Semiconductor integrated device and wiring correction arrangement
therefor
    7.
    发明授权
    Semiconductor integrated device and wiring correction arrangement therefor 失效
    半导体集成器件及其布线校正装置

    公开(公告)号:US5289416A

    公开(公告)日:1994-02-22

    申请号:US820489

    申请日:1992-01-14

    摘要: An arrangement is provided for preventing DC defects in a memory or logic device after switching to a redundant circuit, improving the product yield of the device by cutting a leakage current path through a defective element or circuit. The cutting points formed by the predetermined wirings as a whole or a part thereof are provided to the device. A probe test of the formed chip is executed under the wafer condition by predetermined test equipment, and wiring correction data regarding the cutting of the cutting points is generated based on the result of test. Moreover, this wiring correction data is transmitted in an on-line fashion to the wiring correction equipment so that the corresponding cutting points can be cut. The wiring correction equipment can be formed by an EB direct writing apparatus, an FIB apparatus or a laser repair apparatus. With this arrangement, the leakage current path formed by a defective element or circuit left unused in conventional circuits is cut, and the product yield of the device is raised significantly. This arrangement can be used for a variety of memory or logic devices, including DRAMs, SRAMs, multiport memories and gate arrays.

    摘要翻译: 提供一种用于在切换到冗余电路之后防止存储器或逻辑器件中的DC缺陷的布置,通过切断通过故障元件或电路的漏电流路径来提高器件的产品产量。 由该预定布线整体形成的切割点或其一部分设置在该装置上。 通过预定的测试设备在晶片状态下执行形成的芯片的探针测试,并且基于测试结果产生关于切割点的切割的布线校正数据。 此外,该布线校正数据以线上方式发送到布线校正设备,使得可以切割相应的切割点。 布线校正装置可以由EB直接书写装置,FIB装置或激光修复装置形成。 利用这种布置,切割由常规电路中未使用的缺陷元件或电路形成的漏电流路径,并且显着提高器件的产品产量。 这种布置可以用于各种存储器或逻辑器件,包括DRAM,SRAM,多端口存储器和门阵列。

    Semiconductor integrated device and wiring correction arrangement
therefor
    8.
    发明授权
    Semiconductor integrated device and wiring correction arrangement therefor 失效
    半导体集成器件及其布线校正装置

    公开(公告)号:US5483490A

    公开(公告)日:1996-01-09

    申请号:US159619

    申请日:1993-12-01

    摘要: An arrangement is provided for preventing DC defects in a memory or logic device after switching to a redundant circuit, improving the product yield of the device by cutting a leakage current path through a defective element or circuit. The cutting points formed by the predetermined wirings as a whole or a part thereof are provided to the device. A probe test of the formed chip is executed under the wafer condition by predetermined test equipment, and wiring correction data regarding the cutting of the cutting points is generated based on the result of test. Moreover, this wiring correction data is transmitted in an on-line fashion to the wiring correction equipment so that the corresponding cutting points can be cut. The wiring correction equipment can be formed by an EB direct writing apparatus, an FIB apparatus or a laser repair apparatus. With this arrangement, the leakage current path formed by a defective element or circuit left unused in conventional circuits is cut, and the product yield of the device is raised significantly. This arrangement can be used for a variety of memory or logic devices, including DRAMs, SRAMs, multiport memories and gate arrays.

    摘要翻译: 提供一种用于在切换到冗余电路之后防止存储器或逻辑器件中的DC缺陷的布置,通过切断通过故障元件或电路的漏电流路径来提高器件的产品产量。 由该预定布线整体形成的切割点或其一部分设置在该装置上。 通过预定的测试设备在晶片状态下执行形成的芯片的探针测试,并且基于测试结果产生关于切割点的切割的布线校正数据。 此外,该布线校正数据以线上方式发送到布线校正设备,使得可以切割相应的切割点。 布线校正装置可以由EB直接书写装置,FIB装置或激光修复装置形成。 利用这种布置,切割由常规电路中未使用的缺陷元件或电路形成的漏电流路径,并且显着提高器件的产品产量。 这种布置可以用于各种存储器或逻辑器件,包括DRAM,SRAM,多端口存储器和门阵列。

    Method of making mask pattern data and process for manufacturing the mask
    10.
    发明授权
    Method of making mask pattern data and process for manufacturing the mask 失效
    制作掩模图案数据的方法和用于制造掩模的工艺

    公开(公告)号:US5458998A

    公开(公告)日:1995-10-17

    申请号:US886403

    申请日:1992-05-21

    CPC分类号: G03F1/26 G03F1/29 G03F1/84

    摘要: Pattern data of a phase shift mask can be inspected: (101) by separating and laying out pattern data of a phase shift mask in an actual pattern data layer, an auxiliary pattern data layer and a phase shift pattern data layer; (102) by inspecting and correcting only the data of the actual pattern of the actual pattern data layer; (108) by making data of an estimated pattern estimated to be transferred to a semiconductor wafer from the data of the synthetic data of the correct actual pattern data, the auxiliary pattern data and the phase shift pattern data, which are inspected and corrected; and (104) by comparing the estimated pattern data and the actual pattern data to inspect the data of the auxiliary pattern and the phase shift pattern.

    摘要翻译: 可以检查相移掩模的图案数据:(101)通过在实际图案数据层,辅助图案数据层和相移图案数据层中分离和布置相移掩模的图案数据; (102),通过检查和校正实际图案数据层的实际图案的数据; (108)通过从被检查和校正的正确的实际图案数据,辅助图案数据和相移图案数据的合成数据的数据中制作估计传送到半导体晶片的估计图案的数据; 和(104)通过比较估计的图案数据和实际图案数据来检查辅助图案和相移图案的数据。