Connector for differential-mode transmission line providing virtual ground
    3.
    发明授权
    Connector for differential-mode transmission line providing virtual ground 有权
    差分模式传输线连接器提供虚拟接地

    公开(公告)号:US06677832B1

    公开(公告)日:2004-01-13

    申请号:US09698582

    申请日:2000-10-27

    IPC分类号: H01P500

    CPC分类号: H01P3/003

    摘要: An electrical connecting element is disclosed comprised of a dielectric substrate having two conductor paths disposed on opposite sides and being substantially aligned with one another. The electrical connecting element employs differential-mode signaling such that the first conductor path carries a signal of opposite polarity to the second conductor path. A virtual ground exists between the differential + and − lines that permits an otherwise “groundless” differential transmission line. The substantial alignment of the first and second conductor paths improves the space constraints, relative to conventional electrical connecting elements. The characteristic impedance of the disclosed differential transmission line depends on the width of the trace lines the thickness of the dielectric substrate.

    摘要翻译: 公开了一种电连接元件,其包括具有设置在相对侧并且基本上彼此对准的两个导体路径的电介质基板。 电连接元件使用差模信号,使得第一导体路径承载与第二导体路径相反极性的信号。 在差分+和 - 线之间存在虚拟地,允许另外“无理”的差分传输线。 相对于传统的电连接元件,第一和第二导体路径的基本对准改善了空间限制。 所公开的差分传输线的特性阻抗取决于迹线的宽度,介电基片的厚度。

    Patch antenna
    4.
    发明授权
    Patch antenna 有权
    补片天线

    公开(公告)号:US06404389B1

    公开(公告)日:2002-06-11

    申请号:US09425368

    申请日:1999-10-22

    IPC分类号: H01Q138

    摘要: An inexpensive, easy to assemble patch antenna is disclosed where unwanted polarizations in the transmitted RF energy are minimized. A feedboard, spacer and resonator are held in a compressed relationship by two halves of the antenna housing. The spacer is a thermo-formed sheet with semi-spherical spacers. The spacers have a height that provides the desired spacing between the feedboard and the resonator.

    摘要翻译: 公开了一种便宜且易于组装的贴片天线,其中发射的RF能量中的不需要的极化最小化。 馈电板,间隔件和谐振器由天线外壳的两半保持在压缩关系中。 间隔物是具有半球形间隔物的热成型片。 间隔件具有在馈送板和谐振器之间提供所需间隔的高度。

    Patch antenna using non-conductive thermo form frame
    7.
    发明授权
    Patch antenna using non-conductive thermo form frame 有权
    贴片天线采用非导电热成型框架

    公开(公告)号:US06407704B1

    公开(公告)日:2002-06-18

    申请号:US09425373

    申请日:1999-10-22

    IPC分类号: H01Q138

    摘要: A patch antenna's resonators are supported by a non-conductive frame. The frame supports the resonators without making holes in the resonators and thereby avoids the problem of creating unwanted electric field polarizations. Additionally, the frame grasps the resonators in areas of low current density and thereby avoids creating additional disturbances in the radiation pattern. In one embodiment of the invention, the frame includes a perimeter lip that snaps over the edges of the feedboard and thereby attaches the frame to the feedboard.

    摘要翻译: 贴片天线的谐振器由非导电框架支撑。 该框架支撑谐振器而不在谐振器中产生孔,从而避免产生不需要的电场偏振的问题。 此外,框架在低电流密度区域中抓住谐振器,从而避免在辐射图中产生额外的干扰。 在本发明的一个实施例中,所述框架包括周边唇缘,所述​​周边唇缘卡扣在所述馈送板的边缘上,从而将所述框架附接到所述馈送板。

    Process for device fabrication in which the plasma etch is controlled by
monitoring optical emission
    10.
    发明授权
    Process for device fabrication in which the plasma etch is controlled by monitoring optical emission 失效
    通过监测光发射来控制等离子体蚀刻的器件制造工艺

    公开(公告)号:US5877032A

    公开(公告)日:1999-03-02

    申请号:US703756

    申请日:1996-08-27

    摘要: The present invention is directed to a process for device fabrication in which a pattern is transferred from a photoresist mask into an underlying layer of silicon dioxide. A plasma containing a fluorocarbon gas is used to etch the pattern into the underlying silicon dioxide layer. The plasma is monitored using optical emission spectroscopy to effect control of the etch process. The optical emission is monitored at select wavelengths. To control the process based on an observation of photoresist etch rate, two wavelengths are monitored. One is associated with a species that is produced by the interaction between the photoresist and the plasma, and one is associated with a species related to the plasma intensity. The ratio of the optical intensity at these two wavelengths is determined in real time during processing, and the ratio is associated with acceptable process conditions by referring to a predetermined calibration curve that associates a particular ratio with a particular photoresist etch rate for a given set of process conditions. If the ratio is observed to not be within a certain range of ratios determined to indicate acceptable process conditions, the plasma conditions are either changed to bring the ratio back within the desired range, or the process is stopped until the problem is corrected. To control the process based on an observation of contact hole etch rate, a wavelength associated with one species in the plasma is monitored at two different times during the etch. A ratio of the measured intensity at these two different times is obtained. Calibration information is then used to determine if the ratio indicates that the process is proceeding acceptably. If the ratio is not within the acceptable range, remedial action is taken.

    摘要翻译: 本发明涉及一种器件制造方法,其中将图案从光致抗蚀剂掩模转移到二氧化硅的下层中。 使用包含碳氟化合物气体的等离子体将图案蚀刻到下面的二氧化硅层中。 使用光发射光谱监测等离子体以实现蚀刻过程的控制。 在选择的波长处监测光发射。 为了基于光致抗蚀剂蚀刻速率的观察来控制工艺,监测两个波长。 一个与通过光致抗蚀剂和等离子体之间的相互作用产生的物质相关联,并且一个与与等离子体强度相关的物质相关联。 在这两个波长处的光强度的比率在处理期间实时地确定,并且该比率通过参考预定的校准曲线与可接受的工艺条件相关联,该预定校准曲线将特定比率与特定的光刻胶蚀刻速率相关联, 工艺条件。 如果观察到比率不在确定为表示可接受的工艺条件的一定比例范围内,则改变等离子体条件以使该比率回到期望的范围内,或者该过程停止直到问题得到纠正。 为了基于接触孔蚀刻速率的观察来控制工艺,在蚀刻期间在两个不同的时间监测与等离子体中的一种物质相关的波长。 获得这两个不同时间的测量强度的比率。 然后使用校准信息来确定该比率是否表明该过程正在可接受地进行。 如果比例不在可接受范围内,则采取补救措施。