公开(公告)号：US20130071751A1

公开(公告)日：2013-03-21

申请号：US13613013

申请日：2012-09-13

申请人： Ryota TAJIMA ,  Takeshi OSADA

发明人： Ryota TAJIMA ,  Takeshi OSADA

IPC分类号： H01M4/66 ,  H01M4/583

CPC分类号： H01M4/134 ,  H01G11/26 ,  H01G11/36 ,  H01G11/70 ,  H01M4/366 ,  H01M4/587 ,  H01M4/624 ,  H01M4/625 ,  H01M4/667 ,  H01M4/70 ,  H01M10/052 ,  H01M2004/025 ,  Y02E60/13 ,  Y02T10/7022

摘要： A power storage device in which charge capacity and discharge capacity are high and deterioration in battery characteristics due to charge/discharge is small is provided. A power storage device in which charge capacity and discharge capacity are high and output characteristics are excellent is provided. A power storage device in which charge capacity and discharge capacity are high and cycle characteristics are excellent is provided. A power storage device includes a negative electrode. The negative electrode includes a current collector, an active material including a plurality of protrusions protruding from the current collector and an outer shell in contact with and attached to surfaces of the plurality of protrusions, and graphene in contact with and attached to the outer shell. Axes of the plurality of protrusions are oriented in the same direction. A common portion may be provided between the current collector and the plurality of protrusions.

摘要翻译： 提供了充电容量和放电容量高的充电装置，并且由于充电/放电而导致的电池特性的劣化小。 提供了充电容量和放电容量高，输出特性优异的蓄电装置。 提供了充电容量和放电容量高，循环特性优异的蓄电装置。 蓄电装置包括负极。 负极包括集电体，包括从集电体突出的多个突起的活性材料和与多个突起的表面接触并连接到多个突起的表面的外壳，以及与外壳接触并附接到外壳的石墨烯。 多个突起的轴线朝向相同的方向。 在集电体和多个突起之间可以设置公共部分。

公开(公告)号：US20120304932A1

公开(公告)日：2012-12-06

申请号：US13550776

申请日：2012-07-17

申请人： Satoshi Toriumi ,  Ryota Tajima ,  Takashi Ohtsuki ,  Tetsuhiro Tanaka ,  Ryo Tokumaru ,  Mitsuhiro Ichijo ,  Kazutaka Kuriki ,  Tomokazu Yokoi ,  Toshiya Endo ,  Shunpei Yamazaki

发明人： Satoshi Toriumi ,  Ryota Tajima ,  Takashi Ohtsuki ,  Tetsuhiro Tanaka ,  Ryo Tokumaru ,  Mitsuhiro Ichijo ,  Kazutaka Kuriki ,  Tomokazu Yokoi ,  Toshiya Endo ,  Shunpei Yamazaki

IPC分类号： C23C16/448

CPC分类号： H01J37/32541 ,  C23C16/24 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/5096 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32834 ,  H01L21/0262 ,  H01L29/66765 ,  H01L29/78696

摘要： An object of the present invention is to provide a technique for manufacturing a dense crystalline semiconductor film without a cavity between crystal grains. A plasma region is formed between a first electrode and a second electrode by supplying high-frequency power of 60 MHz or less to the first electrode under a condition where a pressure of a reactive gas in a reaction chamber of a plasma CVD apparatus is set to 450 Pa to 13332 Pa, and a distance between the first electrode and the second electrode of the plasma CVD apparatus is set to 1 mm to 20 mm; crystalline deposition precursors are formed in a gas phase including the plasma region; a crystal nucleus of 5 nm to 15 nm is formed by depositing the deposition precursors; and a microcrystalline semiconductor film is formed by growing a crystal from the crystal nucleus.

摘要翻译： 本发明的目的是提供一种在晶粒之间没有空腔的致密结晶半导体膜的制造技术。 在等离子体CVD装置的反应室中的反应气体的压力设定为：将第一电极和第二电极的反应气体的压力设定为第一电极的状态下，向第一电极供给60MHz以下的高频电力，在第一电极与第二电极之间形成等离子体区域 450Pa〜13332Pa，等离子体CVD装置的第一电极和第二电极之间的距离设定为1mm〜20mm; 在包括等离子体区域的气相中形成结晶沉积前体; 通过沉积沉积前体形成5nm至15nm的晶核; 并且通过从晶核生长晶体形成微晶半导体膜。

公开(公告)号：US08252669B2

公开(公告)日：2012-08-28

申请号：US12860175

申请日：2010-08-20

申请人： Satoshi Toriumi ,  Ryota Tajima ,  Takashi Ohtsuki ,  Tetsuhiro Tanaka ,  Ryo Tokumaru ,  Mitsuhiro Ichijo ,  Kazutaka Kuriki ,  Tomokazu Yokoi ,  Toshiya Endo ,  Shunpei Yamazaki

发明人： Satoshi Toriumi ,  Ryota Tajima ,  Takashi Ohtsuki ,  Tetsuhiro Tanaka ,  Ryo Tokumaru ,  Mitsuhiro Ichijo ,  Kazutaka Kuriki ,  Tomokazu Yokoi ,  Toshiya Endo ,  Shunpei Yamazaki

IPC分类号： H01L21/20 ,  H01L21/36

CPC分类号： H01J37/32541 ,  C23C16/24 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/5096 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32834 ,  H01L21/0262 ,  H01L29/66765 ,  H01L29/78696

摘要： An object of one embodiment of the present invention is to provide a technique for manufacturing a dense crystalline semiconductor film (e.g., a microcrystalline semiconductor film) without a cavity between crystal grains. A plasma region is formed between a first electrode and a second electrode by supplying high-frequency power of 60 MHz or less to the first electrode under a condition where a pressure of a reactive gas in a reaction chamber of a plasma CVD apparatus is set to 450 Pa to 13332 Pa, and a distance between the first electrode and the second electrode of the plasma CVD apparatus is set to 1 mm to 20 mm; crystalline deposition precursors are formed in a gas phase including the plasma region; a crystal nucleus of 5 nm to 15 nm is formed by depositing the deposition precursors; and a microcrystalline semiconductor film is formed by growing a crystal from the crystal nucleus.

摘要翻译： 本发明的一个实施例的目的是提供一种在晶粒之间没有空腔的致密结晶半导体膜（例如，微晶半导体膜）的制造技术。 在等离子体CVD装置的反应室中的反应气体的压力设定为：将第一电极和第二电极的反应气体的压力设定为第一电极的状态下，向第一电极供给60MHz以下的高频电力，在第一电极与第二电极之间形成等离子体区域 450Pa〜13332Pa，等离子体CVD装置的第一电极和第二电极之间的距离设定为1mm〜20mm; 在包括等离子体区域的气相中形成结晶沉积前体; 通过沉积沉积前体形成5nm至15nm的晶核; 并且通过从晶核生长晶体形成微晶半导体膜。

公开(公告)号：US20120208360A1

公开(公告)日：2012-08-16

申请号：US13368379

申请日：2012-02-08

申请人： Tetsuhiro TANAKA ,  Ryo TOKUMARU ,  Takashi OHTSUKI ,  Ryota TAJIMA ,  Erika KATO

发明人： Tetsuhiro TANAKA ,  Ryo TOKUMARU ,  Takashi OHTSUKI ,  Ryota TAJIMA ,  Erika KATO

IPC分类号： H01L21/336 ,  H01L21/3065

CPC分类号： H01L29/66765 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/0262 ,  H01L29/04 ,  H01L29/78648 ,  H01L29/78696

摘要： A microcrystalline semiconductor film is formed over a substrate using a plasma CVD apparatus which includes a reaction chamber in such a manner that a deposition gas and hydrogen are supplied to the reaction chamber in which the substrate is set between a first electrode and a second electrode; and plasma is generated in the reaction chamber by supplying high-frequency power to the first electrode. Note that the plasma density in a region overlapping with an end portion of the substrate in a region where the plasma is generated is set to be higher than that in a region which is positioned more on the inside than the region overlapping with the end portion of the substrate, so that the microcrystalline semiconductor film is formed over a region which is positioned more on the inside than the end portion of the substrate.

摘要翻译： 使用等离子体CVD装置在基板上形成微晶半导体膜，所述等离子体CVD装置包括反应室，使得将沉积气体和氢气供应到反应室中，其中基板设置在第一电极和第二电极之间; 并且通过向第一电极提供高频电力而在反应室中产生等离子体。 注意，在等离子体产生的区域中与衬底的端部重叠的区域中的等离子体密度设定为高于在位于更内侧的区域中的等离子体密度 使得微结晶半导体膜形成在位于比衬底的端部更靠内侧的区域上。

公开(公告)号：US09401247B2

公开(公告)日：2016-07-26

申请号：US13613874

申请日：2012-09-13

申请人： Ryota Tajima ,  Shunpei Yamazaki ,  Hideomi Suzawa ,  Takeshi Osada

发明人： Ryota Tajima ,  Shunpei Yamazaki ,  Hideomi Suzawa ,  Takeshi Osada

IPC分类号： H01M4/02 ,  H01M4/13 ,  H01G11/30 ,  B82Y30/00 ,  H01M4/62 ,  H01M4/134 ,  H01M4/38 ,  H01G11/26 ,  H01G11/66 ,  H01M10/0525

CPC分类号： H01G11/30 ,  B82Y30/00 ,  H01G11/26 ,  H01G11/66 ,  H01M4/13 ,  H01M4/134 ,  H01M4/386 ,  H01M4/62 ,  H01M4/625 ,  H01M10/0525 ,  Y02E60/122 ,  Y02E60/13 ,  Y02P70/54 ,  Y02T10/7011 ,  Y02T10/7022

摘要： Provided is a negative electrode for a power storage device in which charge/discharge capacity is high and deterioration in battery characteristics due to charge/discharge is small. The negative electrode for a power storage device includes a negative electrode active material having a plurality of protrusions and a bar which serves as a connecting bridge over a first protrusion and a second protrusion among the plurality of protrusions. The bar is provided in a direction perpendicular to a direction in which a current collector is bent. An axis of the first protrusion and an axis of the second protrusion are oriented in the same direction. Further, a graphene covering a side surface of the protrusion or covering the side surface of the protrusion and a top surface of the bar may be provided.

摘要翻译： 提供了一种蓄电装置的负极，其充放电容量高，充放电引起的电池特性的劣化小。 蓄电装置用负极包括具有多个突起的负极活性物质和作为多个突起之间的第一突起和第二突起的连接桥的棒。 该杆沿垂直于集电体弯曲方向的方向设置。 第一突起的轴线和第二突起的轴线朝向相同的方向。 此外，可以提供覆盖突起的侧表面或覆盖突起的侧表面和条的顶表面的石墨烯。

公开(公告)号：US08663841B2

公开(公告)日：2014-03-04

申请号：US13613013

申请日：2012-09-13

申请人： Ryota Tajima ,  Takeshi Osada

发明人： Ryota Tajima ,  Takeshi Osada

IPC分类号： H01M4/36 ,  H01M4/66

CPC分类号： H01M4/134 ,  H01G11/26 ,  H01G11/36 ,  H01G11/70 ,  H01M4/366 ,  H01M4/587 ,  H01M4/624 ,  H01M4/625 ,  H01M4/667 ,  H01M4/70 ,  H01M10/052 ,  H01M2004/025 ,  Y02E60/13 ,  Y02T10/7022

摘要： A power storage device in which charge capacity and discharge capacity are high and deterioration in battery characteristics due to charge/discharge is small is provided. A power storage device in which charge capacity and discharge capacity are high and output characteristics are excellent is provided. A power storage device in which charge capacity and discharge capacity are high and cycle characteristics are excellent is provided. A power storage device includes a negative electrode. The negative electrode includes a current collector, an active material including a plurality of protrusions protruding from the current collector and an outer shell in contact with and attached to surfaces of the plurality of protrusions, and graphene in contact with and attached to the outer shell. Axes of the plurality of protrusions are oriented in the same direction. A common portion may be provided between the current collector and the plurality of protrusions.

摘要翻译： 提供了充电容量和放电容量高的充电装置，并且由于充电/放电而导致的电池特性的劣化小。 提供了充电容量和放电容量高，输出特性优异的蓄电装置。 提供了充电容量和放电容量高，循环特性优异的蓄电装置。 蓄电装置包括负极。 负极包括集电体，包括从集电体突出的多个突起的活性材料和与多个突起的表面接触并连接到多个突起的表面的外壳，以及与外壳接触并附接到外壳的石墨烯。 多个突起的轴线朝向相同的方向。 在集电体和多个突起之间可以设置公共部分。

公开(公告)号：US20130071762A1

公开(公告)日：2013-03-21

申请号：US13610951

申请日：2012-09-12

申请人： Ryota TAJIMA ,  Shunpei Yamazaki ,  Teppei Oguni ,  Takeshi Osada ,  Shinya Sasagawa ,  Kazutaka Kuriki

发明人： Ryota TAJIMA ,  Shunpei Yamazaki ,  Teppei Oguni ,  Takeshi Osada ,  Shinya Sasagawa ,  Kazutaka Kuriki

IPC分类号： H01M4/583 ,  H01M8/22 ,  H01M4/64 ,  B82Y99/00 ,  B82Y30/00

CPC分类号： H01M4/133 ,  B82Y30/00 ,  H01M4/134 ,  H01M4/1395 ,  H01M4/366 ,  H01M4/386 ,  H01M4/625 ,  H01M10/0525 ,  H01M10/465 ,  Y02E60/122 ,  Y02T10/7011

摘要： A power storage device which has high charge/discharge capacity and less deterioration in battery characteristics due to charge/discharge and can perform charge/discharge at high speed is provided. A power storage device includes a negative electrode. The negative electrode includes a current collector and an active material layer provided over the current collector. The active material layer includes a plurality of protrusions protruding from the current collector and a graphene provided over the plurality of protrusions. Axes of the plurality of protrusions are oriented in the same direction. A common portion may be provided between the current collector and the plurality of protrusions.

公开(公告)号：US08247315B2

公开(公告)日：2012-08-21

申请号：US12400844

申请日：2009-03-10

申请人： Makoto Furuno ,  Tetsuo Sugiyama ,  Taichi Nozawa ,  Mitsuhiro Ichijo ,  Ryota Tajima ,  Shunpei Yamazaki

发明人： Makoto Furuno ,  Tetsuo Sugiyama ,  Taichi Nozawa ,  Mitsuhiro Ichijo ,  Ryota Tajima ,  Shunpei Yamazaki

IPC分类号： H01L21/20

CPC分类号： H01L27/127 ,  C23C16/24 ,  C23C16/509 ,  H01L21/67207 ,  H01L27/1214 ,  H01L27/1288 ,  H01L29/04 ,  H01L29/78669 ,  H01L29/78678 ,  H01L29/78696

摘要： By an evacuation unit including first and second turbo molecular pumps connected in series, the ultimate pressure in a reaction chamber is reduced to ultra-high vacuum. By a knife-edge-type metal-seal flange, the amount of leakage in the reaction chamber is reduced. A microcrystalline semiconductor film and an amorphous semiconductor film are stacked in the same reaction chamber where the pressure is reduced to ultra-high vacuum. By forming the amorphous semiconductor film covering the surface of the microcrystalline semiconductor film, oxidation of the microcrystalline semiconductor film is prevented.

摘要翻译： 通过包括串联连接的第一和第二涡轮分子泵的抽空单元，将反应室中的极限压力降低到超高真空。 通过刀刃式金属密封法兰，反应室中的泄漏量减少。 将微晶半导体膜和非晶半导体膜堆叠在相同的反应室中，其中压力降低至超高真空。 通过形成覆盖微晶半导体膜的表面的非晶半导体膜，可以防止微晶半导体膜的氧化。

公开(公告)号：US20120187408A1

公开(公告)日：2012-07-26

申请号：US13355340

申请日：2012-01-20

申请人： Tetsuhiro TANAKA ,  Takashi Ienaga ,  Ryu Komatsu ,  Erika Kato ,  Ryota Tajima ,  Yasuhiro Jinbo

发明人： Tetsuhiro TANAKA ,  Takashi Ienaga ,  Ryu Komatsu ,  Erika Kato ,  Ryota Tajima ,  Yasuhiro Jinbo

IPC分类号： H01L29/04 ,  H01L21/20 ,  H01L21/336

CPC分类号： H01L29/78696 ,  H01L21/02422 ,  H01L21/0245 ,  H01L21/02502 ,  H01L21/02513 ,  H01L21/02532 ,  H01L21/02595 ,  H01L21/02598 ,  H01L21/0262 ,  H01L29/04 ,  H01L29/66765 ,  H01L29/78648 ,  H01L29/78654 ,  H01L29/78678

摘要： An embodiment of the present invention is a microcrystalline semiconductor film having a thickness of more than or equal to 70 nm and less than or equal to 100 nm and including a crystal grain partly projecting from a surface of the microcrystalline semiconductor film. The crystal grain has an orientation plane and includes a crystallite having a size of 13 nm or more. Further, the film density of the microcrystalline semiconductor film is higher than or equal to 2.25 g/cm3 and lower than or equal to 2.35 g/cm3, preferably higher than or equal to 2.30 g/cm and lower than or equal to 2.33 g/cm3.

摘要翻译： 本发明的一个实施方案是具有大于或等于70nm且小于或等于100nm的厚度的微晶半导体膜，并且包括从微晶半导体膜的表面部分地突出的晶粒。 晶粒具有取向平面，并且包括尺寸为13nm以上的微晶。 此外，微晶半导体膜的膜密度高于或等于2.25g / cm 3，低于或等于2.35g / cm 3，优选高于或等于2.30g / cm 2且低于或等于2.33g / cm3。

公开(公告)号：US20120021570A1

公开(公告)日：2012-01-26

申请号：US13184589

申请日：2011-07-18

申请人： Ryota TAJIMA ,  Tetsuhiro TANAKA ,  Takashi OHTSUKI ,  Ryo TOKUMARU ,  Yuji EGI ,  Erika KATO ,  Miyako MORIKUBO

发明人： Ryota TAJIMA ,  Tetsuhiro TANAKA ,  Takashi OHTSUKI ,  Ryo TOKUMARU ,  Yuji EGI ,  Erika KATO ,  Miyako MORIKUBO

IPC分类号： H01L21/336 ,  H01L21/20

CPC分类号： H01L29/78696 ,  C30B25/105 ,  C30B25/183 ,  C30B29/06 ,  C30B29/08 ,  H01L29/04 ,  H01L29/78618 ,  H01L29/78648

摘要： A seed crystal including mixed phase grains having high crystallinity with a low grain density is formed under a first condition, and a microcrystalline semiconductor film is formed over the seed crystal under a second condition which allows the mixed phase grains in the seed crystal to grow to fill a space between the mixed phase grains. In the first condition, the flow rate of hydrogen is 50 times or greater and 1000 times or less that of a deposition gas containing silicon or germanium, and the pressure in a process chamber is greater than 1333 Pa and 13332 Pa or less. In the second condition, the flow rate of hydrogen is 100 times or greater and 2000 times or less that of a deposition gas containing silicon or germanium, and the pressure in the process chamber is 1333 Pa or greater and 13332 Pa or less.

摘要翻译： 在第一条件下形成包括具有低晶粒密度的高结晶度的混合相晶粒的晶种，并且在第二条件下在晶种上形成微晶半导体膜，所述第二条件允许晶种中的混晶相生长至 填充混合晶粒之间的空间。 在第一条件下，氢气的流量为含有硅或锗的沉积气体的50倍以上且1000倍以下，处理室中的压力大于1333Pa，13332Pa以下。 在第二条件下，氢气的流量为含有硅或锗的沉积气体的100倍以上且2000倍以下，处理室内的压力为1333Pa以上且13332Pa以下。