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公开(公告)号:US11948986B2
公开(公告)日:2024-04-02
申请号:US17348811
申请日:2021-06-16
Applicant: Murata Manufacturing Co., Ltd.
Inventor: Atsushi Kurokawa , Masahiro Shibata , Hiroaki Tokuya , Mari Saji
IPC: H01L29/417 , H01L29/08 , H01L29/73
CPC classification number: H01L29/41708 , H01L29/0817 , H01L29/73
Abstract: A mesa portion is formed on a substrate. An insulating film including an organic layer is disposed on the mesa portion. A conductor film is disposed on the insulating film. A cavity provided in the organic layer has side surfaces extending in a first direction. A shorter distance out of distances in a second direction perpendicular to the first direction from the mesa portion to the side surfaces of the cavity in plan view is defined as a first distance. A shorter distance out of distances in the first direction from the mesa portion to side surfaces of the cavity in plan view is defined as a second distance. A height of a first step of the mesa portion is defined as a first height. At least one of the first distance and the second distance is greater than or equal to the first height.
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公开(公告)号:US11335617B2
公开(公告)日:2022-05-17
申请号:US16744449
申请日:2020-01-16
Applicant: Murata Manufacturing Co., Ltd.
Inventor: Hiroaki Tokuya , Yuichi Sano , Toshihiro Tada
Abstract: An electronic component whose reliability is less likely to decrease while its thermal conductivity is maintained. A semiconductor chip is mounted on a substrate. The semiconductor chip is sealed with a sealing resin layer. The sealing resin layer includes a binder and two types of fillers having a plurality of particles dispersed in the binder. As the two types of fillers, fillers at least one of whose physical quantities, which are average particle diameter and density, are different from each other are used. The total volume density of the fillers in the sealing resin layer decreases in an upward direction from the substrate, and a portion of the sealing resin layer in a height direction of the sealing resin layer has an area in which the two types of fillers are present in a mixed manner.
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公开(公告)号:US10388623B2
公开(公告)日:2019-08-20
申请号:US15954420
申请日:2018-04-16
Applicant: MURATA MANUFACTURING CO., LTD.
Inventor: Yasunari Umemoto , Daisuke Tokuda , Tsunekazu Saimei , Hiroaki Tokuya
IPC: H01L29/737 , H01L23/00 , H01L29/417 , H01L29/732 , H01L29/08 , H01L29/66 , H01L29/20 , H01L29/205 , H01L29/06
Abstract: A semiconductor device that includes a bipolar transistor, wherein a third opening, through which a pillar bump and a second wiring line, which is electrically connected to an emitter layer, contact each other, is shifted in a longitudinal direction of the emitter layer away from a position at which the third opening would be directly above the emitter layer. The third opening is arranged, with respect to the emitter layer, such that an end portion of the emitter layer in the longitudinal direction of the emitter layer and the edge of the opening of the third opening are substantially aligned with each other.
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公开(公告)号:US10978579B2
公开(公告)日:2021-04-13
申请号:US16505390
申请日:2019-07-08
Applicant: Murata Manufacturing Co., Ltd.
Inventor: Yasunari Umemoto , Daisuke Tokuda , Tsunekazu Saimei , Hiroaki Tokuya
IPC: H01L29/737 , H01L29/417 , H01L29/732 , H01L23/00 , H01L29/06 , H01L29/08 , H01L29/66 , H01L29/20 , H01L29/205
Abstract: A semiconductor device that includes a bipolar transistor, wherein a third opening, through which a pillar bump and a second wiring line, which is electrically connected to an emitter layer, contact each other, is shifted in a longitudinal direction of the emitter layer away from a position at which the third opening would be directly above the emitter layer. The third opening is arranged, with respect to the emitter layer, such that an end portion of the emitter layer in the longitudinal direction of the emitter layer and the edge of the opening of the third opening are substantially aligned with each other.
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公开(公告)号:US10559547B2
公开(公告)日:2020-02-11
申请号:US16006623
申请日:2018-06-12
Applicant: Murata Manufacturing Co., Ltd.
Inventor: Masahiro Shibata , Daisuke Tokuda , Atsushi Kurokawa , Hiroaki Tokuya , Yasunari Umemoto
Abstract: A semiconductor chip includes a semiconductor substrate having a main surface, first and second electrodes, a first insulating layer, and first and second bumps. The first and second electrodes are formed above the main surface of the semiconductor substrate. The first insulating layer is formed above a first portion of the first electrode. The first bump is formed above a second portion of the first electrode and above the first insulating layer and is electrically connected to the first electrode. The second bump is formed above the second electrode. The area of the second bump is larger than that of the first bump in a plan view of the main surface of the semiconductor substrate. The first insulating layer adjusts the distance from the main surface of the semiconductor substrate to the top surface of the first bump in a direction normal to the main surface.
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公开(公告)号:US11735541B2
公开(公告)日:2023-08-22
申请号:US16452637
申请日:2019-06-26
Applicant: Murata Manufacturing Co., Ltd.
Inventor: Kazuya Kobayashi , Atsushi Kurokawa , Hiroaki Tokuya , Isao Obu , Yuichi Saito
IPC: H01L23/31 , H01L23/00 , H01L49/02 , H01L27/06 , H01L23/528
CPC classification number: H01L24/05 , H01L23/3171 , H01L23/3192 , H01L23/528 , H01L27/0658 , H01L27/0664 , H01L27/0676 , H01L28/20 , H01L28/40 , H01L2224/04105 , H01L2224/05558 , H01L2224/05573
Abstract: A target element to be protected and a protrusion are arranged on a substrate. An insulating film arranged on the substrate covers the target element and at least a side surface of the protrusion. An electrode pad for external connection is arranged on the insulating film. The electrode pad at least partially overlaps the target element and the protrusion as seen in plan view. A maximum distance between the upper surface of the protrusion and the electrode pad in the height direction is shorter than a maximum distance between the upper surface of the target element and the electrode pad in the height direction.
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公开(公告)号:US11532736B2
公开(公告)日:2022-12-20
申请号:US17189043
申请日:2021-03-01
Applicant: Murata Manufacturing Co., Ltd.
Inventor: Yasunari Umemoto , Daisuke Tokuda , Tsunekazu Saimei , Hiroaki Tokuya
IPC: H01L29/737 , H01L29/417 , H01L29/732 , H01L23/00 , H01L29/06 , H01L29/08 , H01L29/66 , H01L29/20 , H01L29/205
Abstract: A semiconductor device that includes a bipolar transistor, wherein a third opening, through which a pillar bump and a second wiring line, which is electrically connected to an emitter layer, contact each other, is shifted in a longitudinal direction of the emitter layer away from a position at which the third opening would be directly above the emitter layer. The third opening is arranged, with respect to the emitter layer, such that an end portion of the emitter layer in the longitudinal direction of the emitter layer and the edge of the opening of the third opening are substantially aligned with each other.
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公开(公告)号:US20180145028A1
公开(公告)日:2018-05-24
申请号:US15814833
申请日:2017-11-16
Applicant: Murata Manufacturing Co., Ltd.
Inventor: Kazuya Kobayashi , Yuichi Sano , Daisuke Tokuda , Hiroaki Tokuya
IPC: H01L23/528 , H01L23/522 , H01L23/532
CPC classification number: H01L23/5283 , H01L23/3171 , H01L23/485 , H01L23/5226 , H01L23/53295 , H01L24/02
Abstract: A semiconductor device includes a semiconductor substrate, a first metal layer, an insulation layer, an organic layer, and a second metal layer. The first metal layer, the insulation layer, the organic layer, and the second metal layer are sequentially stacked on a surface of the semiconductor substrate. The first metal layer and the second metal layer are electrically connected to each other through vias formed in the insulation layer and the organic layer. The second metal layer includes an electrode pad at a position corresponding to the positions of the vias. At the interface between the surface of the semiconductor substrate and the first metal layer, a patch portion having a trapezoidal cross-sectional shape is disposed directly below the vias.
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公开(公告)号:US09508669B2
公开(公告)日:2016-11-29
申请号:US15202749
申请日:2016-07-06
Applicant: MURATA MANUFACTURING CO., LTD.
Inventor: Yasunari Umemoto , Daisuke Tokuda , Tsunekazu Saimei , Hiroaki Tokuya
IPC: H01L29/737 , H01L23/00 , H01L29/66 , H01L29/08
CPC classification number: H01L24/13 , H01L24/02 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/16 , H01L29/0692 , H01L29/0817 , H01L29/20 , H01L29/205 , H01L29/41708 , H01L29/66234 , H01L29/66242 , H01L29/66272 , H01L29/6631 , H01L29/66318 , H01L29/732 , H01L29/737 , H01L29/7371 , H01L29/7375 , H01L29/7378 , H01L2224/02331 , H01L2224/0235 , H01L2224/02372 , H01L2224/02373 , H01L2224/0239 , H01L2224/024 , H01L2224/03912 , H01L2224/0401 , H01L2224/05022 , H01L2224/05024 , H01L2224/05147 , H01L2224/05166 , H01L2224/05558 , H01L2224/05559 , H01L2224/05569 , H01L2224/05572 , H01L2224/05666 , H01L2224/1134 , H01L2224/13013 , H01L2224/13022 , H01L2224/13024 , H01L2224/13026 , H01L2224/13083 , H01L2224/131 , H01L2224/13111 , H01L2224/13147 , H01L2224/13155 , H01L2224/13563 , H01L2224/13611 , H01L2224/16225 , H01L2224/16227 , H01L2224/16235 , H01L2924/00012 , H01L2924/01029 , H01L2924/07025 , H01L2924/10329 , H01L2924/10337 , H01L2924/10338 , H01L2924/13051 , H01L2924/13055 , H01L2924/1423 , H01L2924/351 , H01L2924/01079 , H01L2924/00014 , H01L2924/014
Abstract: A semiconductor device that includes a bipolar transistor, wherein a third opening, through which a pillar bump and a second wiring line, which is electrically connected to an emitter layer, contact each other, is shifted in a longitudinal direction of the emitter layer away from a position at which the third opening would be directly above the emitter layer. The third opening is arranged, with respect to the emitter layer, such that an end portion of the emitter layer in the longitudinal direction of the emitter layer and the edge of the opening of the third opening are substantially aligned with each other.
Abstract translation: 一种包括双极晶体管的半导体器件,其中与发射极层电连接的柱凸起和第二布线彼此接触的第三开口在发射极层的纵向方向上偏离 第三开口直接位于发射极层上方的位置。 第三开口相对于发射极层布置成使得发射极层的纵向方向上的发射极层的端部和第三开口的开口的边缘基本上彼此对准。
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公开(公告)号:US11601102B2
公开(公告)日:2023-03-07
申请号:US17168618
申请日:2021-02-05
Applicant: Murata Manufacturing Co., Ltd.
Inventor: Hiroaki Tokuya , Hideyuki Sato , Fumio Harima , Kenichi Shimamoto , Satoshi Tanaka , Takayuki Kawano , Ryoki Shikishima , Atsushi Kurokawa
Abstract: A power amplifier circuit includes a first transistor disposed on a semiconductor substrate; a second transistor disposed on the semiconductor substrate and configured to supply a bias current based on a first current which is a part of a control current to the first transistor; a third transistor disposed on the semiconductor substrate and having a collector configured to be supplied with a second current which is a part of the control current and an emitter configured to output a third current based on the second current; a first bump electrically connected to an emitter of the first transistor and disposed so as to overlap a first disposition area in which the first transistor is disposed in plan view of the semiconductor substrate; and a second bump disposed so as to overlap a second disposition area in which the third transistor is disposed in the plan view.
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