Abstract:
A method of packaging a semiconductor (10) includes providing a support structure (12). An adhesive layer (14) is formed overlying the support structure (12) and is in contact with the support structure. A plurality of semiconductor die (16, 18, 20) is placed on the adhesive layer. The semiconductor die are laterally separated from each other and have electrical contacts that are in contact with the adhesive layer. A layer (26) of encapsulating material is formed overlying and between the plurality of semiconductor die and has a distribution of filler material (28). A concentration of the filler material (28) is increased in all areas laterally adjacent each of the plurality of semiconductor die.
Abstract:
A bond pad (25) for an electronic device (10) such as an integrated circuit makes electrical connection to an underlying device (14) via an interconnect layer (16). The bond pad has a first layer (24) of a material that is aluminum and copper and a second layer (26), over the first layer (26), of a second material that is aluminum and is essentially free of copper. The second layer (26) functions as a cap to the first layer (24) for preventing copper in the first layer (24) from being corroded by residual chemical elements. A wire (32) such as a gold wire may be bonded to the second layer (26) of the bond pad.
Abstract:
A semiconductor package (10) uses a plurality of thermal conductors (56-64) that extend upward within an encapsulant (16) from one or more thermal bond pads (22, 24, 26) on a die (14) to disperse heat. The thermal conductors may be bond wires or conductive stud bumps and do not extend beyond a lateral edge of the die. One or more of the thermal conductors may be looped within the encapsulant and exposed at an upper surface of the encapsulant. In one form a heat spreader (68) is placed overlying the encapsulant for further heat removal. In another form the heat spreader functions as a power or ground terminal directly to points interior to the die via the thermal conductors. Active bond pads may be placed exclusively along the die's periphery or also included within the interior of the die.
Abstract:
An integrated circuit (10) has a semiconductor substrate (12) and an interconnect layer (14) that mechanically relatively weak and susceptible to cracks and delamination. In the formation of the integrated circuit from a semiconductor wafer, a cut (26) is made through the interconnect layer (14) to form an edge of the interconnect layer. This cut may continue completely through the wafer thickness or stop short of doing so. In either case, after cutting through the interconnect layer, a reconditioning layer (30) is formed on the edge of the interconnect layer. This reconditioning layer seals the existing cracks and delaminations and inhibits the further delamination or cracking of the interconnect layer. The sealing layer may be formed, for example, before the cut through the wafer, after the cut through the wafer but before any packaging, or after performing wirebonding between the interconnect layer and an integrated circuit package.
Abstract:
An integrated circuit die (10) has a copper contact (16, 18), which, upon exposure to the ambient air, forms a native copper oxide. An organic material is applied to the copper contact which reacts with the native copper oxide to form an organic coating (12, 14) on the copper contact in order to prevent further copper oxidation. In this manner, further processing at higher temperatures, such as those greater than 100 degrees Celsius, is not inhibited by excessive copper oxidation. For example, due to the organic coating, the high temperature of the wire bond process does not result in excessive oxidation which would prevent reliable wire bonding. Thus, the formation of the organic coating allows for a reliable and thermal resistance wire bond (32, 34). Alternatively, the organic coating can be formed over exposed copper at any time during the formation of the integrated circuit die to prevent or limit the formation of copper oxidation.
Abstract:
A semiconductor package uses various forms of conductive traces that connect to die bond pads via bond wires. In one form, adjacent bond wires are intentionally crossed around midpoints thereof to reduce self-inductance of the conductors and to minimize self-inductance. In another form, bond wires associated with bond pads having intervening, unrelated bond pads are crossed. Additionally, conductive traces are divided into separate sections and electrically connected by crossed jumper wires or bond wires. Any number of separate sections may be formed for each trace, but an even number is preferable. In another form, one trace is continuous and divides a second trace into two or more sections. The multiple sections are connected by an overlying bond wire. Either insulated or non-insulated bond wire may be used.
Abstract:
A die (10) for an integrated circuit comprising an active area (22) is provided. The die (10) may further comprise a first ring (12) in a peripheral region of the die (10) at least partially surrounding the active area (22), wherein the first ring (12) may comprise a plurality of polygon shaped cells (32, 36). The die (10) may further comprise a second ring (14) surrounding the first ring (12), wherein the second ring (14) may comprise a plurality of polygon shaped cells (32, 36).
Abstract:
A semiconductor device (10) has a large number of bond pads (24) on the periphery for wirebonding. The semiconductor device (10) has a module (12) as well as other circuitry, but the module (12) takes significantly longer to test than the other circuitry. A relatively small number of the bond pads (20), the module bond pads (20), are required for the module testing due, at least in part, to the semiconductor device having a built-in self-test (BIST) (16) circuitry. The functionality of these module bond pads (22) is duplicated on the top surface of and in the interior of the semiconductor device (10) with module test pads (22) that are significantly larger than the bond pads (24) on the periphery. Having large pads (22) for testing allows longer probe needles, thus increasing parallel testing capability. Duplicating the functionality is achieved through a test pad interface so that the module bond pads (20) and the module test pads (22) do not have to be shorted together.