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    Regenerative cell extraction unit and regenerative cell extraction system
    1.
    发明授权
    Regenerative cell extraction unit and regenerative cell extraction system 有权
    再生细胞提取单元和再生细胞提取系统

    公开(公告)号：US09388377B2

    公开(公告)日：2016-07-12

    申请号：US13504586

    申请日：2010-10-25

    申请人： Byung-Rok Do ,  Jung-Kyu Lee ,  Ji-Hyang Kim ,  Sung-Guu Kang ,  Seung-Hoon Pak ,  Myung-Jin Kim ,  Kyu-Chul Shin ,  Chul-Geun Kim ,  Yung-Dal Yoon

    发明人： Byung-Rok Do ,  Jung-Kyu Lee ,  Ji-Hyang Kim ,  Sung-Guu Kang ,  Seung-Hoon Pak ,  Myung-Jin Kim ,  Kyu-Chul Shin ,  Chul-Geun Kim ,  Yung-Dal Yoon

    IPC分类号： B04B5/04 ,  C12M1/00

    CPC分类号： C12M47/04 ,  B04B5/0442 ,  B04B11/02 ,  C12M45/05

    摘要： Provided is a regenerative cell extraction system. The regenerative cell extraction system includes: a regenerative cell separation unit which separates fat tissue; and a regenerative cell extraction unit. The regenerative cell separation unit includes: a sub container which is rotated by a torque applied from an external source and includes a space in which fat tissue is housed; a hollow main pipe which is inserted into the sub container; and a pump which is connected to the main pipe. In addition, the regenerative cell extraction unit receives a regenerative cell-containing substance, which is obtained after the fat tissue is centrifuged by the regenerative cell separation unit, from the regenerative cell separation unit, and extracts regenerative cells from the substance by centrifuging the substance. The regenerative cell extraction unit includes: a main container which is rotated by a torque applied from an external source; a hollow first discharge pipe which is inserted into the main container; and a suction device which is connected to the first discharge pipe; and a plurality of protruding housing portions which bulge outwards along a radius direction with respect to a center of rotation of the main container to accommodate relatively heavy components among components separated from the substance.

    摘要翻译： 提供一种再生细胞提取系统。 再生细胞提取系统包括：再生细胞分离单元，其分离脂肪组织; 和再生细胞提取单元。 再生细胞分离单元包括：副容器，其由外部源施加的扭矩旋转，并且包括容纳脂肪组织的空间; 插入子容器中的中空主管; 以及与主管连接的泵。 此外，再生细胞提取单元接收在再生细胞分离单元将脂肪组织离心后获得的再生细胞含有物质从再生细胞分离单元接收，并通过离心物质从物质中提取再生细胞 。 再生细胞提取单元包括：通过从外部源施加的转矩旋转的主容器; 插入主容器的中空的第一排出管; 以及连接到第一排出管的抽吸装置; 以及多个突出的壳体部分，其相对于主容器的旋转中心沿径向向外凸出，以容纳与物质分离的部件中相对较重的部件。

    Methods of forming nitride dielectric layers having reduced exposure to oxygen
    2.
    发明授权
    Methods of forming nitride dielectric layers having reduced exposure to oxygen 失效
    形成具有减少的暴露于氧气的氮化物电介质层的方法

    公开(公告)号：US6159849A

    公开(公告)日：2000-12-12

    申请号：US21005

    申请日：1998-02-09

    申请人： Seong-hun Kang ,  Young-lark Koh ,  Jung-kyu Lee

    发明人： Seong-hun Kang ,  Young-lark Koh ,  Jung-kyu Lee

    IPC分类号： H01L27/04 ,  H01L21/02 ,  H01L21/318 ,  H01L21/822 ,  H01L21/8242 ,  H01L27/108 ,  H01L21/44

    CPC分类号： H01L28/40 ,  H01L21/3185 ,  H01L27/10852 ,  H01L28/84

    摘要： of A method of forming a dielectric layer includes the steps of forming an electrode on a microelectronic substrate, and forming depressions and protrusions on exposed portions of the electrode thereby increasing a surface area thereof. An exposed portion of the electrode including the depressions and protrusions is nitrified, and the electrode is not exposed to oxygen during and between the steps of forming the depressions and protrusions and nitrifying the exposed portion of the electrode. A nitride layer is then formed on a nitrified electrode. Related structures are also discussed.

    摘要翻译： 形成电介质层的方法包括以下步骤：在微电子衬底上形成电极，并且在电极的暴露部分上形成凹陷和突起，从而增加其表面积。 包括凹陷和突起的电极的暴露部分被硝化，并且在形成凹陷和突起的步骤期间和在形成凹陷和突起的步骤之间并且在电极的暴露部分硝化之后电极不暴露于氧气。 然后在硝化电极上形成氮化物层。 还讨论了相关结构。

    Dry etching method and apparatus for manufacturing a semiconductor device
    3.
    发明授权
    Dry etching method and apparatus for manufacturing a semiconductor device 失效
    干蚀刻方法和半导体器件的制造装置

    公开(公告)号：US5990016A

    公开(公告)日：1999-11-23

    申请号：US997382

    申请日：1997-12-23

    申请人： Byong-dong Kim ,  Jung-kyu Lee ,  Sung-il Kim

    发明人： Byong-dong Kim ,  Jung-kyu Lee ,  Sung-il Kim

    IPC分类号： H01L21/302 ,  H01L21/00 ,  H01L21/3065

    CPC分类号： H01L21/67069

    摘要： A dry etching method and apparatus improves the uniformity of etching a wafer in the manufacture of a semiconductor device. The dry etching apparatus has a susceptor supporting the wafer, a cooling system installed in the susceptor, an upper RF (radio frequency) electrode which may incorporate a gas diffuser for spraying reactive gas toward the wafer, and an RF power source for producing an electric field used to react the gas and generate plasma. The gap between the upper RF electrode and the susceptor is configured to accommodate for distortions in the wafer or other processing requirements. In addition, the nozzles of the gas diffuser can be configured to spray different amounts of gas to also enhance the etching uniformity. Finally, one of the electrodes may be divided into concentric sections. In this case, the RF power source can generate electric fields of different intensities at the sections. When the divided electrode is the susceptor, the cooling system cools the sections to different temperatures to in turn temperature-condition the wafer in a manner determined in advance to enhance the uniformity of the etching process.

    摘要翻译： 干蚀刻方法和装置提高了在制造半导体器件时蚀刻晶片的均匀性。 干式蚀刻装置具有：支承晶片的基座，安装在基座中的冷却系统，可以并入用于向晶片喷射反应性气体的气体扩散器的上部射频（射频）电极;以及用于产生电气的RF电源 用于反应气体并产生等离子体的场。 上RF电极和基座之间的间隙被配置为适应晶片中的失真或其它处理要求。 此外，气体扩散器的喷嘴可以被配置为喷射不同量的气体，以增强蚀刻均匀性。 最后，其中一个电极可以被分成同心的部分。 在这种情况下，RF电源可以在各部分产生不同强度的电场。 当分离的电极是基座时，冷却系统将部分冷却到不同的温度，从而以预先确定的方式温度调节晶片以增强蚀刻工艺的均匀性。

    Distributor employing controlled switching elements
    4.
    发明授权
    Distributor employing controlled switching elements 失效
    分配器采用受控开关元件

    公开(公告)号：US5648957A

    公开(公告)日：1997-07-15

    申请号：US388973

    申请日：1995-02-15

    申请人： Byoung ki Lee ,  Jung-kyu Lee

    发明人： Byoung ki Lee ,  Jung-kyu Lee

    IPC分类号： H04Q3/00 ,  H04L12/931 ,  H04L12/933 ,  H04L12/937 ,  H04Q3/52 ,  H04L12/56

    CPC分类号： H04L12/5601 ,  H04L49/1561 ,  H04L49/255 ,  H04L2012/5681

    摘要： A distributor with controlled switching elements (CSE) which simplifies hardware construction by distributing the function of a running adder into a reverse banyan network. The distributor comprises a CSE-based network using switching stages, each switching stage having control switching elements. A control signal input stage switches two packet input signal switching channels, each stage receiving each control signal from an output stage having switching elements. An active packet counter counts and generates an output signal which represents the number of active packets inputted to the CSE network. A tail-of-queue register is used for storing output vectors.

    摘要翻译： 具有受控开关元件（CSE）的分配器，其通过将运行中的加法器的功能分配到反向榕树网络来简化硬件构造。 分配器包括使用开关级的基于CSE的网络，每个开关级具有控制开关元件。 控制信号输入级切换两个分组输入信号切换通道，每个级从具有开关元件的输出级接收每个控制信号。 活动分组计数器计数并产生表示输入到CSE网络的活动分组的数量的输出信号。 队列尾寄存器用于存储输出向量。

    Display substrate and method of manufacturing the same
    6.
    发明授权
    Display substrate and method of manufacturing the same 有权
    显示基板及其制造方法

    公开(公告)号：US09025118B2

    公开(公告)日：2015-05-05

    申请号：US13619120

    申请日：2012-09-14

    申请人： Jung-Kyu Lee ,  Yoon-Ho Khang ,  Se-Hwan Yu ,  Cheol-Kyu Kim ,  Yong-Su Lee ,  Chong-Sup Chang ,  Sang-Ho Park ,  Su-Hyoung Kang ,  Hyun-Jae Na ,  Young-Ki Shin

    发明人： Jung-Kyu Lee ,  Yoon-Ho Khang ,  Se-Hwan Yu ,  Cheol-Kyu Kim ,  Yong-Su Lee ,  Chong-Sup Chang ,  Sang-Ho Park ,  Su-Hyoung Kang ,  Hyun-Jae Na ,  Young-Ki Shin

    IPC分类号： G02F1/136 ,  H01L27/12 ,  G02F1/1362

    CPC分类号： H01L27/124 ,  G02F1/136286 ,  G02F2001/13629 ,  H01L27/1288

    摘要： A display substrate includes a base substrate, a switching element, a gate line, a data line and a pixel electrode. Each of the gate line and the data line includes a first metal layer, and a second metal layer directly on the first metal layer. The switching element is on the base substrate, and includes a control electrode and an input electrode or an output electrode. The control electrode includes the first metal layer and excludes the second metal layer, and extends from the gate line. The input electrode or the output electrode includes a second metal layer and excludes the first metal layer. The input electrode extends from the data line. The pixel electrode is electrically connected to the output electrode of the switching element through a first contact hole, and includes a transparent conductive layer.

    摘要翻译： 显示基板包括基底基板，开关元件，栅极线，数据线和像素电极。 栅极线和数据线中的每一个包括第一金属层和直接在第一金属层上的第二金属层。 开关元件在基底基板上，并且包括控制电极和输入电极或输出电极。 控制电极包括第一金属层，并且不包括第二金属层，并且从栅极线延伸。 输入电极或输出电极包括第二金属层，并且不包括第一金属层。 输入电极从数据线延伸。 像素电极通过第一接触孔电连接到开关元件的输出电极，并且包括透明导电层。

    DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
    7.
    发明申请
    DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME 有权
    显示基板及其制造方法

    公开(公告)号：US20130105826A1

    公开(公告)日：2013-05-02

    申请号：US13619120

    申请日：2012-09-14

    申请人： Jung-Kyu Lee ,  Yoon-Ho Khang ,  Se-Hwan Yu ,  Cheol-Kyu Kim ,  Yong-Su Lee ,  Chong-Sup Chang ,  Sang-Ho Park ,  Su-Hyoung Kang ,  Hyun-Jae Na ,  Young-Ki Shin

    发明人： Jung-Kyu Lee ,  Yoon-Ho Khang ,  Se-Hwan Yu ,  Cheol-Kyu Kim ,  Yong-Su Lee ,  Chong-Sup Chang ,  Sang-Ho Park ,  Su-Hyoung Kang ,  Hyun-Jae Na ,  Young-Ki Shin

    IPC分类号： H01L33/08

    CPC分类号： H01L27/124 ,  G02F1/136286 ,  G02F2001/13629 ,  H01L27/1288

    摘要： A display substrate includes a base substrate, a switching element, a gate line, a data line and a pixel electrode. Each of the gate line and the data line includes a first metal layer, and a second metal layer directly on the first metal layer. The switching element is on the base substrate, and includes a control electrode and an input electrode or an output electrode. The control electrode includes the first metal layer and excludes the second metal layer, and extends from the gate line. The input electrode or the output electrode includes a second metal layer and excludes the first metal layer. The input electrode extends from the data line. The pixel electrode is electrically connected to the output electrode of the switching element through a first contact hole, and includes a transparent conductive layer.

    摘要翻译： 显示基板包括基底基板，开关元件，栅极线，数据线和像素电极。 栅极线和数据线中的每一个包括第一金属层和直接在第一金属层上的第二金属层。 开关元件在基底基板上，并且包括控制电极和输入电极或输出电极。 控制电极包括第一金属层，并且不包括第二金属层，并且从栅极线延伸。 输入电极或输出电极包括第二金属层，并且不包括第一金属层。 输入电极从数据线延伸。 像素电极通过第一接触孔电连接到开关元件的输出电极，并且包括透明导电层。

    Developing solution feed system for semiconductor photolithography process having a gas removal device in a high solution feed pressure pipe section
    8.
    发明授权
    Developing solution feed system for semiconductor photolithography process having a gas removal device in a high solution feed pressure pipe section 失效
    显影在高溶液进料压力管段中具有气体去除装置的半导体光刻工艺的溶液进料系统

    公开(公告)号：US5842075A

    公开(公告)日：1998-11-24

    申请号：US928529

    申请日：1997-09-12

    申请人： Sung-hyeon Park ,  Sung-il Kim ,  Jung-kyu Lee

    发明人： Sung-hyeon Park ,  Sung-il Kim ,  Jung-kyu Lee

    IPC分类号： G03F7/30 ,  H01L21/027 ,  G03D5/04 ,  B08B3/04

    CPC分类号： G03F7/3021 ,  Y10S134/902

    摘要： A developing solution feed system for a semiconductor photolithography process feeds the developing solution while removing any gas contained in the solution at a high solution feed pressure. The developing solution feed system has a plurality of feed tanks and a developing solution feed line having a plurality of first connecting pipes, each connected to the feed tanks, a second connecting pipe connected to the first connecting pipe to be converged into one passage, and a plurality of third connecting pipes branching out from the second connecting pipe. The system also contains nozzles connected to the third connecting pipes to thereby sputter the developing solution onto wafers each located in process chambers, a gas removal device installed in the one passage of the second connecting pipe to thereby remove gas contained in the developing solution, and shut off valves, each installed in the third connecting pipes to thereby open and close passages, so that the developing solution can selectively be fed into only one process chamber at a time through the third connecting pipes.

    摘要翻译： 用于半导体光刻工艺的显影溶液进料系统以高溶液进料压力除去溶液中所含的任何气体，同时进料显影溶液。 显影液供给系统具有多个进料罐和显影液供给管线，该供给罐具有多个第一连接管，每个第一连接管连接到进料罐，第二连接管连接到第一连接管以会聚在一个通道中，以及 从所述第二连接管分支出的多个第三连接管。 该系统还包括连接到第三连接管的喷嘴，从而将显影液溅射到位于处理室中的晶片上，气体去除装置安装在第二连接管的一个通道中，从而去除包含在显影溶液中的气体，以及 关闭阀，每个阀安装在第三连接管中，从而打开和关闭通道，使得显影溶液可以通过第三连接管一次选择性地进入一个处理室。

    WIRELESS LOCALIZATION METHOD BASED ON AN EFFICIENT MULTILATERATION ALGORITHM OVER A WIRELESS SENSOR NETWORK AND A RECORDING MEDIUM IN WHICH A PROGRAM FOR THE METHOD IS RECORDED
    9.
    发明申请
    WIRELESS LOCALIZATION METHOD BASED ON AN EFFICIENT MULTILATERATION ALGORITHM OVER A WIRELESS SENSOR NETWORK AND A RECORDING MEDIUM IN WHICH A PROGRAM FOR THE METHOD IS RECORDED 有权
    基于无线传感器网络的有效多路由算法的无线本地化方法和记录方法的程序的记录介质

    公开(公告)号：US20130045750A1

    公开(公告)日：2013-02-21

    申请号：US13337653

    申请日：2011-12-27

    申请人： Seong Cheol KIM ,  Jung Kyu LEE

    发明人： Seong Cheol KIM ,  Jung Kyu LEE

    IPC分类号： H04W64/00

    CPC分类号： G01S5/14 ,  G01S5/0289 ,  G01S11/06

    摘要： A wireless localization technology using efficient multilateration in a wireless sensor network is disclosed. After calculating estimated distances from each of at least three reference nodes to a blind node using received signal strength of wireless signals that the at least three reference nodes received from the blind node, the estimated location of the blind node is obtained through multilateration using the calculated estimated distances. To correct error in the estimated location, the estimated distances are used, and the error correction direction and error correction distance for the estimated location are calculated by applying a largest weight to the reference node closest to the estimated location. The error of the estimated location is corrected by move the estimated location of the blind node by the calculated error correction direction and error correction distance. Calculation for the error correction is very simple and fast.

    摘要翻译： 公开了一种在无线传感器网络中使用高效多边测量的无线定位技术。 在使用从盲节点接收到的至少三个参考节点的无线信号的接收信号强度来计算从至少三个参考节点中的每一个到盲节点的估计距离之后，通过使用计算出的 估计距离 为了校正估计位置的误差，使用估计的距离，并且通过对最靠近估计位置的参考节点应用最大权重来计算估计位置的误差校正方向和误差校正距离。 通过将计算的误差校正方向和误差校正距离移动盲节点的估计位置来校正估计位置的误差。 纠错的计算非常简单快捷。