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公开(公告)号:US11901319B2
公开(公告)日:2024-02-13
申请号:US17233967
申请日:2021-04-19
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hui-Min Huang , Chih-Wei Lin , Tsai-Tsung Tsai , Ming-Da Cheng , Chung-Shi Liu , Chen-Hua Yu
IPC: H01L23/538 , H01L23/31 , H01L21/56 , H01L21/48 , H01L23/498 , H01L23/48 , H01L23/00
CPC classification number: H01L24/05 , H01L21/481 , H01L21/486 , H01L21/56 , H01L21/561 , H01L23/3114 , H01L23/3135 , H01L23/481 , H01L23/49811 , H01L23/49833 , H01L23/49838 , H01L23/49861 , H01L23/49866 , H01L23/5389 , H01L24/07 , H01L24/13 , H01L24/19 , H01L24/96 , H01L21/568 , H01L23/49827 , H01L2224/0239 , H01L2224/02372 , H01L2224/0401 , H01L2224/05083 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05166 , H01L2224/05171 , H01L2224/05184 , H01L2224/12105 , H01L2224/13111 , H01L2224/13139 , H01L2224/13147 , H01L2224/2919 , H01L2224/2929 , H01L2224/29386 , H01L2224/83191 , H01L2224/94 , H01L2924/01029 , H01L2924/18162 , H01L2224/94 , H01L2224/03 , H01L2224/94 , H01L2224/27
Abstract: A first protective layer is formed on a first die and a second die, and openings are formed within the first protective layer. The first die and the second die are encapsulated such that the encapsulant is thicker than the first die and the second die, and vias are formed within the openings. A redistribution layer can also be formed to extend over the encapsulant, and the first die may be separated from the second die.
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公开(公告)号:US09947552B2
公开(公告)日:2018-04-17
申请号:US15195321
申请日:2016-06-28
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Shing-Chao Chen , Chih-Wei Lin , Meng-Tse Chen , Hui-Min Huang , Ming-Da Cheng , Kuo-Lung Pan , Wei-Sen Chang , Tin-Hao Kuo , Hao-Yi Tsai
CPC classification number: H01L21/566 , H01L21/486 , H01L21/561 , H01L21/568 , H01L23/3114 , H01L23/3128 , H01L23/315 , H01L23/585 , H01L24/19 , H01L24/20 , H01L25/105 , H01L25/50 , H01L2224/04105 , H01L2224/12105 , H01L2224/16227 , H01L2224/16235 , H01L2224/32225 , H01L2224/73267 , H01L2224/83005 , H01L2224/92244 , H01L2224/97 , H01L2225/1035 , H01L2225/1041 , H01L2225/1058 , H01L2924/18162 , H01L2224/83 , H01L2224/81
Abstract: Structures and formation methods of a chip package are provided. The method includes forming multiple conductive structures over a carrier substrate and disposing a semiconductor die over the carrier substrate. The method also includes disposing a mold over the carrier substrate. The method further includes forming a protection layer between the mold and the carrier substrate to surround the semiconductor die and the conductive structures. In addition, the method includes removing the mold.
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公开(公告)号:US12009345B2
公开(公告)日:2024-06-11
申请号:US18149509
申请日:2023-01-03
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Meng-Tse Chen , Chung-Shi Liu , Chih-Wei Lin , Hui-Min Huang , Hsuan-Ting Kuo , Ming-Da Cheng
IPC: H01L23/02 , H01L21/56 , H01L21/768 , H01L23/00 , H01L23/31 , H01L23/538 , H01L25/00 , H01L25/065
CPC classification number: H01L25/0657 , H01L21/565 , H01L21/568 , H01L21/76804 , H01L21/7684 , H01L21/76883 , H01L23/3128 , H01L23/5389 , H01L24/19 , H01L24/20 , H01L25/0652 , H01L25/50 , H01L2224/04105 , H01L2224/12105 , H01L2224/18 , H01L2224/24226 , H01L2224/32225 , H01L2224/73267 , H01L2224/92244 , H01L2225/06524 , H01L2225/06548 , H01L2225/06586
Abstract: An embodiment is method including forming a first die package over a carrier substrate, the first die package comprising a first die, forming a first redistribution layer over and coupled to the first die, the first redistribution layer including one or more metal layers disposed in one or more dielectric layers, adhering a second die over the redistribution layer, laminating a first dielectric material over the second die and the first redistribution layer, forming first vias through the first dielectric material to the second die and forming second vias through the first dielectric material to the first redistribution layer, and forming a second redistribution layer over the first dielectric material and over and coupled to the first vias and the second vias.
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公开(公告)号:US20230154896A1
公开(公告)日:2023-05-18
申请号:US18149509
申请日:2023-01-03
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Meng-Tse Chen , Chung-Shi Liu , Chih-Wei Lin , Hui-Min Huang , Hsuan-Ting Kuo , Ming-Da Cheng
IPC: H01L25/065 , H01L21/56 , H01L25/00 , H01L21/768 , H01L23/31 , H01L23/538 , H01L23/00
CPC classification number: H01L25/0657 , H01L21/568 , H01L25/50 , H01L21/565 , H01L21/76804 , H01L21/7684 , H01L21/76883 , H01L25/0652 , H01L23/3128 , H01L23/5389 , H01L24/19 , H01L24/20 , H01L2225/06548 , H01L2225/06586 , H01L2225/06524 , H01L2224/18 , H01L2224/04105 , H01L2224/24226 , H01L2224/32225 , H01L2224/73267 , H01L2224/92244 , H01L2224/12105
Abstract: An embodiment is method including forming a first die package over a carrier substrate, the first die package comprising a first die, forming a first redistribution layer over and coupled to the first die, the first redistribution layer including one or more metal layers disposed in one or more dielectric layers, adhering a second die over the redistribution layer, laminating a first dielectric material over the second die and the first redistribution layer, forming first vias through the first dielectric material to the second die and forming second vias through the first dielectric material to the first redistribution layer, and forming a second redistribution layer over the first dielectric material and over and coupled to the first vias and the second vias.
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公开(公告)号:US11171100B2
公开(公告)日:2021-11-09
申请号:US16697629
申请日:2019-11-27
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hui-Min Huang , Wei-Hung Lin , Wen-Hsiung Lu , Ming-Da Cheng , Chang-Jung Hsueh , Kuan-Liang Lai
IPC: H01L23/00
Abstract: Structures and formation methods of a semiconductor device structure are provided. The method includes forming a seed layer to cover a first passivation layer over a semiconductor substrate. The method also includes forming a metal layer to partially cover the seed layer by using the seed layer as an electrode layer in a first plating process and forming a metal pillar bump over the metal layer by using the seed layer as an electrode layer in a second plating process. In addition, the method includes forming a second passivation layer over the metal layer, wherein the second passivation layer includes a protrusion portion extending from a top surface of the second passivation layer and surrounding the sidewall of the metal pillar bump.
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公开(公告)号:US20210091047A1
公开(公告)日:2021-03-25
申请号:US17113676
申请日:2020-12-07
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Meng-Tse Chen , Chung-Shi Liu , Chih-Wei Lin , Hui-Min Huang , Hsuan-Ting Kuo , Ming-Da Cheng
IPC: H01L25/065 , H01L21/56 , H01L25/00 , H01L21/768 , H01L23/31 , H01L23/538 , H01L23/00
Abstract: An embodiment is method including forming a first die package over a carrier substrate, the first die package comprising a first die, forming a first redistribution layer over and coupled to the first die, the first redistribution layer including one or more metal layers disposed in one or more dielectric layers, adhering a second die over the redistribution layer, laminating a first dielectric material over the second die and the first redistribution layer, forming first vias through the first dielectric material to the second die and forming second vias through the first dielectric material to the first redistribution layer, and forming a second redistribution layer over the first dielectric material and over and coupled to the first vias and the second vias.
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公开(公告)号:US09627355B2
公开(公告)日:2017-04-18
申请号:US15143892
申请日:2016-05-02
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Meng-Tse Chen , Yu-Chih Liu , Hui-Min Huang , Wei-Hung Lin , Jing Ruei Lu , Ming-Da Cheng , Chung-Shi Liu
IPC: H01L25/065 , H01L23/31 , H01L23/00 , H01L21/56 , H01L25/00
CPC classification number: H01L25/0652 , H01L21/561 , H01L21/563 , H01L23/00 , H01L23/293 , H01L23/3121 , H01L23/562 , H01L24/17 , H01L25/0655 , H01L25/50 , H01L2224/16 , H01L2224/32225 , H01L2224/73204 , H01L2224/92125 , H01L2225/06513 , H01L2225/06517 , H01L2225/06555 , H01L2225/06582 , H01L2924/15311
Abstract: A package on package structure providing mechanical strength and warpage control includes a first package component coupled to a second package component by a first set of conductive elements. A first polymer-comprising material is arranged between the first package component and the second package component. The first polymer-comprising material surrounds the first set of conductive elements and the second package component. A third package component is coupled to the second package component by a second set of conductive elements. An underfill is arranged on the second package component and surrounds the second set of conductive elements. The first polymer-comprising material extends past sidewalls of the underfill.
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公开(公告)号:US20220262694A1
公开(公告)日:2022-08-18
申请号:US17318703
申请日:2021-05-12
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chen-Shien Chen , Kuo-Ching Hsu , Wei-Hung Lin , Hui-Min Huang , Ming-Da Cheng , Mirng-Ji Lii
IPC: H01L23/31 , H01L21/56 , H01L23/00 , H01L23/538
Abstract: A method includes forming a reconstructed package substrate, which includes placing a plurality of substrate blocks over a carrier, encapsulating the plurality of substrate blocks in an encapsulant, planarizing the encapsulant and the plurality of substrate blocks to reveal redistribution lines in the plurality of substrate blocks, and forming a redistribution structure overlapping both of the plurality of substrate blocks and encapsulant. A package component is bonded over the reconstructed package substrate.
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公开(公告)号:US11094655B2
公开(公告)日:2021-08-17
申请号:US16439957
申请日:2019-06-13
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wen-Hsiung Lu , Chang-Jung Hsueh , Chin-Wei Kang , Hui-Min Huang , Wei-Hung Lin , Cheng-Jen Lin , Ming-Da Cheng , Chien-Chun Wang
IPC: H01L21/768 , H01L23/528 , H01L23/00 , H01L21/683
Abstract: A method for forming a semiconductor structure is provided. The method includes forming a seed layer over a substrate and forming a first mask layer over the seed layer. The method also includes forming a first trench and a second trench in the first mask layer and forming a first conductive material in the first trench and the second trench. The method further includes forming a second mask layer in the first trench and over the first conductive material, and forming a second conductive material in the second trench and on the first conductive material. A first conductive connector is formed in the first trench with a first height, a second conductive connector is formed in the second trench with a second height, and the second height is greater than the first height.
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公开(公告)号:US10269763B2
公开(公告)日:2019-04-23
申请号:US15461796
申请日:2017-03-17
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Meng-Tse Chen , Yu-Chih Liu , Hui-Min Huang , Wei-Hung Lin , Jing Ruei Lu , Ming-Da Cheng , Chung-Shi Liu
Abstract: The present disclosure relates to a package-on-package structure providing mechanical strength and warpage control. In some embodiments, the package-on-package structure includes a first set of conductive elements coupling a first package component to a second package component. A first molding material is arranged on the first package component. The first molding material surrounds the first set of conductive elements and outer sidewalls of the second package component and has a top surface below a top surface of the second package component. The stacked integrated chip structure further includes a second set of conductive elements that couples the second package component to a third package component.
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