ENHANCING SCHOTTKY BREAKDOWN VOLTAGE (BV) WITHOUT AFFECTING AN INTEGRATED MOSFET-SCHOTTKY DEVICE LAYOUT
    9.
    发明申请
    ENHANCING SCHOTTKY BREAKDOWN VOLTAGE (BV) WITHOUT AFFECTING AN INTEGRATED MOSFET-SCHOTTKY DEVICE LAYOUT 有权
    在不影响集成MOSFET肖特基器件布局的情况下增强肖特基势垒(BV)

    公开(公告)号:US20140374823A1

    公开(公告)日:2014-12-25

    申请号:US13925776

    申请日:2013-06-24

    IPC分类号: H01L29/78

    摘要: This invention discloses a semiconductor power device that includes an active cell area having a plurality of power transistor cells. Each of said power transistor cells has a planar Schottky diode that includes a Schottky junction barrier metal covering areas above gaps between separated body regions between two adjacent power transistor cells. The separated body regions further provide a function of adjusting a leakage current of said Schottky diode in each of said power transistor cells. Each of the planar Schottky diodes further includes a Shannon implant region disposed in a gap between the separated body regions of two adjacent power transistor cells for further adjusting a leakage current of said Schottky diode. Each of the power transistor cells further includes heavy body doped regions in the separated body regions next to source regions surrounding said Schottky diode forming a junction barrier Schottky (JBS) pocket region.

    摘要翻译: 本发明公开了一种包括具有多个功率晶体管单元的有源单元区域的半导体功率器件。 每个所述功率晶体管单元具有平面肖特基二极管,其包括覆盖两个相邻功率晶体管单元之间的分离体区域之间的间隙上方的区域的肖特基结阻挡金属。 分离体区域还提供调节每个所述功率晶体管单元中的所述肖特基二极管的漏电流的功能。 每个平面肖特基二极管还包括设置在两个相邻功率晶体管单元的分离的体区之间的间隙中的香农注入区,用于进一步调整所述肖特基二极管的漏电流。 每个功率晶体管单元进一步包括分离体区域中的重体掺杂区域,其邻近形成结屏障肖特基(JBS)口袋区域的围绕所述肖特基二极管的源极区域。

    MOSFET with improved performance through induced net charge region in thick bottom insulator
    10.
    发明授权
    MOSFET with improved performance through induced net charge region in thick bottom insulator 有权
    MOSFET通过在厚底部绝缘体中的感应净电荷区域具有改进的性能

    公开(公告)号:US08802530B2

    公开(公告)日:2014-08-12

    申请号:US13490138

    申请日:2012-06-06

    摘要: A semiconductor power device includes a thick bottom insulator formed in a lower portion of a trench in a semiconductor epitaxial region. An electrically conductive gate electrode is formed in the trench above the bottom insulator. The gate electrode is electrically insulated from the epitaxial region by the bottom insulator and a gate insulator. Charge is deliberately induced in the thick bottom insulator proximate an interface between the bottom insulator and the epitaxial semiconductor region. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

    摘要翻译: 半导体功率器件包括形成在半导体外延区域中的沟槽的下部的厚的底部绝缘体。 在底部绝缘体上方的沟槽中形成导电栅电极。 栅极电极通过底部绝缘体和栅极绝缘体与外延区域电绝缘。 在底部绝缘体和外延半导体区域之间的界面附近的厚底层绝缘体中有意地引起电荷。 要强调的是,该摘要被提供以符合要求抽象的规则,允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是,它不会用于解释或限制权利要求的范围或含义。