Semiconductor component having a space saving edge structure
    3.
    发明授权
    Semiconductor component having a space saving edge structure 有权
    半导体元件具有节省空间的边缘结构

    公开(公告)号:US08080858B2

    公开(公告)日:2011-12-20

    申请号:US11833328

    申请日:2007-08-03

    摘要: A Semiconductor component having a space saving edge structure is disclosed. One embodiment provides a first side, a second side, an inner region, an edge region adjoining the inner region in a lateral direction of the semiconductor body, and a first semiconductor layer extending across the inner region and the edge region and having a basic doping of a first conductivity type. At least one active component zone of a second conductivity type, which is complementary to the first conductivity type, is disposed in the inner region in the first semiconductor layer. An edge structure is disposed in the edge region and includes at least one trench extending from the first side into the semiconductor body. An edge electrode is disposed in the trench, a dielectric layer is disposed in the trench between the edge electrode and the semiconductor body, a first edge zone of the second conductivity type adjoin the trench and are at least partially disposed below the trench.

    摘要翻译: 公开了具有节省空间的边缘结构的半导体部件。 一个实施例提供了第一侧面,第二侧面,内部区域,与半导体主体的横向方向上的内部区域相邻的边缘区域以及跨越内部区域和边缘区域延伸并具有基本掺杂的第一半导体层 的第一导电类型。 与第一导电类型互补的至少一个第二导电类型的活性组分区域设置在第一半导体层的内部区域中。 边缘结构设置在边缘区域中并且包括从第一侧延伸到半导体本体中的至少一个沟槽。 边缘电极设置在沟槽中,电介质层设置在边缘电极和半导体本体之间的沟槽中,第二导电类型的第一边缘区域与沟槽相邻并且至少部分地设置在沟槽下方。

    SEMICONDUCTOR COMPONENT HAVING A SPACE SAVING EDGE STRUCTURE
    4.
    发明申请
    SEMICONDUCTOR COMPONENT HAVING A SPACE SAVING EDGE STRUCTURE 有权
    具有节省边缘结构空间的半导体元件

    公开(公告)号:US20080042172A1

    公开(公告)日:2008-02-21

    申请号:US11833328

    申请日:2007-08-03

    IPC分类号: H01L29/76 H01L29/06

    摘要: A Semiconductor component having a space saving edge structure is disclosed. One embodiment provides a first side, a second side, an inner region, an edge region adjoining the inner region in a lateral direction of the semiconductor body, and a first semiconductor layer extending across the inner region and the edge region and having a basic doping of a first conductivity type. At least one active component zone of a second conductivity type, which is complementary to the first conductivity type, is disposed in the inner region in the first semiconductor layer. An edge structure is disposed in the edge region and includes at least one trench extending from the first side into the semiconductor body. An edge electrode is disposed in the trench, a dielectric layer is disposed in the trench between the edge electrode and the semiconductor body, a first edge zone of the second conductivity type adjoin the trench and are at least partially disposed below the trench.

    摘要翻译: 公开了具有节省空间的边缘结构的半导体部件。 一个实施例提供了第一侧面,第二侧面,内部区域,与半导体主体的横向方向上的内部区域相邻的边缘区域以及跨越内部区域和边缘区域延伸并具有基本掺杂的第一半导体层 的第一导电类型。 与第一导电类型互补的至少一个第二导电类型的活性组分区域设置在第一半导体层的内部区域中。 边缘结构设置在边缘区域中并且包括从第一侧延伸到半导体本体中的至少一个沟槽。 边缘电极设置在沟槽中,电介质层设置在边缘电极和半导体本体之间的沟槽中,第二导电类型的第一边缘区域与沟槽相邻并且至少部分地设置在沟槽下方。