Abstract:
A thermal shunt is to transfer heat from a sidewall of a device to a silicon substrate. The device is associated with a Silicon-On-Insulator (SOI) including a buried oxide layer. The thermal shunt extends through the buried oxide layer to the silicon substrate.
Abstract:
Es wird ein optoelektronisches Bauelement angegeben, das zumindest ein anorganisches optoelektronisch aktives Halbleiterbauelement (10) mit einem aktiven Bereich (3), der geeignet ist, im Betrieb Licht abzustrahlen oder zu empfangen, und auf zumindest einem Oberflächenbereich (7) ein mittels Atomlagenabscheidung aufgebrachtes Versiegelungsmaterial (6), das den Oberflächenbereich (7) hermetisch dicht bedeckt, aufweist. Weiterhin wird ein Verfahren zur Herstellung eines optoelektronischen Bauelements angegeben.
Abstract:
An edge-centering semiconductor laser is provided, comprising a semiconductor body (1) having a wave guide area (2). The wave guide area (2) comprises a lower cover layer (3a), a lower wave guide layer (4a), an active layer (5) for generating laser radiation, an upper wave guide layer (4b) and an upper cover layer (3b). The wave guide area (2) also comprises at least one structured laser radiation scattering area (6) in which a lateral base laser radiation mode experiences less scattering losses than the radiation of higher laser modes.
Abstract:
A method for the hybrid integration of vertical cavity surface emitting lasers (VCSELs) and/or other optical device components with silicon-based integrated circuits, based on a series of attachment steps, is described. The method is applicable when a multitude of individual VCSELs or optical devices are processed on the surface of a compound semiconductor wafer and then transferred to a silicon-based integrated circuit. The technique is realized by employing a specific sacrificial or removable separation layer between the optical components and the mother semiconductor substrate, followed by the transfer of the optical components to a carrier substrate, and the subsequent elimination of the sacrificial or separation layer and simultaneous removal of the mother substrate. This procedure is followed by the attachment and interconnection of the optical components to the surface of, or embedded within the upper layers of, an integrated circuit, followed by the release of the components from the carrier substrate. The distinction of this method is the ability to place and interconnect VCSELs directly within the physical structure of the integrated circuit, thus greatly reducing the power requirements, the distance of interconnecting lines, and the resultant operational speed. Selected variations of the method are proposed including the selective placement of groups of physically-connected VCSELs, and the collection and placement of large numbers of fabricated VCSELs onto foreign substrates using a vacuum plating tool.
Abstract:
A disclosed vertical cavity surface emitting laser device emits light orthogonally in relation to a substrate and includes a resonator structure including an active layer; and semiconductor multilayer reflectors disposed in such a manner as to sandwich the resonator structure between them and including a confinement structure which confines an injected current and transverse modes of oscillation light at the same time. The confinement structure has an oxidized region which surrounds a current passage region. The oxidized region is formed by oxidizing a part of a selective oxidation layer which includes aluminum and includes at least an oxide. The selective oxidation layer is at least 25 nm in thickness. The semiconductor multilayer reflectors include an optical confinement reducing section which reduces optical confinement in a transverse direction. The optical confinement reducing section is disposed on the substrate side in relation to the resonator structure.
Abstract:
The aim of the invention is to produce a waveguide structure in a surface-emitting semiconductor layer having an active zone (3) and a tunnel contact (7) on the p-side of the active zone (3), which borders a second n-doped semiconductor layer (8). To this end, the invention provides that, in a first epitaxial growth process, an n-doped barrier layer (6, 6a) is applied to a p-doped semiconductor layer (5) and is subsequently removed in part whereby forming an aperture (10). In a second epitaxial growth process, the layer provided for the tunnel contact (7) is then applied to the remaining barrier layer (6, 6a) and the aperture (10). By varying the thickness of this barrier layer (6, 6a), the lateral wave guiding and mode selection can be continuously adjusted.
Abstract:
Materials suitable for fabricating optical monitors include amorphous, polycrystalline and microcrystalline materials. Semitransparent photodetector materials may be based on silicon or silicon and germanium alloys. Conductors for connecting to and contacting the photodetector may be made from various transparent oxides, including zinc oxide, tin oxide and indium tin oxide. Optical monitor structures based on PIN diodes take advantage of the materials disclosed. Various contact, lineout, substrate and interconnect structures optimize the monitors for integration with various light sources, including vertical cavity surface emitting laser (VCSEL) arrays. Complete integrated structures include a light source, optical monitor and either a package or waveguide into which light is directed.
Abstract:
An apparatus includes a memory system (400) having multiple memory subsystems (1311-314) that are operable to concurrently service memory transactions. The memory system has an interface arrangement (321-324) with an interconnection network (330) that allows for independent access to each memory subsystem, and logic blocks(341-343) that support the servicing and distribution or routing of memory transactions. Preferably, the apparatus is formed on a semiconductor structure having a combination of compound semiconductor material and Group IV semiconductor material.