SEMICONDUCTOR WAFER DICING BLADE
    4.
    发明申请

    公开(公告)号:US20150183131A1

    公开(公告)日:2015-07-02

    申请号:US14141471

    申请日:2013-12-27

    IPC分类号: B28D5/02 B24D3/06 B24D5/14

    CPC分类号: B28D5/022 B24D3/06 B24D5/14

    摘要: A dicing blade suitable for cutting a semiconductor wafer has an edge of fine grit for polishing a top surface of the wafer and a protruding part of coarse grit for making an initial cut into the wafer. The blade reduces chipping of the top surface of the wafer and increases throughput by facilitating cutting and polishing in one operation. The blade can dice and polish comparatively thick wafers having narrow scribe lines in a single operation.

    摘要翻译: 适用于切割半导体晶片的切割刀片具有用于抛光晶片顶表面的细砂粒边缘和用于初始切割到晶片中的粗砂粒的突出部分。 刀片减少了晶片顶表面的碎裂,并且通过在一次操作中促进切割和抛光来增加产量。 刀片可以在单次操作中骰子和抛光具有窄划线的比较厚的晶片。

    Lead frame for semiconductor package
    5.
    发明授权
    Lead frame for semiconductor package 有权
    半导体封装引线框架

    公开(公告)号:US08415779B2

    公开(公告)日:2013-04-09

    申请号:US13047803

    申请日:2011-03-15

    IPC分类号: H01L23/495

    摘要: A lead frame for providing electrical interconnection to an Integrated Circuit (IC) die. The lead frame includes a die support area for receiving and supporting the IC die and a plurality of leads surrounding the die support area. A plurality of interconnect receiving portions is formed in the die support area. The interconnect receiving portions are for providing electrical interconnection to first bumps on a bottom surface of the IC die. The leads are for providing electrical interconnection to second bumps on a surface of the IC die, the second bumps surrounding the first bumps.

    摘要翻译: 用于提供与集成电路(IC)裸片的电互连的引线框架。 引线框架包括用于接收和支撑IC芯片的模具支撑区域和围绕模具支撑区域的多个引线。 在模具支撑区域中形成多个互连接收部分。 互连接收部分用于提供与IC芯片的底表面上的第一凸块的电互连。 引线用于提供与IC芯片的表面上的第二凸块的电互连,第二凸块围绕第一凸块。

    Non-homogeneous molding of packaged semiconductor devices
    7.
    发明授权
    Non-homogeneous molding of packaged semiconductor devices 有权
    封装半导体器件的非均匀成型

    公开(公告)号:US09202770B1

    公开(公告)日:2015-12-01

    申请号:US14474291

    申请日:2014-09-01

    IPC分类号: H01L23/367 H01L21/56 B29B9/12

    摘要: A packaged semiconductor device has an integrated circuit (IC) die and first and second volumes of molding compound. The first volume of molding compound is disposed on a first portion of a first side of the IC die and comprises a first molding compound. The second volume of molding compound is disposed on a second side of the IC die, different from the first side, and comprises a second molding compound, different from the first molding compound. By including different molding compounds, the properties of the packaged semiconductor device can be varied across the device.

    摘要翻译: 封装的半导体器件具有集成电路(IC)模具和第一和第二体积的模塑料。 第一体积的模塑料被设置在IC模头的第一侧的第一部分上并且包括第一模塑料。 第二体积的成型化合物设置在IC模具的与第一侧不同的第二侧上,并且包括与第一模塑料不同的第二模塑料。 通过包括不同的成型化合物,封装的半导体器件的性能可以在整个器件上变化。

    CIRCUIT SUBSTRATE AND METHOD OF MANUFACTURING SAME
    8.
    发明申请
    CIRCUIT SUBSTRATE AND METHOD OF MANUFACTURING SAME 有权
    电路基板及其制造方法

    公开(公告)号:US20150201489A1

    公开(公告)日:2015-07-16

    申请号:US14151828

    申请日:2014-01-10

    摘要: A circuit interconnecting substrate manufacturing method includes depositing a first layer of metallic powder on top of a carrier, and then forming a first layer of electrically conductive traces from the first layer of metallic powder. A second layer of metallic powder is then deposited onto at least one region of the first layer of electrically conductive traces. Then a second layer of electrically conductive traces is formed from the second layer of metallic powder and each trace of the second layer is electrically coupled to a trace of the first layer. An insulating material is deposited onto the carrier to provide an insulating substrate that supports the traces. The method does not require the use of any wet chemicals or chemical etching steps.

    摘要翻译: 电路互连衬底制造方法包括在载体的顶部上沉积第一层金属粉末,然后从第一层金属粉末形成第一层导电迹线。 然后将第二层金属粉末沉积到第一层导电迹线的至少一个区域上。 然后从第二层金属粉末形成第二层导电迹线,并且第二层的每个迹线电耦合到第一层的迹线。 将绝缘材料沉积到载体上以提供支撑迹线的绝缘基板。 该方法不需要使用任何湿化学品或化学蚀刻步骤。

    Circuit substrate and method of manufacturing same
    10.
    发明授权
    Circuit substrate and method of manufacturing same 有权
    电路基板及其制造方法

    公开(公告)号:US09474162B2

    公开(公告)日:2016-10-18

    申请号:US14151828

    申请日:2014-01-10

    IPC分类号: H01L21/00 H05K3/00 H05K1/09

    摘要: A circuit interconnecting substrate manufacturing method includes depositing a first layer of metallic powder on top of a carrier, and then forming a first layer of electrically conductive traces from the first layer of metallic powder. A second layer of metallic powder is then deposited onto at least one region of the first layer of electrically conductive traces. Then a second layer of electrically conductive traces is formed from the second layer of metallic powder and each trace of the second layer is electrically coupled to a trace of the first layer. An insulating material is deposited onto the carrier to provide an insulating substrate that supports the traces. The method does not require the use of any wet chemicals or chemical etching steps.

    摘要翻译: 电路互连衬底制造方法包括在载体的顶部上沉积第一层金属粉末,然后从第一层金属粉末形成第一层导电迹线。 然后将第二层金属粉末沉积到第一层导电迹线的至少一个区域上。 然后从第二层金属粉末形成第二层导电迹线,并且第二层的每个迹线电耦合到第一层的迹线。 将绝缘材料沉积到载体上以提供支撑迹线的绝缘基板。 该方法不需要使用任何湿化学品或化学蚀刻步骤。