摘要:
A heat transport structure is provided having a structural microtruss wick with a thermal transport medium associated with the microtruss wick for thermal energy transport by fluid and vapor transport between a heat source and a heat sink.
摘要:
In one possible implementation, a thermal plane structure includes a non-wicking structural microtruss between opposing surfaces of a multilayer structure and a thermal transport medium within the thermal plane structure for fluid and vapor transport between a thermal source and a thermal sink. A microtruss wick is located between the opposing surfaces and extends between the thermal source and the thermal sink.
摘要:
An electrical connecting element is disclosed comprised of a dielectric substrate having two conductor paths disposed on opposite sides and being substantially aligned with one another. The electrical connecting element employs differential-mode signaling such that the first conductor path carries a signal of opposite polarity to the second conductor path. A virtual ground exists between the differential + and − lines that permits an otherwise “groundless” differential transmission line. The substantial alignment of the first and second conductor paths improves the space constraints, relative to conventional electrical connecting elements. The characteristic impedance of the disclosed differential transmission line depends on the width of the trace lines the thickness of the dielectric substrate.
摘要:
An inexpensive, easy to assemble patch antenna is disclosed where unwanted polarizations in the transmitted RF energy are minimized. A feedboard, spacer and resonator are held in a compressed relationship by two halves of the antenna housing. The spacer is a thermo-formed sheet with semi-spherical spacers. The spacers have a height that provides the desired spacing between the feedboard and the resonator.
摘要:
A multi-layered semiconductor apparatus capable of producing at least 500 W of continuous power includes at least two device substrates arranged in a stack. Each of the at least two device substrates has a first side and a second side opposite to the first side, and each of the at least two device substrates is configured to produce an average power density higher than 100 W/cm2. A plurality of active devices are provided on the first side of each of the at least two device substrates. The plurality of active devices are radiatively coupled among the at least two device substrates. At least one of the at least two device substrates is structured to provide a plurality of cavities on its second side to receive corresponding ones of the plurality of active devices on the first side of an adjacent one of the at least two device substrates.
摘要翻译:能够产生至少500W的连续功率的多层半导体装置包括布置在堆叠中的至少两个器件衬底。 所述至少两个器件衬底中的每一个具有与第一侧相对的第一侧和第二侧,并且所述至少两个器件衬底中的每一个被配置为产生高于100W / cm 2的平均功率密度。 多个有源器件设置在至少两个器件衬底中的每一个的第一侧上。 多个有源器件辐射耦合在至少两个器件衬底之间。 所述至少两个器件衬底中的至少一个被构造成在其第二侧上提供多个空腔,以在所述至少两个器件衬底中相邻的器件衬底的第一侧上接收所述多个有源器件中的相应的空穴。
摘要:
An electrical assembly (300, 400) includes a power IC such as a MOSFET (112, 412) attached to a substrate module (114, 214). The MOSFET includes a top surface comprising first and second conductive device surfaces (A, B), associated with first and second device ports, and a bottom surface comprising a third conductive device surface C associated with a third device port. A first foil element is bonded to the first conductive device surface(s) A and to each of the first conductive substrate surfaces (A1, A2) and provides a continuous conductive pathway from each conductive surface (A) to each other conductive surface (A) and to each conductive surface (A1, A2). A second foil element is bonded to the second conductive device surface(s) B and to the second conductive substrate surface B1 and provides a continuous conductive pathway from each device conductive surface (B) to the substrate conductive surface (B1). A third foil element may be installed to electrically interconnect the discrete second device surfaces (B). The foil elements reduce interconnection parasitics and reduce charge and thermal energy density at device conductive surfaces as compared to wire bonded electrical interconnections. The foil elements may be comprised of formed metal elements that are flexible but sufficiently rigid to hold a formed shape or flexible foils supported on a flexible dielectric substrate.
摘要:
A patch antenna's resonators are supported by a non-conductive frame. The frame supports the resonators without making holes in the resonators and thereby avoids the problem of creating unwanted electric field polarizations. Additionally, the frame grasps the resonators in areas of low current density and thereby avoids creating additional disturbances in the radiation pattern. In one embodiment of the invention, the frame includes a perimeter lip that snaps over the edges of the feedboard and thereby attaches the frame to the feedboard.
摘要:
An electrical assembly (300, 400) includes a power IC such as a MOSFET (112, 412) attached to a substrate module (114, 214). The MOSFET includes a top surface comprising first and second conductive device surfaces (A, B), associated with first and second device ports, and a bottom surface comprising a third conductive device surface C associated with a third device port. A first foil element is bonded to the first conductive device surface(s) A and to each of the first conductive substrate surfaces (A1, A2) and provides a continuous conductive pathway from each conductive surface (A) to each other conductive surface (A) and to each conductive surface (A1, A2). A second foil element is bonded to the second conductive device surface(s) B and to the second conductive substrate surface B1 and provides a continuous conductive pathway from each device conductive surface (B) to the substrate conductive surface (B1). A third foil element may be installed to electrically interconnect the discrete second device surfaces (B). The foil elements reduce interconnection parasitics and reduce charge and thermal energy density at device conductive surfaces as compared to wire bonded electrical interconnections. The foil elements may be comprised of formed metal elements that are flexible but sufficiently rigid to hold a formed shape or flexible foils supported on a flexible dielectric substrate.
摘要:
A multi-layered semiconductor apparatus capable of producing at least 500 W of continuous power includes at least two device substrates arranged in a stack. Each of the at least two device substrates has a first side and a second side opposite to the first side, and each of the at least two device substrates is configured to produce an average power density higher than 100 W/cm2. A plurality of active devices are provided on the first side of each of the at least two device substrates. The plurality of active devices are radiatively coupled among the at least two device substrates. At least one of the at least two device substrates is structured to provide a plurality of cavities on its second side to receive corresponding ones of the plurality of active devices on the first side of an adjacent one of the at least two device substrates.
摘要翻译:能够产生至少500W的连续功率的多层半导体装置包括布置在堆叠中的至少两个器件衬底。 所述至少两个器件衬底中的每一个具有与第一侧相对的第一侧和第二侧,并且所述至少两个器件衬底中的每一个被配置为产生高于100W / cm 2的平均功率密度。 多个有源器件设置在至少两个器件衬底中的每一个的第一侧上。 多个有源器件辐射耦合在至少两个器件衬底之间。 所述至少两个器件衬底中的至少一个被构造成在其第二侧上提供多个空腔,以在所述至少两个器件衬底中相邻的器件衬底的第一侧上接收所述多个有源器件中的相应的空穴。
摘要:
The present invention is directed to a process for device fabrication in which a pattern is transferred from a photoresist mask into an underlying layer of silicon dioxide. A plasma containing a fluorocarbon gas is used to etch the pattern into the underlying silicon dioxide layer. The plasma is monitored using optical emission spectroscopy to effect control of the etch process. The optical emission is monitored at select wavelengths. To control the process based on an observation of photoresist etch rate, two wavelengths are monitored. One is associated with a species that is produced by the interaction between the photoresist and the plasma, and one is associated with a species related to the plasma intensity. The ratio of the optical intensity at these two wavelengths is determined in real time during processing, and the ratio is associated with acceptable process conditions by referring to a predetermined calibration curve that associates a particular ratio with a particular photoresist etch rate for a given set of process conditions. If the ratio is observed to not be within a certain range of ratios determined to indicate acceptable process conditions, the plasma conditions are either changed to bring the ratio back within the desired range, or the process is stopped until the problem is corrected. To control the process based on an observation of contact hole etch rate, a wavelength associated with one species in the plasma is monitored at two different times during the etch. A ratio of the measured intensity at these two different times is obtained. Calibration information is then used to determine if the ratio indicates that the process is proceeding acceptably. If the ratio is not within the acceptable range, remedial action is taken.