Method and system for internal layer-layer thermal enhancement
    4.
    发明授权
    Method and system for internal layer-layer thermal enhancement 有权
    内层热增强方法和系统

    公开(公告)号:US08367478B2

    公开(公告)日:2013-02-05

    申请号:US13151672

    申请日:2011-06-02

    摘要: The exemplary embodiments of the present invention provide a method and apparatus for enhancing the cooling of a chip stack of semiconductor chips. The method includes creating a first chip with circuitry on a first side and creating a second chip electrically and mechanically coupled to the first chip by a grid of connectors. The method further includes creating a cavity in a second side of the first chip between the connectors and filling the cavity with a thermal material. The chip stack of semiconductor chips with enhanced cooling apparatus includes a first chip with circuitry on a first side and a second chip electrically and mechanically coupled to the first chip by a grid of connectors. The apparatus further includes wherein portions of a second side of the first chip between the connectors is removed to provide a cavity in which a thermal material is placed.

    摘要翻译: 本发明的示例性实施例提供了一种用于增强半导体芯片的芯片堆叠的冷却的方法和装置。 该方法包括在第一侧上创建具有电路的第一芯片,并通过连接器网格将第二芯片电连接并机械耦合到第一芯片。 该方法还包括在连接器之间的第一芯片的第二侧中形成空腔,并用热材料填充空腔。 具有增强的冷却装置的半导体芯片的芯片堆叠包括具有第一侧上的电路的第一芯片和通过连接器格栅电和机械地耦合到第一芯片的第二芯片。 该装置还包括:其中,连接器之间的第一芯片的第二侧的部分被去除以提供放置热材料的空腔。

    Implementing Semiconductor Signal-Capable Capacitors with Deep Trench and TSV Technologies
    7.
    发明申请
    Implementing Semiconductor Signal-Capable Capacitors with Deep Trench and TSV Technologies 失效
    采用深沟槽和TSV技术实现半导体信号电容

    公开(公告)号:US20130277798A1

    公开(公告)日:2013-10-24

    申请号:US13449480

    申请日:2012-04-18

    IPC分类号: H01L29/02 H01L21/02

    CPC分类号: H01L29/945 H01L29/66181

    摘要: A method and structures are provided for implementing semiconductor signal-capable capacitors with deep trench and Through-Silicon-Via (TSV) technologies. A deep trench N-well structure is formed and an implant is provided in the deep trench N-well structure with a TSV formed in a semiconductor chip. At least one angled implant is created around the TSV in a semiconductor chip. The TSV is surrounded with a dielectric layer and filled with a conducting material which forms one electrode of the capacitor. A connection is made to one implant forming a second electrode to the capacitor.

    摘要翻译: 提供了一种用于实现具有深沟槽和透硅(Via-Silicon-Via,TSV)技术的具有半导体信号能力的电容器的方法和结构。 形成深沟槽N阱结构,并且在深沟槽N阱结构中提供植入物,其中TSV形成在半导体芯片中。 在半导体芯片中的TSV周围形成至少一个成角度的植入物。 TSV被介电层包围并填充有形成电容器的一个电极的导电材料。 连接到形成到电容器的第二电极的一个注入件。

    HYBRID BONDING TECHNIQUES FOR MULTI-LAYER SEMICONDUCTOR STACKS
    9.
    发明申请
    HYBRID BONDING TECHNIQUES FOR MULTI-LAYER SEMICONDUCTOR STACKS 审中-公开
    用于多层半导体堆叠的混合粘结技术

    公开(公告)号:US20130011968A1

    公开(公告)日:2013-01-10

    申请号:US13618656

    申请日:2012-09-14

    IPC分类号: H01L21/50

    摘要: A circuit arrangement and method utilize hybrid bonding techniques that combine wafer-wafer bonding processes with chip-chip and/or chip-wafer bonding processes to form a multi-layer semiconductor stack, e.g., by bonding together one or more sub-assemblies formed by wafer-wafer bonding together with other sub-assemblies and/or chips using chip-chip and/or chip-wafer bonding processes. By doing so, the advantages of wafer-wafer bonding techniques, such as higher interconnect densities, may be leveraged with the advantages of chip-chip and chip-wafer bonding techniques, such as mixing and matching chips with different sizes, aspect ratios, and functions.

    摘要翻译: 电路布置和方法利用混合键合技术,其将晶片 - 晶片接合工艺与芯片芯片和/或晶片 - 晶片接合工艺组合以形成多层半导体堆叠,例如通过将由一个或多个子组件 使用芯片芯片和/或芯片 - 晶片接合工艺与其它子组件和/或芯片一起进行晶片 - 晶片接合。 通过这样做,可以利用芯片芯片和芯片 - 晶片结合技术的优点来利用诸如更高互连密度的晶片 - 晶片接合技术的优点,例如混合和匹配具有不同尺寸,长宽比的芯片和 功能。