公开(公告)号：US09847399B1

公开(公告)日：2017-12-19

申请号：US15216565

申请日：2016-07-21

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Meng-Han Lin ,  Chih-Ren Hsieh ,  Chen-Chin Liu ,  Zhen Yang

IPC: H01L27/088 ,  H01L29/423 ,  H01L21/8234 ,  H01L29/06 ,  H01L21/28

CPC classification number: H01L29/42368 ,  H01L21/28185 ,  H01L21/823462 ,  H01L21/823481 ,  H01L27/088 ,  H01L29/0649

Abstract: In a method of manufacturing a semiconductor device, an isolation region is formed in a substrate. The isolation region surrounds an active region of the substrate in plan view and includes an insulating material. A first dielectric layer is formed over the active region. A mask layer is formed on at least a part of a border line between the isolation region and the active region. The mask layer covers a part, but not entirety, of the first dielectric layer and a part of the isolation region surrounding the active region. The first dielectric layer not covered by the mask layer is removed such that a part of the active region is exposed. After the first dielectric layer is removed, the mask layer is removed. A second dielectric layer is formed so that a gate dielectric layer is formed. A gate electrode is formed over the gate dielectric layer.

公开(公告)号：US12256550B2

公开(公告)日：2025-03-18

申请号：US18327439

申请日：2023-06-01

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Bo-Feng Young ,  Meng-Han Lin ,  Chih-Yu Chang ,  Sai-Hooi Yeong ,  Yu-Ming Lin

IPC: H10B51/20 ,  H01L21/02 ,  H01L23/522 ,  H01L29/24 ,  H10B51/30

Abstract: A memory cell includes patterning a first trench extending through a first conductive line, depositing a memory film along sidewalls and a bottom surface of the first trench, depositing a channel layer over the memory film, the channel layer extending along the sidewalls and the bottom surface of the first trench, depositing a first dielectric layer over and contacting the channel layer to fill the first trench, patterning a first opening, wherein patterning the first opening comprises etching the first dielectric layer, depositing a gate dielectric layer in the first opening, and depositing a gate electrode over the gate dielectric layer and in the first opening, the gate electrode being surrounded by the gate dielectric layer.

公开(公告)号：US12218209B2

公开(公告)日：2025-02-04

申请号：US18517458

申请日：2023-11-22

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Meng-Han Lin ,  Sai-Hooi Yeong ,  Chi On Chui

IPC: H01L29/417 ,  H01L21/8234 ,  H01L21/8238 ,  H01L27/088 ,  H01L27/092 ,  H01L29/10 ,  H01L29/40 ,  H01L29/423 ,  H01L29/51 ,  H01L29/66

Abstract: Methods for forming contacts to source/drain regions and gate electrodes in low- and high-voltage devices and devices formed by the same are disclosed. In an embodiment a device includes a first channel region in a substrate adjacent a first source/drain region; a first gate over the first channel region; a second channel region in the substrate adjacent a second source/drain region, a top surface of the second channel region being below a top surface of the first channel region; a second gate over the second channel region; an ILD over the first gate and the second gate; a first contact extending through the ILD and coupled to the first source/drain region; and a second contact extending through the ILD, coupled to the second source/drain region, and having a width greater a width of the first contact and a height greater than a height of the first contact.

公开(公告)号：US12200940B2

公开(公告)日：2025-01-14

申请号：US17874815

申请日：2022-07-27

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Han-Jong Chia ,  Chung-Te Lin ,  Feng-Cheng Yang ,  Meng-Han Lin ,  Sheng-Chen Wang

IPC: H10B51/20 ,  G11C11/22 ,  G11C11/56 ,  H01L29/66 ,  H01L29/78 ,  H10B51/10 ,  H10B51/30 ,  H01L21/28

Abstract: In an embodiment, a device includes: a first dielectric layer over a substrate; a word line over the first dielectric layer, the word line including a first main layer and a first glue layer, the first glue layer extending along a bottom surface, a top surface, and a first sidewall of the first main layer; a second dielectric layer over the word line; a first bit line extending through the second dielectric layer and the first dielectric layer; and a data storage strip disposed between the first bit line and the word line, the data storage strip extending along a second sidewall of the word line.

公开(公告)号：US12167608B2

公开(公告)日：2024-12-10

申请号：US17981608

申请日：2022-11-07

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Meng-Han Lin ,  Han-Jong Chia ,  Sheng-Chen Wang ,  Feng-Cheng Yang ,  Yu-Ming Lin ,  Chung-Te Lin

IPC: H10B51/20 ,  G11C11/22 ,  H01L23/522 ,  H01L29/66 ,  H01L29/78 ,  H10B43/20 ,  H10B43/27 ,  H10B51/10 ,  H10B51/30

Abstract: In an embodiment, a device includes: a source line extending in a first direction; a bit line extending in the first direction; a back gate between the source line and the bit line, the back gate extending in the first direction; a channel layer surrounding the back gate; a word line extending in a second direction, the second direction perpendicular to the first direction; and a data storage layer extending along the word line, the data storage layer between the word line and the channel layer, the data storage layer between the word line and the bit line, the data storage layer between the word line and the source line.

公开(公告)号：US12114496B2

公开(公告)日：2024-10-08

申请号：US18225561

申请日：2023-07-24

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Meng-Han Lin ,  Te-An Chen

IPC: H10B41/27 ,  H01L21/033 ,  H01L29/06 ,  H10B43/27

CPC classification number: H10B41/27 ,  H01L21/0337 ,  H01L29/0649 ,  H10B43/27

Abstract: In a method of manufacturing a semiconductor device, a memory cell structure covered by a protective layer is formed in a memory cell area of a substrate. A mask pattern is formed. The mask pattern has an opening over a first circuit area, while the memory cell area and a second circuit area are covered by the mask pattern. The substrate in the first circuit area is recessed, while the memory cell area and the second circuit area are protected. A first field effect transistor (FET) having a first gate dielectric layer is formed in the first circuit area over the recessed substrate and a second FET having a second gate dielectric layer is formed in the second circuit area over the substrate as viewed in cross section.

公开(公告)号：US20240312830A1

公开(公告)日：2024-09-19

申请号：US18673571

申请日：2024-05-24

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Han-Jong Chia ,  Meng-Han Lin ,  Sheng-Chen Wang ,  Feng-Cheng Yang ,  Chung-Te Lin

IPC: H01L21/762 ,  G11C7/18 ,  H10B51/20 ,  H10B99/00

CPC classification number: H01L21/76237 ,  G11C7/18 ,  H10B51/20 ,  H10B99/00

Abstract: A method of forming a three-dimensional (3D) memory device includes: forming a layer stack over a substrate, the layer stack including alternating layers of a first dielectric material and a second dielectric material; forming trenches extending through the layer stack; replacing the second dielectric material with an electrically conductive material to form word lines (WLs); lining sidewalls and bottoms of the trenches with a ferroelectric material; filling the trenches with a third dielectric material; forming bit lines (BLs) and source lines (SLs) extending vertically through the third dielectric material; removing portions of the third dielectric material to form openings in the third dielectric material between the BLs and the SLs; forming a channel material along sidewalls of the openings; and filling the openings with a fourth dielectric.

公开(公告)号：US20240268128A1

公开(公告)日：2024-08-08

申请号：US18637552

申请日：2024-04-17

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Meng-Han Lin ,  Chih-Yu Chang ,  Han-Jong Chia ,  Sai-Hooi Yeong ,  Yu-Ming Lin

IPC: H10B63/00 ,  H01L21/02 ,  H01L21/822 ,  H01L21/8234 ,  H01L27/06 ,  H01L29/06 ,  H01L29/24 ,  H01L29/423 ,  H01L29/66 ,  H01L29/786 ,  H01L29/861 ,  H10B43/20 ,  H10B43/35 ,  H10N70/00 ,  H10N70/20

CPC classification number: H10B63/84 ,  H01L21/02565 ,  H01L21/8221 ,  H01L21/823475 ,  H01L27/0688 ,  H01L29/0673 ,  H01L29/24 ,  H01L29/42392 ,  H01L29/66969 ,  H01L29/78696 ,  H01L29/861 ,  H10B43/20 ,  H10B63/20 ,  H10B63/30 ,  H10N70/011 ,  H10B43/35 ,  H10N70/20

Abstract: Memory devices and methods of forming the memory devices are disclosed herein. The memory devices include a resistive memory array including a first resistive memory cell, a staircase contact structure adjacent the resistive memory array, and an inter-metal dielectric layer over the staircase contact structure. The memory devices further include a first diode and a second diode over the inter-metal dielectric layer. The memory devices further include a first conductive via electrically coupling the first diode to a first resistor of the first resistive memory cell and a second conductive via electrically coupling the second diode to a second resistor of the first resistive memory cell.

公开(公告)号：US20240268122A1

公开(公告)日：2024-08-08

申请号：US18638140

申请日：2024-04-17

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Meng-Han Lin ,  Bo-Feng Young ,  Han-Jong Chia ,  Sheng-Chen Wang ,  Feng-Cheng Yang ,  Sai-Hooi Yeong ,  Yu-Ming Lin

IPC: H10B51/20 ,  G11C7/18 ,  G11C11/14 ,  H10B51/10

CPC classification number: H10B51/20 ,  G11C7/18 ,  G11C11/14 ,  H10B51/10

Abstract: A method of forming a ferroelectric random access memory (FeRAM) device includes: forming a first layer stack and a second layer stack successively over a substrate, where the first layer stack and the second layer stack have a same layered structure that includes a layer of a first electrically conductive material over a layer of a first dielectric material, where the first layer stack extends beyond lateral extents of the second layer stack; forming a trench that extends through the first layer stack and the second layer stack; lining sidewalls and a bottom of the trench with a ferroelectric material; conformally forming a channel material in the trench over the ferroelectric material; filling the trench with a second dielectric material; forming a first opening and a second opening in the second dielectric material; and filling the first opening and the second opening with a second electrically conductive material.

公开(公告)号：US12002534B2

公开(公告)日：2024-06-04

申请号：US17842256

申请日：2022-06-16

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Meng-Han Lin ,  Chenchen Jacob Wang ,  Yi-Ching Liu ,  Han-Jong Chia ,  Sai-Hooi Yeong ,  Yu-Ming Lin ,  Yih Wang

IPC: G11C5/06 ,  H01L29/24 ,  H01L29/78 ,  H01L29/786 ,  H10B41/27 ,  H10B51/00 ,  H10B51/10 ,  H10B51/20

CPC classification number: G11C5/063 ,  H01L29/24 ,  H01L29/78391 ,  H01L29/7869 ,  H10B41/27 ,  H10B51/00 ,  H10B51/10 ,  H10B51/20

Abstract: Routing arrangements for 3D memory arrays and methods of forming the same are disclosed. In an embodiment, a memory array includes a ferroelectric (FE) material contacting a first word line; an oxide semiconductor (OS) layer contacting a source line and a bit line, the FE material being disposed between the OS layer and the first word line; a dielectric material contacting the FE material, the FE material being between the dielectric material and the first word line; an inter-metal dielectric (IMD) over the first word line; a first contact extending through the IMD to the first word line, the first contact being electrically coupled to the first word line; a second contact extending through the dielectric material and the FE material; and a first conductive line electrically coupling the first contact to the second contact.