METHOD OF FABRICATING A 3-D DEVICE
    4.
    发明申请
    METHOD OF FABRICATING A 3-D DEVICE 有权
    制作3-D器件的方法

    公开(公告)号:US20110171781A1

    公开(公告)日:2011-07-14

    申请号:US13070196

    申请日:2011-03-23

    IPC分类号: H01L21/78 H01L21/60

    摘要: A method of fabricating a semiconductor device includes providing a semiconductor substrate having an active surface, thinning the substrate by removing material from a second surface of the substrate opposite the active surface, bonding a metal carrier to the second surface of the thinned substrate, forming a via opening in the thinned substrate, forming a conductive member in the via opening, and patterning the metal carrier bonded to the second surface of the thinned substrate to form a metal pattern.

    摘要翻译: 一种制造半导体器件的方法包括提供具有活性表面的半导体衬底,通过从衬底的与活性表面相对的第二表面去除材料来稀释衬底,将金属载体接合到薄化衬底的第二表面上,形成 通过在所述薄化基板中的开口,在所述通孔开口中形成导电构件,并且图案化结合到所述薄化基板的第二表面的金属载体以形成金属图案。