Capacitor for semiconductor integrated circuit
    1.
    发明授权
    Capacitor for semiconductor integrated circuit 失效
    半导体集成电路电容器

    公开(公告)号:US5745336A

    公开(公告)日:1998-04-28

    申请号:US417839

    申请日:1995-04-06

    摘要: A semiconductor integrated circuit apparatus according to the present invention has a capacitor formed in such a manner that a ferroelectric thin film is formed after a MOS transistor has been formed on a substrate thereof, a ferroelectric thin film made of, for example, PbZrTiO.sub.3 or SrTiO.sub.3 or the like is formed into a columnar shape to form electrodes positioned in direct contact with the side wall portions of said columnar ferroelectric thin film and the top portion is removed. As a result, a fact that an oxide of each electrode, which deteriorates the relative permittivity, is formed on the interface between the electrode and the ferroelectric material is prevented, and a large capacity can be realized with respect to the area of the substrate because the ferroelectric thin film is formed into the columnar and elongated shape, resulting in that the capacitance of the capacitor is not reduced in which the electrodes and the oxide dielectric material having a high permittivity are, in series, connected to each other. The capacitor is formed into a DRAM or an FRAM memory cell so as to realize a semiconductor memory revealing a high degree of integration and a high processing speed.

    摘要翻译: 根据本发明的半导体集成电路装置具有电容器,其形成为在其基板上形成MOS晶体管之后形成铁电薄膜,由例如PbZrTiO 3或SrTiO 3制成的铁电薄膜 或类似物形成为柱状,以形成与所述柱状铁电薄膜的侧壁部分直接接触的电极,并且去除顶部部分。 结果,防止了在电极和铁电材料之间的界面上形成各种电极的氧化物,导致相对介电常数下降的事实,因此能够相对于基板的面积实现大容量,因为 铁电薄膜形成为柱状和细长形状,导致电容器的电容不降低,其中具有高介电常数的电极和氧化物介电材料串联连接。 电容器形成为DRAM或FRAM存储单元,以实现显示高集成度和高​​处理速度的半导体存储器。

    Capacitor for semiconductor integrated circuit and method of
manufacturing the same
    2.
    发明授权
    Capacitor for semiconductor integrated circuit and method of manufacturing the same 失效
    半导体集成电路用电容器及其制造方法

    公开(公告)号:US5434742A

    公开(公告)日:1995-07-18

    申请号:US995977

    申请日:1992-12-23

    摘要: A semiconductor integrated circuit apparatus according to the present invention has a capacitor formed in such a manner that a ferroelectric thin film is formed after a MOS transistor has been formed on a substrate thereof, a ferroelectric thin film made of, for example, PbZrTiO.sub.3 or SrTiO.sub.3 or the like is formed into a columnar shape to form electrodes positioned in direct contact with the side wall portions of said columnar ferroelectric thin film, and the top portion is removed. As a result, a fact that an oxide of each electrode, which deteriorates the relative permittivity, is formed on the interface between the electrode and the ferroelectric material is prevented, and a large capacity can be realized with respect to the area of the substrate because the ferroelectric thin film is formed into the columnar and elongated shape, resulting in that the capacitance of the capacitor is not reduced in which the electrodes and the oxide dielectric material having a high permittivity are, in series, connected to each other.The capacitor is formed into a DRAM or an FRAM memory cell so as to realize a semiconductor memory revealing a high degree of integration and a high processing speed.

    摘要翻译: 根据本发明的半导体集成电路装置具有电容器,其形成为在其基板上形成MOS晶体管之后形成铁电薄膜,由例如PbZrTiO 3或SrTiO 3制成的铁电薄膜 或类似物形成为柱状,以形成与所述柱状铁电薄膜的侧壁部直接接触的电极,并且去除顶部。 结果,防止了在电极和铁电材料之间的界面上形成各种电极的氧化物,导致相对介电常数下降的事实,因此能够相对于基板的面积实现大容量,因为 铁电薄膜形成为柱状和细长形状,导致电容器的电容不降低,其中具有高介电常数的电极和氧化物介电材料串联连接。 电容器形成为DRAM或FRAM存储单元,以实现显示高集成度和高​​处理速度的半导体存储器。

    Plasma processing apparatus and the method of the same
    3.
    发明授权
    Plasma processing apparatus and the method of the same 失效
    等离子体处理装置及其方法相同

    公开(公告)号:US5211825A

    公开(公告)日:1993-05-18

    申请号:US764161

    申请日:1991-09-23

    摘要: A plasma processing apparatus performs a sample processing and cleaning processing. The sample processing is carried out by generating a reaction gas plasma within a vacuum vessel of the apparatus using an electron cyclotron resonance excitation. The cleaning processing is carried out to clean the inner wall of the vacuum vessel by generating a cleaning gas plasma within the vacuum vessel. Generation of the cleaning gas plasma takes place by using either one of the following processes:(1) The plasma diameter during the cleaning processing is made larger than that during the sample processing. The end of the plasma during cleaning processing is made to reach the inside wall of the vacuum vessel.(2) The cleaning gas plasma is scanned within the vacuum vessel.

    摘要翻译: 等离子体处理装置进行样品处理和清洗处理。 通过使用电子回旋共振激发在装置的真空容器内产生反应气体等离子体来进行样品处理。 进行清洁处理以通过在真空容器内产生清洁气体等离子体来清洁真空容器的内壁。 清洁气体等离子体的产生通过使用以下任一方法进行:(1)清洁处理期间的等离子体直径大于样品处理期间的等离子体直径。 在清洁处理期间等离子体的末端到达真空容器的内壁。 (2)在真空容器内扫描清洁气体等离子体。

    Power semiconductor device
    6.
    发明授权
    Power semiconductor device 失效
    功率半导体器件

    公开(公告)号:US5883403A

    公开(公告)日:1999-03-16

    申请号:US720017

    申请日:1996-09-27

    摘要: In a semiconductor device, such as a diode and thyristor, having at least one pn junction between a pair of main surfaces, a first main electrode formed on the surface of one of the main surfaces and a second main electrode formed on the surface of the other one of the main surfaces, a semiconductor lattice defect is formed such that its lattice defect density increases gradually in the direction from the first main electrode to the second main electrode. Since the distribution of the carrier density in the conduction state can be flattened, the reverse recovery charge can be reduced substantially without causing the ON-state voltage to increase.

    摘要翻译: 在诸如二极管和晶闸管之类的半导体器件中,在一对主表面之间具有至少一个pn结,形成在一个主表面的表面上的第一主电极和形成在主表面上的第二主电极 主表面中的另一个,形成半导体晶格缺陷,使得其晶格缺陷密度在从第一主电极到第二主电极的方向上逐渐增加。 由于载流子密度在导通状态下的分布可以变平,所以可以大大降低反向恢复电荷,而不会导致导通状态电压增加。