Display apparatus
    1.
    发明授权

    公开(公告)号:US12027107B2

    公开(公告)日:2024-07-02

    申请号:US18222155

    申请日:2023-07-14

    IPC分类号: G09G3/32

    摘要: A display apparatus includes a display panel including a plurality of pixels each having red, green, and blue LEDs; a display panel driver applying a current to each of the LEDs; a memory storing current intensity information according to target luminance of each of the LEDs; and a processor controlling the display panel driver to apply a current to each of the LEDs based on the current intensity information, wherein the processor is configured to control the display panel driver to apply an additional current to the green LED when a target luminance of the red LED is smaller than a predetermined luminance.

    LED MODULE, METHOD OF MANUFACTURING THE SAME, AND LED DISPLAY APPARATUS

    公开(公告)号:US20240021751A1

    公开(公告)日:2024-01-18

    申请号:US18222296

    申请日:2023-07-14

    IPC分类号: H01L33/00 H01L33/06 H01L33/08

    摘要: A method of manufacturing an LED module includes forming a first conductivity-type semiconductor base layer on a growth substrate; forming a mask pattern having first to third openings on the first conductivity-type semiconductor base layer, wherein the mask pattern the first to the third openings having different widths and arranged with a same pitch; simultaneously forming first to third light emitting laminates in the first to third openings, respectively; removing the mask pattern from the first conductivity-type semiconductor base layer; and removing an edge region of each of the first to third light emitting laminates, wherein first to third light emitting laminates include a first to third active layers configured to emit light of different wavelengths, respectively.

    PHOTOMASKS AND METHODS OF FABRICATING SEMICONDUCTOR DEVICES USING THE SAME
    5.
    发明申请
    PHOTOMASKS AND METHODS OF FABRICATING SEMICONDUCTOR DEVICES USING THE SAME 审中-公开
    使用该方法制造半导体器件的照片和方法

    公开(公告)号:US20140220481A1

    公开(公告)日:2014-08-07

    申请号:US14136560

    申请日:2013-12-20

    IPC分类号: G03F1/48

    CPC分类号: G03F1/48

    摘要: The present inventive concept provides a photomask including a substrate, patterns disposed on the substrate, and an anti-contamination layer disposed on the patterns. The anti-contamination layer includes at least one graphene layer. Methods of fabricating a semiconductor device including the same are also provided.

    摘要翻译: 本发明构思提供了一种光掩模,其包括基板,设置在基板上的图案,以及设置在图案上的抗污染层。 抗污染层包括至少一个石墨烯层。 还提供了制造包括该半导体器件的半导体器件的方法。

    SEMICONDUCTOR MEASUREMENT APPARATUS
    6.
    发明公开

    公开(公告)号:US20240125709A1

    公开(公告)日:2024-04-18

    申请号:US18317387

    申请日:2023-05-15

    摘要: A semiconductor measurement apparatus includes an illuminator configured to output light having a first wavelength band and light having a second wavelength band, different from the first wavelength band, a stage on which a test object is positioned, a camera configured to receive light reflected or scattered from the test object or transmitted through the test object, and a controller configured to control the illuminator and the camera, and to measure, based on information indicated by the light received by the camera, a plurality of structures included in the test object. The controller is configured to set an exposure time of the camera to a first exposure time while the illuminator outputs the light having the first wavelength band, and to set the exposure time of the camera to a second exposure time, different from the first exposure time, while the illuminator outputs the light having the second wavelength band.

    System of measuring image of pattern in scanning type EUV mask

    公开(公告)号:US11914282B2

    公开(公告)日:2024-02-27

    申请号:US17509454

    申请日:2021-10-25

    发明人: Donggun Lee

    IPC分类号: G03F1/24 G01N21/95 G03F7/00

    摘要: A system of measuring an image of a pattern in a scanning type EUV mask may include a high-power laser output unit including a flat mirror and a spherical mirror, which are used to focus a high-power femto-second laser on a gas cell; a coherent EUV light generating portion generating a coherent EUV light; a pin-hole, a graphene filter, and a zirconium (Zr) filter; a stage; an x-ray spherical mirror configured to focus a coherent EUV light; a zone-plate lens placed between the stage and the x-ray spherical mirror; an x-ray flat mirror placed between the zone-plate lens and the x-ray spherical mirror; an order sorting aperture (OSA) placed on the stage and configured to transmit only a first-order diffraction light of the focused coherent EUV light; and a detector portion placed on the stage.

    System of inspecting pattern defect in scanning-type reflective extreme ultraviolet mask

    公开(公告)号:US11619876B1

    公开(公告)日:2023-04-04

    申请号:US17524210

    申请日:2021-11-11

    发明人: Donggun Lee

    IPC分类号: G03F1/24 G03F7/20

    摘要: Disclosed is a system of inspecting a pattern defect in a scanning-type reflective extreme ultraviolet (EUV) mask. The system may include a photoelectron generator, a source light generator configured to generate a coherent EUV light from electrons generated by the photoelectron generator, a mask positioning structure configured to move the reflective EUV mask, an optic module placed on the mask positioning structure and configured to reflect and focus the EUV light, a zoneplate lens array configured to focus the EUV light on the reflective EUV mask, and a detection array placed near the zoneplate lens array to measure an energy of light reflected from the mask. The entire pattern region of the reflective EUV mask may be inspected by moving the reflective EUV mask using the mask positioning structure to more efficiently inspect a pattern defect in the EUV mask.

    SEMICONDUCTOR LIGHT-EMITTING DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20210249466A1

    公开(公告)日:2021-08-12

    申请号:US17027960

    申请日:2020-09-22

    摘要: Provided is a semiconductor light-emitting device including a substrate, a first insulating layer disposed on an upper surface of the substrate, a plurality of light-emitting structures disposed on the first insulating layer and spaced apart from each other, each of the plurality of light-emitting structures including a first semiconductor layer, an active layer, and a second semiconductor layer, a plurality of optical layers each filling a groove that is formed at a certain depth in the second semiconductor layer, a plurality of first electrodes penetrating the substrate and electrically connected to the first semiconductor layer, a plurality of second insulating layers disposed on side surfaces of each of the plurality of light-emitting structures, respectively, and a second electrode connected to the plurality of light-emitting structures, the second electrode being disposed on an uppermost surface of the second semiconductor layer and each of the plurality of second insulating layers.