-
公开(公告)号:US08471358B2
公开(公告)日:2013-06-25
申请号:US12791705
申请日:2010-06-01
申请人: Hsiao-Tsung Yen , Chin-Wei Kuo , Hsien-Pin Hu , Sally Liu , Ming-Fa Chen , Jhe-Ching Lu
发明人: Hsiao-Tsung Yen , Chin-Wei Kuo , Hsien-Pin Hu , Sally Liu , Ming-Fa Chen , Jhe-Ching Lu
IPC分类号: H01L27/08
CPC分类号: H01L23/5227 , H01F17/0013 , H01F27/2804 , H01L23/49822 , H01L2224/16225 , H01L2224/16227 , H01L2924/00014 , H01L2924/01322 , H01L2924/15311 , H01L2924/15321 , H01L2924/00 , H01L2224/0401
摘要: In accordance with an embodiment, a semiconductor device comprises a semiconductor die, an interposer, and conductive bumps bonding the semiconductor die to the interposer. The semiconductor die comprises a first metallization layer, and the first metallization layer comprises a first conductive pattern. The interposer comprises a second metallization layer, and the second metallization layer comprises a second conductive pattern. Some of the conductive bumps electrically couple the first conductive pattern to the second conductive pattern to form a coil. Other embodiments contemplate other configurations of coils, inductors, and/or transformers, and contemplate methods of manufacture.
摘要翻译: 根据实施例,半导体器件包括半导体管芯,插入件和将半导体管芯接合到插入件的导电凸块。 半导体管芯包括第一金属化层,第一金属化层包括第一导电图案。 插入器包括第二金属化层,并且第二金属化层包括第二导电图案。 一些导电凸块将第一导电图案电耦合到第二导电图案以形成线圈。 其他实施例考虑了线圈,电感器和/或变压器的其他配置,并考虑了制造方法。
-
公开(公告)号:US08362591B2
公开(公告)日:2013-01-29
申请号:US12795734
申请日:2010-06-08
申请人: Hsiao-Tsung Yen , Hsien-Pin Hu , Jhe-Ching Lu , Chin-Wei Kuo , Ming-Fa Chen , Sally Liu
发明人: Hsiao-Tsung Yen , Hsien-Pin Hu , Jhe-Ching Lu , Chin-Wei Kuo , Ming-Fa Chen , Sally Liu
IPC分类号: H01L29/93
CPC分类号: H01L27/016 , H01L29/93
摘要: A three-dimensional integrated circuit includes a semiconductor substrate where the substrate has an opening extending through a first surface and a second surface of the substrate and where the first surface and the second surface are opposite surfaces of the substrate. A conductive material substantially fills the opening of the substrate to form a conductive through-substrate-via (TSV). An active circuit is disposed on the first surface of the substrate, an inductor is disposed on the second surface of the substrate and the TSV is electrically coupled to the active circuit and the inductor. The three-dimensional integrated circuit may include a varactor formed from a dielectric layer formed in the opening of the substrate such that the conductive material is disposed adjacent the dielectric layer and an impurity implanted region disposed surrounding the TSV such that the dielectric layer is formed between the impurity implanted region and the TSV.
摘要翻译: 三维集成电路包括半导体衬底,其中衬底具有延伸穿过衬底的第一表面和第二表面的开口,并且其中第一表面和第二表面是与衬底相对的表面。 导电材料基本上填充衬底的开口以形成导电的通过衬底通孔(TSV)。 有源电路设置在衬底的第一表面上,电感器设置在衬底的第二表面上,并且TSV电耦合到有源电路和电感器。 三维集成电路可以包括由形成在基板的开口中的电介质层形成的变容二极管,使得导电材料邻近介电层设置,以及设置在TSV周围的杂质注入区域,使得介电层形成在 杂质注入区和TSV。
-
公开(公告)号:US08502338B2
公开(公告)日:2013-08-06
申请号:US12878803
申请日:2010-09-09
申请人: Hsiao-Tsung Yen , Hsien-Pin Hu , Chin-Wei Kuo , Sally Liu
发明人: Hsiao-Tsung Yen , Hsien-Pin Hu , Chin-Wei Kuo , Sally Liu
IPC分类号: H01L29/00
CPC分类号: H01L27/0296 , H01L21/76898 , H01L23/481 , H01L23/60 , H01L29/861 , H01L2223/6622 , H01L2224/13023 , H01L2224/13025 , H01L2224/13027 , H01L2224/131 , H01L2224/14181 , H01L2225/06513 , H01L2225/06541 , H01L2924/00014
摘要: A device includes a semiconductor substrate of a first conductivity type, wherein the semiconductor substrate comprises a first surface and a second surface opposite the first surface. A through-substrate via (TSV) extends from the first surface to the second surface of the semiconductor substrate. A well region of a second conductivity type opposite the first conductivity type encircles the TSV, and extends from the first surface to the second surface of the semiconductor substrate.
摘要翻译: 一种器件包括第一导电类型的半导体衬底,其中半导体衬底包括与第一表面相对的第一表面和第二表面。 贯穿基板通孔(TSV)从半导体基板的第一表面延伸到第二表面。 与第一导电类型相反的第二导电类型的阱区域包围TSV,并且从半导体衬底的第一表面延伸到第二表面。
-
公开(公告)号:US20120061795A1
公开(公告)日:2012-03-15
申请号:US12878803
申请日:2010-09-09
申请人: Hsiao-Tsung Yen , Hsien-Pin Hu , Chin-Wei Kuo , Sally Liu
发明人: Hsiao-Tsung Yen , Hsien-Pin Hu , Chin-Wei Kuo , Sally Liu
IPC分类号: H01L29/92 , H01L21/265
CPC分类号: H01L27/0296 , H01L21/76898 , H01L23/481 , H01L23/60 , H01L29/861 , H01L2223/6622 , H01L2224/13023 , H01L2224/13025 , H01L2224/13027 , H01L2224/131 , H01L2224/14181 , H01L2225/06513 , H01L2225/06541 , H01L2924/00014
摘要: A device includes a semiconductor substrate of a first conductivity type, wherein the semiconductor substrate comprises a first surface and a second surface opposite the first surface. A through-substrate via (TSV) extends from the first surface to the second surface of the semiconductor substrate. A well region of a second conductivity type opposite the first conductivity type encircles the TSV, and extends from the first surface to the second surface of the semiconductor substrate.
摘要翻译: 一种器件包括第一导电类型的半导体衬底,其中半导体衬底包括与第一表面相对的第一表面和第二表面。 贯穿基板通孔(TSV)从半导体基板的第一表面延伸到第二表面。 与第一导电类型相反的第二导电类型的阱区域包围TSV,并且从半导体衬底的第一表面延伸到第二表面。
-
公开(公告)号:US20110291232A1
公开(公告)日:2011-12-01
申请号:US12791705
申请日:2010-06-01
申请人: Hsiao-Tsung Yen , Chin-Wei Kuo , Hsien-Pin Hu , Sally Liu , Ming-Fa Chen , Jhe-Ching Lu
发明人: Hsiao-Tsung Yen , Chin-Wei Kuo , Hsien-Pin Hu , Sally Liu , Ming-Fa Chen , Jhe-Ching Lu
CPC分类号: H01L23/5227 , H01F17/0013 , H01F27/2804 , H01L23/49822 , H01L2224/16225 , H01L2224/16227 , H01L2924/00014 , H01L2924/01322 , H01L2924/15311 , H01L2924/15321 , H01L2924/00 , H01L2224/0401
摘要: In accordance with an embodiment, a semiconductor device comprises a semiconductor die, an interposer, and conductive bumps bonding the semiconductor die to the interposer. The semiconductor die comprises a first metallization layer, and the first metallization layer comprises a first conductive pattern. The interposer comprises a second metallization layer, and the second metallization layer comprises a second conductive pattern. Some of the conductive bumps electrically couple the first conductive pattern to the second conductive pattern to form a coil. Other embodiments contemplate other configurations of coils, inductors, and/or transformers, and contemplate methods of manufacture.
摘要翻译: 根据实施例,半导体器件包括半导体管芯,插入件和将半导体管芯接合到插入件的导电凸块。 半导体管芯包括第一金属化层,第一金属化层包括第一导电图案。 插入器包括第二金属化层,并且第二金属化层包括第二导电图案。 一些导电凸块将第一导电图案电耦合到第二导电图案以形成线圈。 其他实施例考虑了线圈,电感器和/或变压器的其他配置,并考虑了制造方法。
-
公开(公告)号:US09103884B2
公开(公告)日:2015-08-11
申请号:US12963511
申请日:2010-12-08
申请人: Hsiao-Tsung Yen , Yu-Ling Lin , Chin-Wei Kuo , Ho-Hsiang Chen , Sa-Lly Liu
发明人: Hsiao-Tsung Yen , Yu-Ling Lin , Chin-Wei Kuo , Ho-Hsiang Chen , Sa-Lly Liu
IPC分类号: G01R31/26 , G01R31/3185 , G11C29/56 , H01L21/66
CPC分类号: G01R31/2601 , G01R1/0491 , G01R31/2644 , G01R31/318511 , G11C29/56 , G11C2029/5602 , H01L22/34
摘要: A transmission line is provided. In one embodiment, the transmission line comprises a substrate, a well within the substrate, a shielding layer over the well, and a plurality of intermediate metal layers over the shielding layer, the plurality of intermediate metal layers coupled by a plurality of vias. The transmission line further includes a top metal layer over the plurality of intermediate metal layers. A test structure for de-embedding an on-wafer device, and a wafer are also disclosed.
摘要翻译: 提供传输线。 在一个实施例中,传输线包括衬底,衬底内的阱,阱上的屏蔽层以及屏蔽层上的多个中间金属层,多个中间金属层通过多个通孔耦合。 传输线还包括多个中间金属层上的顶部金属层。 还公开了用于去嵌入晶片装置和晶片的测试结构。
-
7.
公开(公告)号:US09087840B2
公开(公告)日:2015-07-21
申请号:US12917285
申请日:2010-11-01
申请人: Yu-Ling Lin , Hsiao-Tsung Yen , Ho-Hsiang Chen , Chin-Wei Kuo , Chewn-Pu Jou
发明人: Yu-Ling Lin , Hsiao-Tsung Yen , Ho-Hsiang Chen , Chin-Wei Kuo , Chewn-Pu Jou
IPC分类号: H01L23/14 , H01L23/522 , H01L23/66 , H01L27/06
CPC分类号: H01L23/5225 , H01L23/5226 , H01L23/528 , H01L23/64 , H01L23/66 , H01L27/0629 , H01L2223/6627 , H01L2924/0002 , H01L2924/00
摘要: A strip-line includes a ground plane extending through a plurality of dielectric layers over a substrate; a signal line over the substrate and on a side of the ground plane; a first plurality of metal strips under the signal line and in a first metal layer, wherein the first plurality of metal strips is parallel to each other, and is spaced apart from each other by spaces; and a second plurality of metal strips under the signal line and in a second metal layer over the first metal layer. The second plurality of metal strips vertically overlaps the spaces. The first plurality of metal strips is electrically coupled to the second plurality of metal strips through the ground plane, and no via physically contacts the first plurality of metal strips and the second plurality of metal strips.
摘要翻译: 带状线包括在衬底上延伸穿过多个电介质层的接地平面; 在基板上并在接地平面的一侧的信号线; 在信号线下方和第一金属层中的第一多个金属条,其中所述第一多个金属条彼此平行并且彼此间隔开; 以及信号线下方的第二多个金属条,并且在第一金属层上方的第二金属层中。 第二多个金属带垂直地与空间重叠。 第一多个金属条通过接地平面电耦合到第二多个金属条,并且不通过物理地接触第一多个金属条和第二多个金属条。
-
8.
公开(公告)号:US20130099352A1
公开(公告)日:2013-04-25
申请号:US13280786
申请日:2011-10-25
申请人: Hsiao-Tsung Yen , Yu-Ling Lin , Chin-Wei Kuo , Ho-Hsiang Chen , Min-Chie Jeng
发明人: Hsiao-Tsung Yen , Yu-Ling Lin , Chin-Wei Kuo , Ho-Hsiang Chen , Min-Chie Jeng
IPC分类号: H01L23/48 , H01L21/768
CPC分类号: H01L23/5222 , H01F17/0013 , H01L21/76805 , H01L21/76877 , H01L23/5225 , H01L23/5227 , H01L23/528 , H01L23/552 , H01L23/642 , H01L23/645 , H01L28/10 , H01L2924/0002 , H01L2924/00
摘要: The present disclosure provides a semiconductor device. The semiconductor device includes a semiconductor substrate having an integrated circuit (IC) device; an interconnect structure disposed on the semiconductor substrate and coupled with the IC device; and a transformer disposed on the semiconductor substrate and integrated in the interconnect structure. The transformer includes a first conductive feature; a second conductive feature inductively coupled with the first conductive feature; a third conductive feature electrically connected to the first conductive feature; and a fourth conductive feature electrically connected to the second conductive feature. The third and fourth conductive features are designed and configured to be capacitively coupled to increase a coupling coefficient of the transformer.
摘要翻译: 本发明提供一种半导体器件。 半导体器件包括具有集成电路(IC)器件的半导体衬底; 布置在半导体衬底上并与IC器件耦合的互连结构; 以及设置在半导体衬底上并集成在互连结构中的变压器。 变压器包括第一导电特征; 与所述第一导电特征电感耦合的第二导电特征; 电连接到第一导电特征的第三导电特征; 以及电连接到第二导电特征的第四导电特征。 第三和第四导电特征被设计和配置为电容耦合以增加变压器的耦合系数。
-
公开(公告)号:US20120146741A1
公开(公告)日:2012-06-14
申请号:US12963701
申请日:2010-12-09
申请人: Hsiao-Tsung YEN , Yu-Ling Lin , Ying-Ta Lu , Chin-Wei Kuo , Ho-Hsiang Chen
发明人: Hsiao-Tsung YEN , Yu-Ling Lin , Ying-Ta Lu , Chin-Wei Kuo , Ho-Hsiang Chen
CPC分类号: H01L23/5227 , H01F17/0006 , H01F2017/0086 , H01L23/5223 , H01L2924/0002 , Y10T29/41 , H01L2924/00
摘要: An electronic device comprises first, second and third inductors connected in series and formed in a metal layer over a semiconductor substrate. The first and second inductors have a mutual inductance with each other. The second and third inductors having a mutual inductance with each other. A first capacitor has a first electrode connected to a first node. The first node is conductively coupled between the first and second inductors. A second capacitor has a second electrode connected to a second node. The second node is conductively coupled between the second and third inductors.
摘要翻译: 电子器件包括串联连接并形成在半导体衬底上的金属层中的第一,第二和第三电感器。 第一和第二电感器具有彼此的互感。 第二和第三电感器具有彼此的互感。 第一电容器具有连接到第一节点的第一电极。 第一节点电导耦合在第一和第二电感器之间。 第二电容器具有连接到第二节点的第二电极。 第二节点电导耦合在第二和第三电感器之间。
-
公开(公告)号:US09923101B2
公开(公告)日:2018-03-20
申请号:US13615503
申请日:2012-09-13
申请人: Hsiao-Tsung Yen , Yu-Ling Lin , Chin-Wei Kuo , Ho-Hsiang Chen , Chewn-Pu Jou , Min-Chie Jeng
发明人: Hsiao-Tsung Yen , Yu-Ling Lin , Chin-Wei Kuo , Ho-Hsiang Chen , Chewn-Pu Jou , Min-Chie Jeng
CPC分类号: H01L29/94 , H01L22/34 , H01L23/481 , H01L23/585 , H01L27/0629 , H01L28/60 , H01L29/66181 , H01L2924/0002 , H01L2924/00
摘要: A semiconductor structure is provided. The semiconductor structure includes a floating substrate; and a capacitor grounded and connected to the floating substrate. A method of manufacturing a semiconductor structure is also provided.
-
-
-
-
-
-
-
-
-