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    Ultra-fine microfabrication method using a fast atomic energy beam
    71.
    发明授权
    Ultra-fine microfabrication method using a fast atomic energy beam 失效
    使用快速原子能光束的超微细微细加工方法

    公开(公告)号：US5894058A

    公开(公告)日：1999-04-13

    申请号：US870830

    申请日：1997-06-06

    申请人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Yotaro Hatamura

    发明人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Yotaro Hatamura

    IPC分类号： G03F1/00 ,  G03F1/20 ,  G03F7/00 ,  G03F7/20 ,  H01J9/02 ,  H01L21/033 ,  H01L21/308 ,  G03C5/00

    CPC分类号： H01L21/3086 ,  G03F7/00 ,  G03F7/001 ,  G03F7/2065 ,  G03F7/70358 ,  H01J9/025 ,  H01L21/0331 ,  H01L21/0337 ,  H01J2209/0223

    摘要： An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basic technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. The microfabrication method include radiating a Fast Atomic beam through a patterned photoresist Film to fabricate a pattern of 0.1 to 100 nm in a target object.

    摘要翻译： 使用能量束的超微细微加工方法是基于使用由纳米或微米尺寸的微粒提供的屏蔽来产生通过基本设计的传统光刻技术不可能的各种三维细微结构 以产生二维结构。 当能量束和屏蔽的辐射的基本技术与使用磁场，电场或激光束的屏蔽定位技术结合使用或不伴随反应气体粒子束或解决方案提供的附加化学效应时，非常高的精细结构 纵横比可以精确地生产。 微加工方法包括通过图案化的光致抗蚀剂膜辐射快原子束以在目标物体中制造0.1至100nm的图案。

    Fabrication method with energy beam
    72.
    发明授权
    Fabrication method with energy beam 失效
    能量束的制作方法

    公开(公告)号：US5868952A

    公开(公告)日：1999-02-09

    申请号：US617376

    申请日：1996-03-18

    申请人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Takao Kato ,  Yotaro Hatamura ,  Masayuki Nakao

    发明人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Takao Kato ,  Yotaro Hatamura ,  Masayuki Nakao

    IPC分类号： G03F1/00 ,  G03F1/20 ,  G03F7/00 ,  G03F7/20 ,  H01J9/02 ,  H01L21/033 ,  H01L21/308 ,  B44C1/22

    CPC分类号： H01L21/3086 ,  G03F7/00 ,  G03F7/001 ,  G03F7/2065 ,  G03F7/70358 ,  H01J9/025 ,  H01L21/0331 ,  H01L21/0337 ,  H01J2209/0223

    摘要： Three-dimensional ultra-fine micro-fabricated structures of the order of .mu.m and less are produced for use in advanced optical communication systems and quantum effect devices. The basic components are an energy beam source, a mask member and a specimen stage. Because the mask member is an independent component, various combinations of relative movements of the mask member with respect to the beam axis and/or workpiece can be made with high precision to produce curved or slanted surfaces on a workpiece, thereby producing a multiple lines or arrays of convex or concave micro-lenses. Other examples of fine-structures include deposition of thin films in a multiple line pattern or in an array pattern. Because of the flexibility of fabrication method and material of fabrication, labyrinth seals having curved surfaces with grooved structures can be used as friction reduction means for bearing components. Fine groove dimensions of the order of nm are possible. Energy beams can be any of fast atomic beams, ion beams, electron beam, laser beams, radiation beams, X-ray beams and radical particle beams. Parallel beams are often used, but when a focused beam is used, a technique of reduced projection imaging can be utilized to produce a fine-structure of the order of nm.

    摘要翻译： 产生了数量级小于等于30的数量级的三维超细微结构，用于先进的光通信系统和量子效应器件。 基本部件是能量束源，掩模构件和样品台。 由于掩模构件是独立的部件，所以可以高精度地制造掩模构件相对于射束轴线和/或工件的相对运动的各种组合，以在工件上产生弯曲或倾斜的表面，从而产生多条线或 阵列的凸或微型微透镜。 精细结构的其他实例包括以多线图案或阵列图案沉积薄膜。 由于制造方法和制造材料的灵活性，具有带槽结构的曲面的迷宫式密封件可用作轴承部件的摩擦减小装置。 可以使nm的数量级的细槽尺寸。 能量束可以是快速原子束，离子束，电子束，激光束，辐射束，X射线束和自由基粒子束中的任何一种。 通常使用平行光束，但是当使用聚焦光束时，可以利用降低投影成像的技术来产生大约数量级的精细结构。

    Ultra-fine microfabrication method using an energy beam
    73.
    发明授权
    Ultra-fine microfabrication method using an energy beam 失效
    使用能量束的超细微细加工方法

    公开(公告)号：US6010831A

    公开(公告)日：2000-01-04

    申请号：US274341

    申请日：1999-03-23

    申请人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Yotaro Hatamura

    发明人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Yotaro Hatamura

    IPC分类号： G03F1/00 ,  G03F1/20 ,  G03F7/00 ,  G03F7/20 ,  H01J9/02 ,  H01L21/033 ,  H01L21/308 ,  G03C5/00 ,  H01L21/302

    CPC分类号： H01L21/3086 ,  G03F7/00 ,  G03F7/001 ,  G03F7/2065 ,  G03F7/70358 ,  H01J9/025 ,  H01L21/0331 ,  H01L21/0337 ,  H01J2209/0223

    摘要： An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.

    摘要翻译： 使用能量束的超微细微加工方法是基于使用由纳米或微米尺寸的微粒提供的屏蔽来产生通过基本设计的传统光刻技术不可能的各种三维细微结构 以产生二维结构。 当能量束和屏蔽的辐射的基础技术与使用磁场，电场或激光束的屏蔽定位技术结合使用或不存在由反应性气体粒子束或解决方案提供的附加化学效应时，具有非常高的精细结构 纵横比可以精确地生产。 通过该方法制造的具有精细结构的器件的应用包括光通信中的波长偏移，量子效应器件和强激光器件。

    Micro-processing apparatus and method therefor
    74.
    发明授权
    Micro-processing apparatus and method therefor 失效
    微处理装置及其方法

    公开(公告)号：US5852298A

    公开(公告)日：1998-12-22

    申请号：US621990

    申请日：1996-03-26

    申请人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Takao Kato ,  Masaaki Kajiyama ,  Takashi Tsuzuki ,  Yotaro Hatamura ,  Masayuki Nakao

    发明人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Takao Kato ,  Masaaki Kajiyama ,  Takashi Tsuzuki ,  Yotaro Hatamura ,  Masayuki Nakao

    IPC分类号： H01J37/20 ,  H01J37/30 ,  H01J37/00

    CPC分类号： H01J37/3005 ,  H01J37/20

    摘要： A micro-working apparatus performs fabrication and assembly tasks for micron/nanometer sized objects while progress of operations is observed in real-time by at least a pair of optical or electron microscopes to provide simultaneous views from at least two directions. This offers spatial visual information regarding the working space which is particularly critical in micro-working. Micro-working is further facilitated by the use of a micro-pallet device specially designed for use in the apparatus, but also offering other application possibilities. Rotational and parallel translation movements provided by the micro-pallet combined with the micro-working capability of the apparatus are utilized to enable production of micron-sized parts for use in advanced applications of optical and electronic devices.

    摘要翻译： 微加工设备对微米/纳米尺寸的物体执行制造和组装任务，同时通过至少一对光学或电子显微镜实时观察操作的进展，从而提供来自至少两个方向的同时视图。 这提供了关于微型工作特别关键的工作空间的空间视觉信息。 通过使用特别设计用于该设备的微型托盘装置，还提供其他应用的可能性，进一步促进了微加工。 微型托盘提供的旋转和平行平移运动与该装置的微加工能力相结合，可用于生产用于光学和电子设备的先进应用的微米级部件。

    Method and apparatus for energy beam machining
    75.
    发明授权
    Method and apparatus for energy beam machining 失效
    能量束加工方法和装置

    公开(公告)号：US5770123A

    公开(公告)日：1998-06-23

    申请号：US531698

    申请日：1995-09-21

    申请人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Tadasuke Kobata ,  Masayuki Nakao ,  Yotaro Hatamura

    发明人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Tadasuke Kobata ,  Masayuki Nakao ,  Yotaro Hatamura

    IPC分类号： H01J37/305 ,  B29C59/16

    CPC分类号： H01J37/3056 ,  H01J2237/3114

    摘要： An energy beam is irradiated to a workpiece through a beam transmission hole defined in a mask. At that time, a relative position between an energy beam source and the mask or the mask and the workpiece is changed, so that machining depth of the workpiece is varied depending on machining portions of the workpiece, which correspond to amounts of irradiation of the energy beam. With this method, a machined product having locally different depths very easily can be made and further the product can be machined to desired depths with high accuracy by a single machining operation in a short time.

    摘要翻译： 能量束通过限定在掩模中的光束传播孔照射到工件。 此时，能量束源与掩模或掩模和工件之间的相对位置改变，使得工件的加工深度根据工件的加工部分而变化，其对应于能量的照射量 光束。 通过这种方法，可以非常容易地形成具有局部不同深度的加工产品，并且通过在短时间内的单个加工操作，可以高精度地将产品加工成期望的深度。