Safety switch for a safety circuit
    9.
    发明授权
    Safety switch for a safety circuit 有权
    安全开关用于安全电路

    公开(公告)号:US07656629B2

    公开(公告)日:2010-02-02

    申请号:US11581039

    申请日:2006-10-13

    IPC分类号: H02H7/00

    摘要: A safety switch for safety circuit arrangement has a control part for processing an input signal and at least one switching element with at least one active and one inactive switching state. The control part controls the switching element in order to generate an output signal dependent on the input signal at an output. In addition, the safety switch has a diagnostic function for identifying a functional fault. The control part is configured to transfer the switching element into the inactive state when a functional fault is identified. According to one aspect of the invention, the control part is also configured to generate a data message at the output, which data message is dependent on the functional fault.

    摘要翻译: 用于安全电路装置的安全开关具有用于处理输入信号的控制部分和具有至少一个有效和无效切换状态的至少一个开关元件。 控制部分控制开关元件,以便根据输出端的输入信号产生输出信号。 另外,安全开关具有识别功能故障的诊断功能。 控制部分被配置为当识别功能故障时将开关元件传送到非活动状态。 根据本发明的一个方面,控制部分还被配置为在输出端生成数据消息,该数据消息取决于功能故障。

    SEMICONDUCTOR DEVICE AND METHOD FOR FORMING SAME
    10.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD FOR FORMING SAME 有权
    半导体器件及其形成方法

    公开(公告)号:US20090032848A1

    公开(公告)日:2009-02-05

    申请号:US11830542

    申请日:2007-07-30

    摘要: A method for manufacturing a semiconductor device. The method includes providing a semiconductor body of a conductivity type, wherein the semiconductor body comprises a first surface. At least one buried region of a second conductivity type is formed in the semiconductor body and at least a surface region of the second conductivity type is formed at the first surface of the semiconductor body, wherein the buried region and the surface region are formed such that they are spaced apart from each other. The buried region is formed by deep implantation of a first dopant of the second conductivity type.

    摘要翻译: 一种半导体器件的制造方法。 该方法包括提供导电类型的半导体本体,其中半导体主体包括第一表面。 在半导体本体中形成至少一个第二导电类型的掩埋区域,并且至少在第二导电类型的表面区域形成在半导体本体的第一表面处,其中形成掩埋区域和表面区域使得 它们彼此间隔开。 埋入区域通过深度注入第二导电类型的第一掺杂剂形成。