P-N junction devices with group IV element-doped group III-V compound
semiconductors
    4.
    发明授权
    P-N junction devices with group IV element-doped group III-V compound semiconductors 失效
    具有IV族元素掺杂III-V族化合物半导体的P-N结器件

    公开(公告)号:US5268582A

    公开(公告)日:1993-12-07

    申请号:US934840

    申请日:1992-06-24

    摘要: This invention embodies p-n junction devices comprising Group III-V compound semiconductors in which the p or n or both p and n regions are formed by a superlattice selectively doped with an amphoteric Group IV element dopant selected from carbon, germanium and silicone. The superlattice includes a plurality of periods, each including two layers. Depending on the conductivity type, only one of the layers in the periods forming the superlattice region of said type of conductivity is selectively doped with said dopant, leaving the other layer in these periods undoped. The superlattice is formed by Molecular Beam Epitaxy technique, and the dopant is incorporated into respective layers by delta-doping as in a sheet centrally deposited between monolayers forming the respective layers of the period. Each period includes 5 to 15 monolayers deposited in the two layers in a numerical ratio corresponding to a cation compositional ratio in the compound semiconductor. Low growth temperatures, e.g. ranging from 410.degree. to 450.degree. C. lead to mirror-like surfaces. For a compound semiconductor Ga.sub.0.47 In.sub.0.53 As, the GaAs/InAs ordered superlattices with eight monolayers per period are grown in a ratio of 0.47/0.53. At free carrier concentrations of 10.sup.16 cm.sup. -3, carrier mobilities of 200 and 2300 cm.sup.2 /Vs for p-type and n-type are obtained with carbon as the amphoteric dopant.

    摘要翻译: 本发明体现了包含III-V族化合物半导体的p-n结器件,其中通过选择性掺杂有选自碳,锗和硅树脂的两性IV族元素掺杂剂的超晶格形成p或n或者p和n区。 超晶格包括多个周期,每个周期包括两个层。 根据导电类型,形成所述导电类型的超晶格区域的周期中只有一个层选择性地掺杂有所述掺杂剂,在这些时间段内不再掺杂另一层。 超晶格是通过分子束外延技术形成的,并且掺杂剂通过δ-掺杂结合到相应的层中,如在中间沉积在形成该周期的各个层的单层之间的薄片中。 每个周期包括以对应于化合物半导体中的阳离子组成比的数​​值比在两层中沉积的5至15个单层。 低生长温度,例如 范围从410°至450°C,导致镜面状。 对于化合物半导体Ga 0.47 In 0.53As,以每个周期8个单层的GaAs / InAs有序超晶格以0.47 / 0.53的比例生长。 在1016cm -3的自由载流子浓度下,以碳为两性掺杂剂获得p型和n型的载流子迁移率为200和2300cm2 / Vs。

    Single mirror light-emitting diodes with enhanced intensity
    6.
    发明授权
    Single mirror light-emitting diodes with enhanced intensity 失效
    单镜子发光二极管具有增强的强度

    公开(公告)号:US5362977A

    公开(公告)日:1994-11-08

    申请号:US997415

    申请日:1992-12-28

    摘要: This invention embodies single mirror light-emitting diodes (LEDs) with enhanced intensity. The LEDs are Group III-V and/or II-IV compound semiconductor structures with a single metallic mirror. The enhanced intensity is obtained by placing an active region of the LED having from two to ten, preferably from four to eight, quantum wells at an anti-node of the optical node of the device created by a nearby metallic mirror. Such multiquantum well LED structures exhibit enhanced efficiencies approaching that of a perfect isotropic emitter.

    摘要翻译: 本发明体现了具有增强强度的单镜面发光二极管(LED)。 LED是具有单个金属镜的III-V族和/或II-IV族化合物半导体结构。 通过在由附近的金属镜产生的装置的光学节点的反节点处放置具有二至十个,优选四至八个量子阱的LED的有源区域来获得增强的强度。 这种多量子阱LED结构表现出提高的效率接近完美的各向同性发射器的效率。

    Optical devices with electron-beam evaporated multilayer mirror
    7.
    发明授权
    Optical devices with electron-beam evaporated multilayer mirror 失效
    具有电子束蒸发多层镜的光学器件

    公开(公告)号:US5206871A

    公开(公告)日:1993-04-27

    申请号:US815311

    申请日:1991-12-27

    IPC分类号: H01S5/00 H01S5/028 H01S5/183

    CPC分类号: H01S5/18361

    摘要: This invention embodies a Vertical Cavity Surface Emitting Laser with a top mirror comprising at least one pair of quarterwave layers, each pair consisting of a low index of refraction layer and a high index of refraction layer, the high index of refraction layer being a semiconductor chosen from GaP and ZnS and the low index of refraction layer being chosen from borosilicate glass (BSG) CaF.sub.2,MgF.sub.2 and NaF. Especially useful in vertical cavity surface emitting lasers are mirrors formed by a stack of a plurality of pairs of GaP/BSG or ZnS/CdF.sub.2. Such mirrors have a high reflectivity characteristics required for an efficient operation of the laser. The GaP/BSG or ZnS/CaF.sub.2 mirror structure represents a considerable improvement over previous designs for VCSELs in terms of ultimate reflectivity, low loss, and post growth processing compatibility.

    Erbium doped optical devices
    9.
    发明授权
    Erbium doped optical devices 失效
    掺铒光器件

    公开(公告)号:US5249195A

    公开(公告)日:1993-09-28

    申请号:US906910

    申请日:1992-06-30

    摘要: This invention embodies an optical device with a Fabry-Perot cavity formed by two reflective mirrors and an active layer which is doped with a rare earth element selected from lanthanide series elements with number 57 through 71. The thickness of the active layer being a whole number multiple of .lambda./2 wherein .lambda. is the operating, or emissive, wavelength of the device, said whole number being one of the numbers ranging from 1 to 5, the fundamental mode of the cavity being in resonance with the emission wavelength of said selected rare earth element. Cavity-quality factors exceeding Q=300 and finesses of 73 are achieved with structures consisting of two Si/SiO.sub.2 distributed Bragg reflector (DBR) mirrors and an Er-implanted (.lambda./2) SiO.sub.2 active region. The bottom DBR mirror consists of four pairs and the upper DBR mirror consists of two-and-a half pairs of quarterwave (.lambda./4) layers of Si and SiO.sub.2. Photoluminescence at room temperature reveals a drastic enhancement of the luminescence intensity of the cavity emitted along the optical axis of the cavity versus the luminescence without the top mirror. The luminescence intensity of the cavity is typically 1-2 orders of magnitudes higher as compared to structures without a cavity. Furthermore, since the emission wavelength and the intensity decrease for off-normal emission angles, the change in emission wavelength can be quantitatively described by assuming that the on-axis component of the optical wave is resonant with the cavity.