor device includes a second semiconductive region of the bulk silicon wafer. The IC includes a through substrate trench between the first semiconductive region and the second semiconductive region. The through substrate trench includes a portion disposed beyond a surface of the bulk silicon wafer.

公开(公告)号：US20170084628A1

公开(公告)日：2017-03-23

申请号：US14858203

申请日：2015-09-18

Applicant: QUALCOMM Incorporated

Inventor： Daeik Daniel Kim ,  Changhan Hobie Yun ,  Je-Hsiung Jeffrey Lan ,  Jonghae Kim ,  Matthew Michael Nowak

IPC: H01L27/12 ,  H01L21/762

CPC classification number: H01L27/1203 ,  H01L21/76256 ,  H01L21/76264 ,  H01L21/76275 ,  H01L21/76283 ,  H01L21/84 ,  H01L21/86

Abstract: Substrate-transferred, deep trench isolation silicon-on-insulator (SOI) semiconductor devices formed from bulk semiconductor wafers are disclosed. In this regard, a bulk semiconductor wafer is provided that includes a bulk body, one or more transistors formed in the bulk body, and deep trenches formed between the transistors formed in the bulk body to provide isolation between the transistors. To prevent the bulk body from electrically interconnecting the transistors, the bulk body is thinned near, at, or beyond a back side of the deep trenches formed in the bulk body to form separate bulk bodies for each transistor isolated by the deep trenches. An insulation substrate is bonded to the bulk semiconductor device to form an SOI wafer. In this manner, residual bulk bodies of the transistors in the SOI wafer are isolated between the deep trenches and the insulation substrate to reduce or avoid leakage current between transistors.

公开(公告)号：US09601607B2

公开(公告)日：2017-03-21

申请号：US14225836

申请日：2014-03-26

Applicant: QUALCOMM Incorporated

Inventor： Xia Li ,  Daeik Daniel Kim ,  Bin Yang ,  Jonghae Kim ,  Daniel Wayne Perry

IPC: H03K17/687 ,  H01L29/739 ,  G05F3/16 ,  H01L27/07

CPC classification number: H01L29/7393 ,  G05F3/16 ,  H01L27/0705

Abstract: A method includes biasing a first gate voltage to enable unipolar current to flow from a first region of a transistor to a second region of the transistor according to a field-effect transistor (FET)-type operation. The method also includes biasing a body terminal to enable bipolar current to flow from the first region to the second region according to a bipolar junction transistor (BJT)-type operation. The unipolar current flows concurrently with the bipolar current to provide dual mode digital and analog device in complementary metal oxide semiconductor (CMOS) technology.

公开(公告)号：US20170062120A1

公开(公告)日：2017-03-02

申请号：US14841132

申请日：2015-08-31

Applicant: QUALCOMM Incorporated

Inventor： Changhan Hobie Yun ,  Mario Francisco Velez ,  Chengjie Zuo ,  Daeik Daniel Kim ,  David Francis Berdy ,  Je-Hsiung Jeffrey Lan ,  Jonghae Kim ,  Niranjan Sunil Mudakatte ,  Robert Paul Mikulka

IPC: H01F27/28 ,  H01F41/14 ,  H01F41/04 ,  H01F27/245

CPC classification number: H01F27/2804 ,  H01F17/0013 ,  H01F17/0033 ,  H01F27/245 ,  H01F41/042 ,  H01F41/046 ,  H01F41/14 ,  H01F41/32 ,  H01F2027/2809 ,  H01L23/645 ,  H01L2224/16225 ,  H01L2924/15311 ,  H01L2924/181 ,  H05K1/165 ,  H01L2924/00012

Abstract: A substrate includes a first dielectric layer, a magnetic core at least partially in the first dielectric layer, where the magnetic core comprises a first non-horizontal thin film magnetic (TFM) layer. The substrate also includes a first inductor that includes a plurality of first interconnects, where the first inductor is positioned in the substrate to at least partially surround the magnetic core. The magnetic core may further include a second non-horizontal thin film magnetic (TFM) layer. The magnetic core may further include a core layer. The magnetic core may further include a third thin film magnetic (TFM) layer, and a fourth thin film magnetic (TFM) layer that is substantially parallel to the third thin film magnetic (TFM) layer.

Abstract translation: 衬底包括第一介电层，至少部分地在第一介电层中的磁芯，其中磁芯包括第一非水平薄膜磁性（TFM）层。 衬底还包括包括多个第一互连件的第一电感器，其中第一电感器定位在衬底中以至少部分地围绕磁芯。 磁芯还可以包括第二非水平薄膜磁性（TFM）层。 磁芯还可以包括芯层。 磁芯还可以包括第三薄膜磁性（TFM）层和基本上平行于第三薄膜磁性（TFM）层的第四薄膜磁性（TFM）层。

公开(公告)号：US20160358709A1

公开(公告)日：2016-12-08

申请号：US15242007

申请日：2016-08-19

Applicant: QUALCOMM Incorporated

Inventor： Daeik Daniel Kim ,  Chengjie Zuo ,  Changhan Hobie Yun ,  Mario Francisco Velez ,  Robert Paul Mikulka ,  Xiangdong Zhang ,  Jonghae Kim ,  Je-Hsiung Lan

IPC: H01F41/04 ,  H01F27/28

CPC classification number: H01F41/041 ,  H01F17/0013 ,  H01F27/2804 ,  H01F41/042 ,  H01F2017/0053 ,  H01F2017/0073 ,  H01F2027/2809

Abstract: A method includes forming a first conductive spiral and a second conductive spiral of a spiral inductor coupled to a substrate. The second conductive spiral overlays the first conductive spiral. A first portion of an innermost turn of the spiral inductor has a first thickness in a direction perpendicular to the substrate. The first portion of the innermost turn includes a first portion of the first conductive spiral and does not include the second conductive spiral. A second portion of the innermost turn includes a first portion of the second conductive spiral. A portion of an outermost turn of the spiral inductor has a second thickness in the direction perpendicular to the substrate. The second thickness is greater than the first thickness. The portion of the outermost turn includes a second portion of the first conductive spiral and a second portion of the second conductive spiral.

Abstract translation: 一种方法包括形成耦合到衬底的螺旋电感器的第一导电螺旋和第二导电螺旋。 第二导电螺旋覆盖第一导电螺旋。 螺旋电感器的最内圈的第一部分在垂直于衬底的方向上具有第一厚度。 最内圈的第一部分包括第一导电螺旋的第一部分，并且不包括第二导电螺旋。 最内圈的第二部分包括第二导电螺旋的第一部分。 螺旋电感器的最外圈的一部分在垂直于衬底的方向上具有第二厚度。 第二厚度大于第一厚度。 最外圈的部分包括第一导电螺旋的第二部分和第二导电螺旋的第二部分。

公开(公告)号：US09362218B2

公开(公告)日：2016-06-07

申请号：US13968627

申请日：2013-08-16

Applicant: QUALCOMM Incorporated

Inventor： Daeik Daniel Kim ,  Young Kyu Song ,  Changhan Hobie Yun ,  Mario Francisco Velez ,  Chengjie Zuo ,  Jonghae Kim ,  Xiaonan Zhang ,  Ryan David Lane

IPC: H01L23/498 ,  H01L21/768 ,  H01L49/02 ,  H01L23/50 ,  H01L23/64 ,  H01L23/522

CPC classification number: H01L23/49827 ,  H01L21/76885 ,  H01L23/49816 ,  H01L23/50 ,  H01L23/5222 ,  H01L23/642 ,  H01L28/10 ,  H01L28/20 ,  H01L28/40 ,  H01L2224/16225 ,  H01L2225/06572 ,  H01L2924/19105

Abstract: Some novel features pertain to a semiconductor device that includes a substrate, a first cavity that traverses the substrate. The first cavity is configured to be occupied by a interconnect material (e.g., solder ball). The substrate also includes a first metal layer coupled to a first side wall of the first cavity. The substrate further includes a first integrated passive device (IPD) on a first surface of the substrate, the first IPD coupled to the first metal layer. In some implementations, the substrate is a glass substrate. In some implementations, the first IPD is one of at least a capacitor, an inductor and/or a resistor. In some implementations, the semiconductor device further includes a second integrated passive device (IPD) on a second surface of the substrate. The second IPD is coupled to the first metal layer.

Abstract translation: 一些新颖的特征涉及一种半导体器件，其包括衬底，穿过衬底的第一腔体。 第一腔被配置为被互连材料（例如，焊球）占据。 衬底还包括耦合到第一腔的第一侧壁的第一金属层。 衬底还包括在衬底的第一表面上的第一集成无源器件（IPD），第一IPD耦合到第一金属层。 在一些实施方案中，基底是玻璃基底。 在一些实现中，第一IPD是至少一个电容器，电感器和/或电阻器中的一个。 在一些实施方式中，半导体器件还包括在衬底的第二表面上的第二集成无源器件（IPD）。 第二IPD耦合到第一金属层。

公开(公告)号：US20160095208A1

公开(公告)日：2016-03-31

申请号：US14498230

申请日：2014-09-26

Applicant: QUALCOMM Incorporated

Inventor： Daeik Daniel Kim ,  Je-Hsiung Jeffrey Lan ,  Changhan Hobie Yun ,  Mario Francisco Velez ,  Chengjie Zuo ,  Jonghae Kim ,  David Francis Berdy

IPC: H05K1/02 ,  H01L21/768 ,  H05K1/09 ,  C23F1/02 ,  H05K1/03

CPC classification number: H05K1/0271 ,  C23F1/02 ,  H01L21/768 ,  H01L23/562 ,  H01L2924/0002 ,  H05K1/0306 ,  H05K1/09 ,  H05K2201/0154 ,  H05K2201/0195 ,  H01L2924/00

Abstract: A device includes a stress relief region between at least two stress domains of a substrate (e.g., of a semiconductor die or other integrated circuit). The stress relief region includes a conductive structure electrically coupling circuitries of the stress domains between which the conductive structure is disposed.

Abstract translation: 器件包括在衬底（例如，半导体管芯或其他集成电路）的至少两个应力结构域之间的应力消除区域。 应力消除区域包括导电结构，电耦合应力区域的电路，导电结构设置在该应力区域之间。

公开(公告)号：US20160093750A1

公开(公告)日：2016-03-31

申请号：US14498359

申请日：2014-09-26

Applicant: QUALCOMM Incorporated

Inventor： Daeik Daniel Kim ,  Jonghae Kim ,  Chengjie Zuo ,  Sang-June Park ,  Changhan Hobie Yun ,  Mario Francisco Velez ,  David Francis Berdy ,  Matthew Michael Nowak ,  Robert Paul Mikulka

IPC: H01L29/93

CPC classification number: H01L29/93 ,  H01L27/0629 ,  H01L29/94

Abstract: An apparatus includes a varactor having a first contact that is located on a first side of a substrate. The varactor includes a second contact that is located on a second side of the substrate, and the second side is opposite the first side. The apparatus further includes a signal path between the first contact and the second contact.

Abstract translation: 一种装置包括具有位于衬底的第一侧上的第一接触的变容二极管。 变容二极管包括位于衬底的第二侧上的第二接触件，第二侧面与第一侧相对。 该装置还包括在第一触点和第二触点之间的信号路径。

公开(公告)号：US09202789B2

公开(公告)日：2015-12-01

申请号：US14254764

申请日：2014-04-16

Applicant: QUALCOMM Incorporated

Inventor： Daeik Daniel Kim ,  Mario Francisco Velez ,  Jonghae Kim ,  Matthew Michael Nowak ,  Chengjie Zuo ,  Changhan Hobie Yun ,  David Francis Berdy ,  Robert Paul Mikulka

IPC: H01L23/48 ,  H01L23/552 ,  H01L23/31 ,  H01L23/00 ,  H01L23/498 ,  H01L23/04 ,  H01L23/538 ,  H05K9/00

CPC classification number: H01L23/552 ,  H01L23/04 ,  H01L23/3107 ,  H01L23/32 ,  H01L23/49805 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/49838 ,  H01L23/5386 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/81 ,  H01L2224/131 ,  H01L2224/13147 ,  H01L2224/16113 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/16235 ,  H01L2924/15311 ,  H01L2924/15313 ,  H01L2924/181 ,  H01R12/7076 ,  H01R12/714 ,  H05K1/181 ,  H05K9/0032 ,  H05K2201/10189 ,  H05K2201/1053 ,  H05K2201/10734 ,  Y02P70/611 ,  H01L2924/014 ,  H01L2924/00014

Abstract: Some novel features pertain to an integrated device package (e.g., die package) that includes a package substrate, a die, an encapsulation layer and a first set of metal layers. The package substrate includes a first surface and a second surface. The die is coupled to the first surface of the package substrate. The encapsulation layer encapsulates the die. The first set of metal layers is coupled to a first exterior surface of the encapsulation layer. In some implementations, the first set of metal layers is configured to operate as a die-to-wire connector of the integrated device package. In some implementations, the integrated device package includes a second set of metal layers coupled to the second surface of the package substrate. In some implementations, the integrated device package includes a second set of metal layers coupled to a second exterior surface of the encapsulation layer.

Abstract translation: 一些新颖特征涉及包括封装衬底，管芯，封装层和第一组金属层的集成器件封装（例如管芯封装）。 封装衬底包括第一表面和第二表面。 模具耦合到封装衬底的第一表面。 封装层封装模具。 第一组金属层耦合到封装层的第一外表面。 在一些实施方案中，第一组金属层被配置为作为集成器件封装的管芯到线连接器工作。 在一些实施方案中，集成器件封装包括耦合到封装衬底的第二表面的第二组金属层。 在一些实施方案中，集成器件封装包括耦合到封装层的第二外表面的第二组金属层。

公开(公告)号：US20150304059A1

公开(公告)日：2015-10-22

申请号：US14682023

申请日：2015-04-08

Applicant: QUALCOMM Incorporated

Inventor： Chengjie Zuo ,  Daeik Daniel Kim ,  David Francis Berdy ,  Changhan Hobie Yun ,  Je-Hsiung Jeffrey Lan ,  Robert Paul Mikulka ,  Mario Francisco Velez ,  Jonghae Kim ,  Matthew Michael Nowak ,  Ryan Scott C. Spring ,  Xiangdong Zhang

IPC: H04J1/08

CPC classification number: H04J1/08 ,  H03H7/465 ,  H03H2240/00 ,  H03H2250/00 ,  H04B1/0057 ,  H04B1/006 ,  H04B1/0064

Abstract: An apparatus is disclosed that includes a frequency multiplexer circuit coupled to an input node and configured to receive an input signal via the input node. The frequency multiplexer circuit comprises a first filter circuit, a second filter circuit, and a third filter circuit. The apparatus also includes a switching circuit that is configurable to couple at least two of a first output of the first filter circuit, a second output of the second filter circuit, or a third output of the third filter circuit to a single output port.

Abstract translation: 公开了一种装置，其包括耦合到输入节点并经配置以经由输入节点接收输入信号的频率复用器电路。 频率复用器电路包括第一滤波器电路，第二滤波器电路和第三滤波器电路。 该装置还包括可配置为将第一滤波器电路的第一输出，第二滤波器电路的第二输出或第三滤波器电路的第三输出中的至少两个耦合到单个输出端口的开关电路。