Photosensitive polyimide compositions
    3.
    发明申请
    Photosensitive polyimide compositions 审中-公开
    光敏聚酰亚胺组合物

    公开(公告)号:US20070083016A1

    公开(公告)日:2007-04-12

    申请号:US11414351

    申请日:2006-05-01

    IPC分类号: C08L79/08 B32B27/00

    摘要: A photosensitive resin composition comprising a pre-imidized aromatic polyimide, which when coated on a silicon wafer, has a light transmittance at a wavelength of 365 nm of at least 1% and imparts low residual stress after cure. The composition can be patterned through I-line exposure followed by development with organic or alkaline solutions, and can be cured at relatively mild temperature to yield low-stress polyimide patterns. Electronic components having the polyimide patterns have high reliability.

    摘要翻译: 一种包含预酰亚胺化的芳族聚酰亚胺的感光性树脂组合物,当涂覆在硅晶片上时,在365nm的波长下的透光率至少为1%,并且在固化后赋予较低的残留应力。 组合物可以通过I线曝光进行图案化,然后用有机或碱性溶液显影,并且可以在相对温和的温度下固化以产生低应力聚酰亚胺图案。 具有聚酰亚胺图案的电子元件具有高可靠性。