Method for improving oxide layer flatness
    8.
    发明申请
    Method for improving oxide layer flatness 审中-公开
    改善氧化层平整度的方法

    公开(公告)号:US20050059235A1

    公开(公告)日:2005-03-17

    申请号:US10918434

    申请日:2004-08-16

    CPC分类号: H01L21/32105 H01L21/3212

    摘要: A method for improving the flatness of an oxide layer comprising the steps of providing a semiconductor structure, forming a polysilicon layer on the semiconductor structure, utilizing chemical mechanical polishing to planarize the polysilicon layer, and forming an oxide layer on the polysilicon layer. As a result of using chemical mechanical polishing on the polysilicon layer, an improved flatness of the subsequently formed oxide layer is achieved.

    摘要翻译: 一种用于提高氧化物层的平坦度的方法,包括以下步骤:提供半导体结构,在半导体结构上形成多晶硅层,利用化学机械抛光来平坦化多晶硅层,以及在多晶硅层上形成氧化物层。 作为在多晶硅层上使用化学机械抛光的结果,实现随后形成的氧化物层的改善的平坦度。