FRONT LIGHT ILLUMINATION DEVICE AND REFLECTIVE DISPLAY DEVICE EMPLOYING THE SAME
    1.
    发明申请
    FRONT LIGHT ILLUMINATION DEVICE AND REFLECTIVE DISPLAY DEVICE EMPLOYING THE SAME 审中-公开
    前照灯装置和使用其的反射显示装置

    公开(公告)号:US20120230055A1

    公开(公告)日:2012-09-13

    申请号:US13270239

    申请日:2011-10-11

    CPC classification number: G02B6/0031 G02B6/0055

    Abstract: A display device includes a display layer and a light guide plate (LGP) arranged on the display layer. The LGP includes a first surface facing away from the display layer, an opposite second surface, and a lateral surface between the first and second surfaces, the lateral surface having a light incident portion. A light source and a scanning mirror are arranged on the lateral surface of the LGP. The light source configured to emit a light beam toward the scanning mirror, the scanning mirror being reciprocally rotatable about a rotating axis at a given frequency, the scanning mirror configured to reflect and direct the light beam from the light source to enter into the LGP through the light incident portion.

    Abstract translation: 显示装置包括布置在显示层上的显示层和导光板(LGP)。 LGP包括背离显示层的第一表面,相对的第二表面和在第一和第二表面之间的横向表面,该侧表面具有光入射部分。 光源和扫描镜布置在LGP的侧表面上。 所述光源被配置为朝向所述扫描镜发射光束,所述扫描镜可以以给定频率绕旋转轴线往复转动,所述扫描镜被配置为反射并引导来自所述光源的光束进入所述LGP, 光入射部分。

    METHOD OF FABRICATING METAL INTERCONNECTS AND INTER-METAL DIELECTRIC LAYER THEREOF
    6.
    发明申请
    METHOD OF FABRICATING METAL INTERCONNECTS AND INTER-METAL DIELECTRIC LAYER THEREOF 有权
    制造金属互连及其金属介电层的方法

    公开(公告)号:US20080146021A1

    公开(公告)日:2008-06-19

    申请号:US11684646

    申请日:2007-03-12

    CPC classification number: H01L21/76885

    Abstract: A method of fabricating metal interconnects and an inter-metal dielectric layer thereof. A first metal interconnect pattern and a second metal interconnect pattern disposed thereon are formed on a substrate by plating processes. Subsequently, an inter-metal dielectric layer is formed on the substrate, the first metal interconnect pattern and the second metal interconnect pattern. The inter-metal dielectric layer is then planarized and the second metal interconnect pattern is exposed.

    Abstract translation: 一种制造金属互连的方法及其金属间介电层。 通过电镀工艺在衬底上形成设置在其上的第一金属互连图案和第二金属互连图案。 随后,在衬底,第一金属互连图案和第二金属互连图案上形成金属间介电层。 然后将金属间介电层平坦化,并暴露第二金属互连图案。

    Method of fabricating metal interconnects and inter-metal dielectric layer thereof
    9.
    发明授权
    Method of fabricating metal interconnects and inter-metal dielectric layer thereof 有权
    制造金属互连及其金属间介电层的方法

    公开(公告)号:US07795131B2

    公开(公告)日:2010-09-14

    申请号:US11684646

    申请日:2007-03-12

    CPC classification number: H01L21/76885

    Abstract: A method of fabricating metal interconnects and an inter-metal dielectric layer thereof. A first metal interconnect pattern and a second metal interconnect pattern disposed thereon are formed on a substrate by plating processes. Subsequently, an inter-metal dielectric layer is formed on the substrate, the first metal interconnect pattern and the second metal interconnect pattern. The inter-metal dielectric layer is then planarized and the second metal interconnect pattern is exposed.

    Abstract translation: 一种制造金属互连的方法及其金属间介电层。 通过电镀工艺在衬底上形成设置在其上的第一金属互连图案和第二金属互连图案。 随后,在衬底,第一金属互连图案和第二金属互连图案上形成金属间介电层。 然后将金属间介电层平坦化,并暴露第二金属互连图案。

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