Extended lifetime dual indirectly-heated cathode ion source

    公开(公告)号:US11798775B2

    公开(公告)日:2023-10-24

    申请号:US17491084

    申请日:2021-09-30

    摘要: An ion source has an arc chamber with a first end and a second end. A first cathode at the first end of the arc chamber has a first cathode body and a first filament disposed within the first cathode body. A second cathode at the second end of the arc chamber has a second cathode body and a second filament disposed within the second cathode body. A filament switch selectively electrically couples a filament power supply to each of the first filament and the second filament, respectively, based on a position of the filament switch. A controller controls the position of the filament switch to alternate the electrical coupling of the filament power supply between the first filament and the second filament for a plurality of switching cycles based on predetermined criteria. The predetermined criteria can be a duration of operation of the first filament and second filament.

    Positive and negative ion source based on radio-frequency inductively coupled discharge

    公开(公告)号:US10204758B1

    公开(公告)日:2019-02-12

    申请号:US15725045

    申请日:2017-10-04

    发明人: Fei Gao Younian Wang

    摘要: The present invention discloses a positive and negative ion source based on radio-frequency inductively coupled discharge, comprising a tube, a middle portion of which is communicated with an intake pipe; discharge coils electrically connected to a matched network and a radio-frequency power supply successively are wound on the tube; one end of the tube is connected to a first cover plate in a sealed manner, and the first cover plate is connected with a positive ion extraction gate via an insulating medium; the positive ion extraction gate is electrically connected to a negative pole of a DC power supply; the other end of the tube is connected to a second cover plate in a sealed manner, the second cover plate is connected to a third cover plate in a sealed manner via a sidewall, and the third cover plate is connected with a negative ion extraction gate via an insulating medium; and the negative ion extraction gate is electrically connected to a positive pole of the DC power supply. In the present invention, the positive ions and the electrons and negative ions can be extracted simultaneously, and the problems of contamination of the ion source by particles sputtered from the backplane and overheating of the backplane are thus solved.

    Ion beam device
    5.
    发明授权
    Ion beam device 有权
    离子束装置

    公开(公告)号:US09508521B2

    公开(公告)日:2016-11-29

    申请号:US14328754

    申请日:2014-07-11

    摘要: An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being configured to surround the emitter tip (21), and a gas supply tube (25). A center axis line of the extraction electrode (24) overlaps or is parallel to a center axis line (14A) of the ion irradiation light system, and a center axis line (66) passing the emitter tip (21) and the emitter base mount (64) is inclinable with respect to a center axis line of the ionization chamber (15). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.

    摘要翻译: 根据本发明的离子束装置包括气体离子源(1),其包括由发射极基座(64)支撑的发射极尖端(21),包括引出电极(24)的电离室(15) 构造成围绕发射器尖端(21),以及气体供应管(25)。 引出电极(24)的中心轴线与离​​子照射光系统的中心轴线(14A)重叠或平行,通过发射极尖端(21)和发射极基座 (64)相对于所述电离室(15)的中心轴线是可倾斜的。 因此,提供了包括能够调节发射极尖端的方向的气体场离子源的离子束装置。

    Atmospheric electron particle beam generator
    6.
    发明授权
    Atmospheric electron particle beam generator 有权
    大气电子粒子束发生器

    公开(公告)号:US09443634B2

    公开(公告)日:2016-09-13

    申请号:US12544290

    申请日:2009-08-20

    IPC分类号: H01J27/00 G21K5/04 F22B1/28

    CPC分类号: G21K5/04 F22B1/281

    摘要: Provided is an atmospheric electron particle beam nozzle, with a nozzle body having a lumen disposed therethrough; an electrode that is disposed within the lumen, optionally concentrically with the nozzle body, to define an output chamber within the lumen that encompasses the electrode. Also provided is an atmospheric electron particle beam system that provides: a nozzle, that supplies a nozzle body having a lumen disposed therethrough; an electrode disposed within the lumen, optionally concentrically with the nozzle body, to define an output chamber; an RF generator that is in communication with a transformer having a number of turns and connected to a vacuum variable capacitor, and connected electrically to the electrode; and a fluid source that supplies the nozzle with a fluid. Also herein is a method of projecting an electron beam, by projecting an electron charged fluid sheath over a distance, and projecting the electron beam within the sheath.

    摘要翻译: 本发明提供一种大气电子粒子束喷嘴,具有设置在其中的内腔的喷嘴体; 设置在所述内腔内的电极,可选地与所述喷嘴主体同心地限定在所述内腔内包围所述电极的输出室。 还提供了一种大气电子粒子束系统,其提供:喷嘴,其供应具有通过其设置的腔的喷嘴体; 设置在所述内腔内的电极,可选地与所述喷嘴主体同心地限定输出室; RF发生器,其与具有匝数的变压器连通并连接到真空可变电容器,并且与电极电连接; 以及向喷嘴供应流体的流体源。 此外,本文还是通过将电子束流体护套投射一定距离并且将电子束投射到护套内的方法来投射电子束。

    Device for generating heavy-ion beam and method thereof
    10.
    发明授权
    Device for generating heavy-ion beam and method thereof 有权
    用于产生重离子束的装置及其方法

    公开(公告)号:US09117619B2

    公开(公告)日:2015-08-25

    申请号:US14534076

    申请日:2014-11-05

    CPC分类号: H01J27/24 G21K1/003 H05H6/00

    摘要: There is provided a device for generating a heavy-ion beam. The device includes a laser beam generating unit configured to generate a laser beam; a target configured to generate a heavy-ion beam by the laser beam; a laser optical system configured to focus the laser beam on the front of the target; and a plasma treating unit disposed at a rear surface of the target and configured to remove impurities within the target by plasma surface treatment that is performed by radiating cationic plasma onto the rear surface of the target.

    摘要翻译: 提供了一种用于产生重离子束的装置。 该装置包括被配置为产生激光束的激光束产生单元; 被配置为通过所述激光束产生重离子束的目标; 激光光学系统,其被配置为将所述激光束聚焦在所述目标的前面; 以及等离子体处理单元,其设置在所述靶的后表面,并且被配置为通过等离子体表面处理来除去所述靶内的杂质,所述等离子体表面处理通