FILM FOR FORMING PROTECTIVE LAYER
    6.
    发明申请
    FILM FOR FORMING PROTECTIVE LAYER 审中-公开
    形成保护层的电影

    公开(公告)号:US20120208009A1

    公开(公告)日:2012-08-16

    申请号:US13396532

    申请日:2012-02-14

    IPC分类号: B32B3/00 B32B27/38

    摘要: The present invention aims to provide a film for forming a protective layer that is capable of preventing cracks in a low dielectric material layer of a semiconductor wafer while suppressing an increase in the number of steps in the manufacture of a semiconductor device. This object is achieved by a film for forming a protective layer on a bumped wafer in which a low dielectric material layer is formed, including a support base, an adhesive layer, and a thermosetting resin layer, laminated in this order, wherein the melt viscosity of the thermosetting resin layer is 1×102 Pa·S or more and 2×104 Pa·S or less, and the shear modulus of the adhesive layer is 1×103 Pa or more and 2×106 Pa or less, when the thermosetting resin layer has a temperature in a range of 50 to 120° C.

    摘要翻译: 本发明的目的在于提供一种形成保护层的膜,其能够防止半导体晶片的低电介质材料层中的裂纹,同时抑制半导体器件的制造中的步骤数量的增加。 该目的通过在其上形成低介电材料层的凸起晶片上形成保护层的膜来实现,该薄膜包括依次层叠的支撑基底,粘合层和热固性树脂层,其中熔体粘度 的热固性树脂层的摩尔比为1×102Pa·S以上且2×104Pa·S以下,粘合剂层的剪切模量为1×10 3 Pa以上2×10 6 Pa以下时, 树脂层的温度为50〜120℃。