Method of forming resistance variable memory device
    10.
    发明授权
    Method of forming resistance variable memory device 有权
    形成电阻变量存储器件的方法

    公开(公告)号:US08580606B2

    公开(公告)日:2013-11-12

    申请号:US13241315

    申请日:2011-09-23

    IPC分类号: H01L21/06

    摘要: A method of forming a resistance variable memory device, the method including forming a diode on a semiconductor substrate; forming a lower electrode on the diode; forming a first insulating film on the lower electrode, the first insulating film having an opening; forming a resistance variable film filling the opening such that the resistance variable film includes an amorphous region adjacent to a sidewall of the opening and a crystalline region adjacent to the lower electrode; and forming an upper electrode on the resistance variable film.

    摘要翻译: 一种形成电阻可变存储器件的方法,所述方法包括在半导体衬底上形成二极管; 在二极管上形成下电极; 在所述下电极上形成第一绝缘膜,所述第一绝缘膜具有开口; 形成填充所述开口的电阻变化膜,使得所述电阻变化膜包括与所述开口的侧壁相邻的非晶区域和与所述下部电极相邻的结晶区域; 并在电阻变化膜上形成上电极。