公开(公告)号：US09443762B2

公开(公告)日：2016-09-13

申请号：US13933406

申请日：2013-07-02

Applicant: STATS ChipPAC, Ltd.

Inventor： Pandi C. Marimuthu ,  Shuangwu Huang ,  Nathapong Suthiwongsunthorn

IPC: H01L23/48 ,  H01L21/768 ,  H01L21/56 ,  H01L23/31 ,  H01L23/00 ,  H01L25/10 ,  H01L23/498

CPC classification number: H01L21/76898 ,  H01L21/302 ,  H01L21/56 ,  H01L21/561 ,  H01L21/76885 ,  H01L23/3114 ,  H01L23/481 ,  H01L23/49811 ,  H01L24/02 ,  H01L24/04 ,  H01L24/05 ,  H01L24/06 ,  H01L24/10 ,  H01L24/11 ,  H01L24/12 ,  H01L24/13 ,  H01L24/14 ,  H01L24/16 ,  H01L24/48 ,  H01L25/0657 ,  H01L25/105 ,  H01L2224/02166 ,  H01L2224/02181 ,  H01L2224/0391 ,  H01L2224/0401 ,  H01L2224/05083 ,  H01L2224/0557 ,  H01L2224/05572 ,  H01L2224/06181 ,  H01L2224/10125 ,  H01L2224/1184 ,  H01L2224/11901 ,  H01L2224/13009 ,  H01L2224/1301 ,  H01L2224/13025 ,  H01L2224/13027 ,  H01L2224/13082 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1403 ,  H01L2224/14104 ,  H01L2224/14181 ,  H01L2224/16145 ,  H01L2224/48 ,  H01L2224/73265 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/1058 ,  H01L2924/00013 ,  H01L2924/00014 ,  H01L2924/0002 ,  H01L2924/01013 ,  H01L2924/01022 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15174 ,  H01L2924/181 ,  H01L2924/1815 ,  H01L2924/182 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2224/13099 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2224/05552 ,  H01L2224/11849 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has a conductive via in a first surface of a substrate. A first interconnect structure is formed over the first surface of the substrate. A first bump is formed over the first interconnect structure. The first bump is formed over or offset from the conductive via. An encapsulant is deposited over the first bump and first interconnect structure. A portion of the encapsulant is removed to expose the first bump. A portion of a second surface of the substrate is removed to expose the conductive via. The encapsulant provides structural support and eliminates the need for a separate carrier wafer when thinning the substrate. A second interconnect structure is formed over the second surface of the substrate. A second bump is formed over the first bump. A plurality of semiconductor devices can be stacked and electrically connected through the conductive via.

公开(公告)号：US09640504B2

公开(公告)日：2017-05-02

申请号：US14224931

申请日：2014-03-25

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Byung Tai Do ,  Shuangwu Huang

IPC: H01L23/52 ,  H01L23/00 ,  H01L23/528 ,  H01L23/538 ,  H01L21/56 ,  H01L21/683 ,  H01L23/31 ,  H01L25/10 ,  H01L25/16

CPC classification number: H01L24/18 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/528 ,  H01L23/5283 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/97 ,  H01L25/105 ,  H01L25/16 ,  H01L2221/68345 ,  H01L2223/6677 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/20 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01047 ,  H01L2924/01061 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/04953 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/181 ,  H01L2924/1902 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A semiconductor device is made by providing a sacrificial substrate and depositing an adhesive layer over the sacrificial substrate. A first conductive layer is formed over the adhesive layer. A polymer pillar is formed over the first conductive layer. A second conductive layer is formed over the polymer pillar to create a conductive pillar with inner polymer core. A semiconductor die or component is mounted over the substrate. An encapsulant is deposited over the semiconductor die or component and around the conductive pillar. A first interconnect structure is formed over a first side of the encapsulant. The first interconnect structure is electrically connected to the conductive pillar. The sacrificial substrate and adhesive layers are removed. A second interconnect structure is formed over a second side of the encapsulant opposite the first interconnect structure. The second interconnect structure is electrically connected to the conductive pillar.

公开(公告)号：US20140203443A1

公开(公告)日：2014-07-24

申请号：US14224931

申请日：2014-03-25

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Byung Tai Do ,  Shuangwu Huang

IPC: H01L23/528 ,  H01L23/00

CPC classification number: H01L24/18 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/528 ,  H01L23/5283 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/97 ,  H01L25/105 ,  H01L25/16 ,  H01L2221/68345 ,  H01L2223/6677 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/20 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01047 ,  H01L2924/01061 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/04953 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/181 ,  H01L2924/1902 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A semiconductor device is made by providing a sacrificial substrate and depositing an adhesive layer over the sacrificial substrate. A first conductive layer is formed over the adhesive layer. A polymer pillar is formed over the first conductive layer. A second conductive layer is formed over the polymer pillar to create a conductive pillar with inner polymer core. A semiconductor die or component is mounted over the substrate. An encapsulant is deposited over the semiconductor die or component and around the conductive pillar. A first interconnect structure is formed over a first side of the encapsulant. The first interconnect structure is electrically connected to the conductive pillar. The sacrificial substrate and adhesive layers are removed. A second interconnect structure is formed over a second side of the encapsulant opposite the first interconnect structure. The second interconnect structure is electrically connected to the conductive pillar.

Abstract translation: 通过提供牺牲衬底并在牺牲衬底上沉积粘合剂层来制造半导体器件。 在粘合剂层上形成第一导电层。 聚合物柱形成在第一导电层上。 在聚合物柱上方形成第二导电层以产生具有内聚合物芯的导电柱。 半导体管芯或部件安装在衬底上。 密封剂沉积在半导体管芯或部件上并且围绕导电柱。 第一互连结构形成在密封剂的第一侧上。 第一互连结构电连接到导电柱。 去除牺牲基底和粘合剂层。 在与第一互连结构相对的密封剂的第二侧上形成第二互连结构。 第二互连结构电连接到导电柱。

公开(公告)号：US20130285236A1

公开(公告)日：2013-10-31

申请号：US13933406

申请日：2013-07-02

Applicant: STATS ChipPAC, Ltd.

Inventor： Pandi C. Marimuthu ,  Shuangwu Huang ,  Nathapong Suthiwongsunthorn

IPC: H01L21/768 ,  H01L23/498

CPC classification number: H01L21/76898 ,  H01L21/302 ,  H01L21/56 ,  H01L21/561 ,  H01L21/76885 ,  H01L23/3114 ,  H01L23/481 ,  H01L23/49811 ,  H01L24/02 ,  H01L24/04 ,  H01L24/05 ,  H01L24/06 ,  H01L24/10 ,  H01L24/11 ,  H01L24/12 ,  H01L24/13 ,  H01L24/14 ,  H01L24/16 ,  H01L24/48 ,  H01L25/0657 ,  H01L25/105 ,  H01L2224/02166 ,  H01L2224/02181 ,  H01L2224/0391 ,  H01L2224/0401 ,  H01L2224/05083 ,  H01L2224/0557 ,  H01L2224/05572 ,  H01L2224/06181 ,  H01L2224/10125 ,  H01L2224/1184 ,  H01L2224/11901 ,  H01L2224/13009 ,  H01L2224/1301 ,  H01L2224/13025 ,  H01L2224/13027 ,  H01L2224/13082 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1403 ,  H01L2224/14104 ,  H01L2224/14181 ,  H01L2224/16145 ,  H01L2224/48 ,  H01L2224/73265 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/1058 ,  H01L2924/00013 ,  H01L2924/00014 ,  H01L2924/0002 ,  H01L2924/01013 ,  H01L2924/01022 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15174 ,  H01L2924/181 ,  H01L2924/1815 ,  H01L2924/182 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2224/13099 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2224/05552 ,  H01L2224/11849 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has a conductive via in a first surface of a substrate. A first interconnect structure is formed over the first surface of the substrate. A first bump is formed over the first interconnect structure. The first bump is formed over or offset from the conductive via. An encapsulant is deposited over the first bump and first interconnect structure. A portion of the encapsulant is removed to expose the first bump. A portion of a second surface of the substrate is removed to expose the conductive via. The encapsulant provides structural support and eliminates the need for a separate carrier wafer when thinning the substrate. A second interconnect structure is formed over the second surface of the substrate. A second bump is formed over the first bump. A plurality of semiconductor devices can be stacked and electrically connected through the conductive via.

Abstract translation: 半导体器件在衬底的第一表面中具有导电通孔。 在衬底的第一表面上形成第一互连结构。 在第一互连结构上形成第一凸点。 第一凸起形成在导电通孔上方或偏离导电通孔。 密封剂沉积在第一凸起和第一互连结构之上。 去除一部分密封剂以露出第一凸块。 去除衬底的第二表面的一部分以暴露导电通孔。 密封剂提供结构支撑，并且在使衬底变薄时不需要单独的载体晶片。 第二互连结构形成在衬底的第二表面上。 在第一凸起上形成第二凸点。 多个半导体器件可以通过导电通孔堆叠并电连接。