SUPPORT DEVICE OF BEARING ANGLE FOR ARCHITECTURAL STONE
    2.
    发明申请
    SUPPORT DEVICE OF BEARING ANGLE FOR ARCHITECTURAL STONE 审中-公开
    用于建筑石材的轴承支撑装置

    公开(公告)号:US20120272609A1

    公开(公告)日:2012-11-01

    申请号:US13441716

    申请日:2012-04-06

    申请人: Jae Ok KIM

    发明人: Jae Ok KIM

    IPC分类号: E04B1/38 E04B2/30

    CPC分类号: E04F13/0857 E04F13/14

    摘要: A support device of a bearing angle for an architectural stone includes: a supporter having a screw hole formed at the center thereof and being movable along a spiral thread of an anchor bolt fixed to a wall body; and a cutting blade part being formed on the supporter and penetrating into an insulator by a rotational force generated by movement of the supporter so as to be supported in contact with the wall body.

    摘要翻译: 用于建筑石材的支承角的支撑装置包括:支撑件,其具有形成在其中心处的螺钉孔,并且可沿固定到壁体的锚定螺栓的螺旋线移动; 以及切割刀片部分,其形成在所述支撑件上并且通过由所述支撑件的运动产生的旋转力而穿透到所述绝缘体中,以被支撑为与所述壁体接触。

    Method for fabricating semiconductor device
    9.
    发明授权
    Method for fabricating semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US06800907B2

    公开(公告)日:2004-10-05

    申请号:US10330341

    申请日:2002-12-30

    IPC分类号: H01L2362

    摘要: The present invention provides a method for fabricating a semiconductor device capable of suppressing stresses concentrated at bottom corners of a gate electrode as simultaneously as preventing an oxidation of a metal included in a gate electrode. The inventive method includes the steps of: forming a gate oxide layer on a substrate; forming a gate electrode including at least one metal layer on the gate oxide layer; forming an oxide layer on the substrate including the gate electrode at a temperature lower than oxidation temperature of the metal layer; and etching selectively the densified oxide layer so as to form an oxide spacer on the lateral sides of the gate electrode.

    摘要翻译: 本发明提供一种制造半导体器件的方法,该半导体器件能够同时抑制栅电极中包含的金属的氧化同时抑制集中在栅电极的底角的应力。 本发明的方法包括以下步骤:在衬底上形成栅氧化层; 在所述栅极氧化物层上形成包括至少一个金属层的栅电极; 在比所述金属层的氧化温度低的温度下在包括所述栅电极的所述基板上形成氧化物层; 并选择性地蚀刻致密的氧化物层,以在栅电极的侧面上形成氧化物间隔物。